Simplified voltage-boosting snubber network

1. A snubber for a pulsed DC power supply system, the snubber comprising:

an input coupled to a DC power supply;

an output coupled to a switching circuit, the switching circuit configured to provide pulsed DC power to a load;

a low-level connection of the DC power supply;

a first inductive element coupled between a first node and a second node;

a second inductive element coupled between the first node and a third node, the third node coupled to the output;

a capacitive element coupled between the first node and a fourth node;

a first switch coupled between the third and fourth nodes;

a second switch coupled between the second and fourth nodes; and

a third switch coupled between the second node and the low-level connection of the DC power supply.

2. The snubber of claim 1 , wherein either or both of the first and second inductive elements comprise one inductor or a group of inductors connected in series and/or in parallel.

3. The snubber of claim 1 , wherein the capacitive element comprises one capacitor or a group of capacitors connected in series and/or parallel.

4. The snubber of claim 1 , wherein the first switch is a dual-quadrant switch.

5. The snubber of claim 4 , wherein the first switch is a quadrant 1 and 3 switch.

6. The snubber of claim 5 , wherein a negative terminal of the first switch is coupled to the third node.

7. The snubber of claim 1 , wherein the second and third switches are single quadrant switches.

8. The snubber of claim 1 , wherein a voltage across the capacitive element is controlled by varying a duty cycle of the first switch.

9. A pulsed DC power supply system configured to provide pulsed DC to electrodes in a plasma processing chamber, the pulsed DC power supply system comprising:

a DC power supply configured to provide a process voltage, V 1 , to a first and a second rail;

a first switching circuit coupled to the first and second rails, and configured to convert the process voltage, V 1 , and any other voltage on the first and second rails, to a pulsed output for provision to the electrodes in the plasma processing chamber;

a voltage-boosting circuit coupled between the first and second rails and comprising:

a capacitive element;

two inductive elements; and

three switches, wherein

the two inductive elements and the capacitive element are connected at a first node, and wherein

the voltage-boosting circuit is configured to draw current from the DC power supply when an impedance of the plasma processing chamber increases thereby raising a voltage between the first and second rail by a boost voltage, V 2 , where the boost voltage, V 2 , is selectable by a duty cycle of two of the three switches.

10. The pulsed DC power supply system of claim 9 , wherein the two of the three switches are single quadrant switches.

11. The pulsed DC power supply system of claim 10 , wherein a third of the three switches is a two-quadrant switch.

12. The pulsed DC power supply system of claim 11 , wherein the third of the three switches is a diode.

13. The pulsed DC power supply system of claim 10 , wherein a voltage across the capacitive element is controlled by a duty cycle of a first of the three switches.

14. The pulsed DC power supply system of claim 9 , wherein two of the three switches are coupled to a first of the two inductive elements at a second node.

15. The pulsed DC power supply system of claim 14 , wherein a third of the three switches is coupled to a second of the two inductive elements at a third node.

16. The pulsed DC power supply system of claim 15 , wherein the third of the three switches and the capacitive element are coupled at a fourth node.

17. A method of providing pulsed power to a plasma processing chamber, the method comprising:

providing a snubber circuit coupled to a switching circuit, the snubber circuit configured to be coupled between a DC power supply and the switching circuit, and the switching circuit configured to be coupled between the snubber circuit and the plasma processing chamber, the snubber circuit comprising two switches whose duty cycle is configured to control a voltage across a capacitor of the snubber circuit and thereby to regulate a DC voltage provided at an output of the switching circuit to the plasma processing chamber;

accessing from memory, for the switching circuit, a target boost voltage, target pulsed output duty cycle, target pulsed output frequency, and target output current;

setting a duty cycle of the two switches to achieve the target boost voltage at the output of the switching circuit; and

delivering a first pulsed DC voltage to an electrode in the plasma processing chamber.

18. The method of claim 17 , further comprising setting an output voltage of the DC power supply to achieve the target output current at the output of the switching circuit.

19. The method of claim 18 , further comprising setting a duty cycle and a switching frequency of the switching circuit to achieve the target pulsed output duty cycle and the target pulsed output frequency at the output of the switching circuit.