Methods for making probe devices and related devices
Various methods for making probe devices that include the addition of electrode contact material using various different processes and/or techniques, along with the resulting devices. Some methods include adding electrode contact material such that the resulting electrode contacts are suitable for direct contact with patient tissue while encapsulating materials that are not.
1. A method of making a neural probe, the method comprising:
positioning a first side of a thin film elongate connector on a first side of a first insulation layer, the thin film elongate connector having a second side disposed opposite the first side, the elongate connector extending along the first side of the first insulation layer from a proximal portion of the elongate connector and terminating in a distal end, the distal end positioned along a length of the first insulation layer leaving an exposed portion of the first side of the insulation layer adjacent to the distal end of the elongate connector;
depositing an electrode contact material onto a contact area that includes a portion of the second side of the elongate connector and a portion of the exposed portion of the first side of the first insulation layer, the electrode contact material being deposited onto the contact area via physical vapor deposition such that a thin film electrode contact is formed; and
positioning a first side of a second insulation layer onto the first side of the first insulation layer, wherein the second insulation layer comprises an opening defined in fluidic communication with the electrode contact material deposited onto the contact area.
2. The method of claim 1 , further comprising positioning a third insulation layer in contact with a second side of the first insulation layer.
3. The method of claim 1 , further comprising positioning an adhesive layer in contact with a second side of the first insulation layer.
4. The method of claim 1 , further comprising positioning a third insulation layer in contact with a second side of the second insulation layer.
5. The method of claim 1 , further comprising treating the first side of the first insulation layer and the elongate connector before depositing the electrode contact material.
6. The method of claim 1 , further comprising:
disposing a mask over the elongate connector and the first insulation layer before depositing the electrode contact material onto the contact area, wherein the mask comprises at least one mask opening defined within the mask, wherein the at least one mask opening is in fluidic communication with the distal end of the elongate connector and the portion of the exposed portion of the first side of the first insulation layer.
7. The method of claim 1 , wherein a portion of the thin film electrode contact is disposed between the first and second insulation layers.
8. The method of claim 1 , further comprising positioning an elongate portion of the elongate connector on the second side of the first insulation layer, wherein the elongate connector positioned on the first side of the first insulation layer comprises a contact portion, and wherein the contact portion is electrically coupled to the elongate portion via a transverse portion.
9. A method of making a neural probe, the method comprising:
positioning a thin film elongate connector along a length of a first side of a base insulation layer, the thin film elongate connector comprising at least one single-layered trace extending from a main portion of the thin film elongate connector to a distal end portion of the at least one single-layered trace, the at least one single-layered trace having a first side disposed on the first side of the base insulation layer and a second side disposed opposite the first side;
depositing an electrode contact material onto an area comprising a portion of the second side of the distal end portion of the at least one single-layered trace and an adjoining portion of the first side of the base insulation layer via physical vapor deposition; and
positioning a first side of a top insulation layer onto the first side of the base insulation layer, wherein the top insulation layer comprises a contact opening defined in the top insulation layer, wherein the contact opening is in fluidic communication with the electrode contact material such that the electrode contact material is disposed within the contact opening at some depth from a second side of the top insulation layer.
10. The method of claim 9 , further comprising positioning the base insulation layer on a support plate and positioning the base insulation layer and the support plate in a deposition chamber before depositing the electrode contact material.
11. The method of claim 10 , further comprising, before positioning the support plate in the chamber, attaching a mask to the support plate such that the base insulation layer and the elongate connector are disposed between the support plate and the mask, wherein the mask comprises a mask opening defined within the mask, and wherein the top insulation layer is positioned such that the contact opening is in fluid communication with the deposited electrode contact material.
12. The method of claim 9 , further comprising, before depositing the electrode contact material, treating the first side of the base insulation layer and the elongate connector.
13. The method of claim 12 , wherein the treating the first side of the base insulation layer and the elongate connector comprises etching the first side of the base insulation layer and the elongate connector with an etching plasma gas.
14. A method of making a neural probe, the method comprising:
positioning a contact portion of a thin film elongate connector on a first side of a middle insulation layer, wherein a first side of the contact portion of the elongate connector is disposed on the first side of the middle insulation layer, wherein the contact portion has a second side disposed opposite the first side, wherein an elongate portion of the elongate connector is disposed on a second side of the middle insulation layer, and wherein the contact portion is electrically coupled to the elongate portion via a transverse portion;
depositing an electrode contact material onto a portion of the second side of the contact portion of the elongate connector and onto an adjoining portion of the first side of the middle insulation layer via physical vapor deposition;
positioning a first side of a top insulation layer onto the first side of the middle insulation layer, wherein the top insulation layer comprises a contact opening defined in the top insulation layer, wherein the contact opening is in fluidic communication with the electrode contact material; and
positioning a first side of a bottom insulation layer onto the second side of the middle insulation layer,
wherein the top insulation layer, the middle insulation layer, and the bottom insulation layer form a body of the neural probe.
15. The method of claim 14 , further comprising, before depositing the electrode contact material:
positioning the middle insulation layer and elongate connector on a support plate;
attaching a mask to the support plate such that the middle insulation layer and elongate connector is disposed between the support plate and the mask, wherein the mask comprises a mask opening defined within the mask, wherein the mask opening is in fluidic communication with the contact
portion of the elongate connector; and
positioning the support plate in a deposition chamber.
16. A method of making a neural probe, the method comprising:
positioning a first side of a thin film elongate connector on a first side of a first insulation layer, the thin film elongate connector having a second side disposed opposite the first side, the elongate connector extending along the first side of the first insulation layer from a proximal portion to a distal portion of the elongate connector, the first side of the first insulation layer having an exposed surface adjoining the distal portion of the elongate connector;
positioning the first insulation layer and the elongate connector on a support plate;
positioning a mask over the first insulation layer and the elongate connector, the mask comprising a mask opening defined within the mask, the mask opening positioned to leave exposed an area including a portion of the second side of the distal portion of the elongate connector and the exposed surface of the first insulation layer adjoining the distal portion of the elongate connector;
positioning the support plate in a deposition chamber;
depositing an electrode contact material through the mask opening and onto the portion of the second side of the distal portion of the elongate connector and onto the adjoining exposed surface of the first side of the first insulation layer via physical vapor deposition within the deposition chamber such that a thin film electrode contact is formed; and
positioning a first side of a second insulation layer onto the first side of the first insulation layer such that a portion of the thin film electrode contact is disposed between the first insulation layer and the second insulation layer, wherein the second insulation layer comprises an opening defined in fluidic communication with the electrode contact material.
17. The method of claim 16 , further comprising, before depositing the electrode contact material, attaching the mask to the support plate such that the first insulation layer and the elongate connector is disposed between the support plate and the mask, wherein the mask opening is in fluidic communication with the distal portion of the elongate connector.
18. The method of claim 1 , wherein the thin film elongate connector comprises a first metal, and wherein the electrode contact material comprises a second metal.
19. The method of claim 2 , wherein the first insulation layer, the second insulation layer, and the third insulation layer form a body of the neural probe.