IP Library Granted Patent US 12,330,994
Granted Patent B2
US 12,330,994 · App. 17/390,072 · Granted Jun 17, 2025

CVD functionalized particles for CMC applications

Inventors: Brendan M. Lenz (Wethersfield, CT); Sarah A. Frith (Jupiter, FL); Olivier H. Sudre (Glastonbury, CT)
Assignee: RTX Corporation
C04B35/80C04B35/62802C04B35/62844C04B35/62884C04B35/62892C04B35/64C04B35/657C04B2235/3217C04B2235/3244C04B2235/3821C04B2235/3826C04B2235/3873C04B2235/422C04B2235/428C04B2235/5244C04B2235/5252C04B2235/614C04B2235/616
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Quick Facts
Patent No.
US 12,330,994
App. No.
17/390,072
Granted
Jun 17, 2025
Kind
B2
Abstract

A method of manufacturing ceramic matrix composites includes producing chemical vapor deposition functionalized ceramic particles before injecting the functionalized ceramic particles into the CMC fabric. The functionalized ceramic particles are mixed with a binder solution and then dispensed into voids present between adjacent tows of the CMC fabric. Injecting the particles in the center of the voids reduces the size and volume fraction of the voids/defects, improving the homogeneity of surface texture, homogeneity of microstructure, and part model shape conformity.

Claims (14)

1. A method of forming a ceramic matrix composite component, the method comprising:

forming a plurality of ceramic fiber plies;

selectively applying functionalized ceramic particles into voids within each of the plurality of ceramic fiber plies;

laying up and debulking a stack of the plurality of ceramic fiber plies including the functionalized ceramic particles; and

subsequently densifying the stack of ceramic fiber plies;

wherein the functionalized ceramic particles are produced by coating base ceramic particles with a first chemical compound through a chemical vapor deposition or chemical vapor infiltration process;

wherein the first chemical compound is one or more of silicon carbide (SiC), boron nitride (BN), silicon boron nitride (SiBN), carbon (C), boron carbide (B 4 C), aluminum nitride (AlN), aluminum oxide (Al 2 O 3 ), zirconium dioxide (ZrO 2 ), silicon nitride (Si 3 N 4 ), silicon dioxide (SiO 2 ), and silicon oxycarbide (SiOC).

2. The method of claim 1 and further comprising coating the base ceramic particles with a second chemical compound through a chemical vapor deposition or chemical vapor infiltration process.

3. The method of claim 2 , wherein the first chemical compound is a same or different chemical compound than the second chemical compound.

4. The method of claim 1 , wherein the base ceramic particles are one or more of silicon carbide, boron carbide, silicon nitride, silicon, carbon, aluminum oxide, and hafnium oxide.

5. The method of claim 1 , wherein the step of selectively applying the functionalized ceramic particles comprises applying a mixture of the functionalized ceramic particles and a liquid binder into the voids within each ceramic fiber ply.

6. The method of claim 5 , wherein the liquid binder is one or more of a polyvinyl alcohol and water mixture and a polyvinyl butyral and ethanol mixture.

7. The method of claim 1 , wherein the step of densifying the stack of ceramic fiber plies comprises one or more of a chemical vapor infiltration, chemical vapor deposition, melt infiltration, and polymer infiltration and pyrolysis process.

8. The method of claim 1 , wherein the ceramic fiber plies are formed from silicon carbide fibers.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 2, 2025
From: UCASZ, MARK T.
To: RTX CORPORATION
Reel/Frame 072137/0200 →
CHANGE OF NAME Recorded May 27, 2025
From: RAYTHEON TECHNOLOGIES CORPORATION
To: RTX CORPORATION
Reel/Frame 071409/0424 →
CHANGE OF NAME Recorded Jul 27, 2023
From: RAYTHEON TECHNOLOGIES CORPORATION
To: RTX CORPORATION
Reel/Frame 064402/0837 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 15, 2021
From: LENZ, BRENDAN M.; FRITH, SARAH A.; SUDRE, OLIVIER H.
To: RAYTHEON TECHNOLOGIES CORPORATION
Reel/Frame 057521/0502 →
Continuity (1)
Related Publication 20230036697A1 · Feb 2, 2023
References Cited (5)
US 6596040B2 · Saak et al. · 2003 [cited by applicant]
US 10443386B2 · Matsumoto · 2019 [cited by examiner]
US 10822281B2 · She et al. · 2020 [cited by applicant]
US 20060057287A1 · Foss et al. · 2006 [cited by applicant]
US 20200157011A1 · Schmidt · 2020 [cited by examiner]
Cited By (2)
US 12,655,069 US 12,662,429