System and method for locating an implantation site in the brain

1. A method of locating an implantation site in the brain, the method comprising:

inserting a plurality of multi-contact electrode probes into a region of a target structure in an individual's brain, each multi-contact electrode probe of the plurality of multi-contact electrode probes being simultaneously inserted into the region of the target structure to a discrete depth, each multi-contact electrode probe of the plurality of multi-contact electrode probes including a plurality of contacts spaced apart from each other along a length of the multi-contact electrode probe;

applying High Frequency Stimulation (HFS) to a subset of contacts of a multi-contact electrode probe of the plurality of multi-contact electrode probes;

measuring High Frequency Oscillations (HFO) evoked in the region of the target structure by the HFS;

measuring Evoked Compound Activity (ECA) waveform evoked in the region of the target structure by the HFS;

determining if the HFO is above a predetermined threshold;

determining if the ECA waveform is above a predetermined threshold;

if at least one of the HFO or the ECA is above the predetermined threshold, identifying a location of the subset of contacts of the multi-contact electrode probe as a site for electrode implantation in the individual's brain;

determining an amplitude, a phase, and a resonance duration of the measured ECA waveform;

extracting a phase space from the ECA waveform;

determining a stimulation frequency range based on the extracted phase space;

delivering stimulation within the stimulation frequency range;

determining a corresponding power of each frequency of the HFO that is within the stimulation frequency range; and

selecting for treatment a frequency within the stimulation frequency range, wherein the frequency is associated with a maximum power of the powers corresponding to each frequency of the HFO that is within the stimulation frequency range.

2. The method of claim 1 , wherein if the HFO and the ECA is below the predetermined threshold, applying a second high frequency stimulation to a second subset of contacts of the multi-contact electrode probe of the plurality of multi-contact electrode probes.

3. The method of claim 2 , wherein if no site for electrode implantation in the individual's brain is identified, moving the plurality of multi-contact electrode probes to a second region in the individual's brain.

4. The method of claim 1 , further including implanting at least one electrode configured for Deep Brain Stimulation (DBS) to the site for electrode implantation in the individual's brain.

5. The method of claim 1 , wherein the target structure is the Subthalamic Nucleus (STN).

6. The method of claim 1 , wherein measuring the HFO and the ECA is performed intraoperatively.

7. The method of claim 1 , wherein the HFS is greater than 100 Hz.

8. The method of claim 1 , wherein the HFO includes an oscillation pattern of from 200 Hz to 450 Hz.

9. The method of claim 1 , wherein the ECA includes a resonance pattern above a predetermined threshold.

10. The method of claim 1 , wherein the plurality of multi-contact electrode probes are inserted into a brain of an individual having Parkinson's Disease (PD).

11. A system for locating a site for electrode implantation in the brain, the system comprising:

a plurality of multi-contact electrode probes each including a plurality of contacts spaced apart from each other along a length of the multi-contact electrode probe, the plurality of multi-contact electrode probes being configured for insertion into a region of a target structure in an individual's brain at a discrete depth, each multi-contact electrode probe of the plurality of multi-contact electrode probes being configured to apply High Frequency Stimulation (HFS) to the region of the target structure to evoke High Frequency Oscillations (HFO) and Evoked Compound Activity (ECA) waveform in the region of the target structure by the HFS;

a processor in communication with the plurality of multi-contact electrode probes; and

a memory in communication with the processor and having instructions, which when executed by the processor, cause the system to:

determine if the HFO is above a predetermined threshold;

determine if the ECA waveform is above a predetermined threshold;

identify a location of a subset of contacts of one multi-contact electrode probe of the plurality of multi-contact electrode probes as a site for electrode implantation in the individual's brain if at least one of the HFO or the ECA is above the predetermined threshold;

determine an amplitude, a phase, and a resonance duration of the ECA waveform;

extract a phase space from the ECA waveform based on the amplitude, the phase, and the resonance duration;

determine a stimulation frequency range based on the extracted phase space;

deliver stimulation within the stimulation frequency range;

determine a corresponding power of a frequency of the HFO that is within the stimulation frequency range; and

select for treatment a frequency within the stimulation frequency range, wherein the frequency is associated with a maximum power of the powers corresponding to each frequency of the HFO that is within the stimulation frequency range.

12. The system of claim 11 , further including a display configured to visually display the HFO and the ECA.

13. The system of claim 11 , wherein the system is further configured to control HFS applied by the one multi-contact electrode probe.

14. The system of claim 13 , wherein if the HFO and the ECA are below the predetermined threshold, the processor is configured to cause a second subset of contacts of the one multi-contact electrode probe to apply a second high frequency stimulation.

15. The system of claim 11 , wherein the target structure is the Subthalamic Nucleus (STN).

16. The system of claim 11 , wherein the system is configured to measure the HFO and the ECA intraoperatively.

17. The system of claim 11 , wherein the HFS is greater than 100 Hz.

18. The system of claim 11 , wherein the HFO includes an oscillation pattern greater than 300 Hz.

19. The system of claim 11 , wherein the ECA includes a resonance pattern above a predetermined threshold.

20. The system of claim 11 , wherein the plurality of multi-contact electrode probes are configured to be inserted into a brain of an individual having Parkinson's Disease (PD).