Electrostatic chuck
An insulating substrate has a sample holding surface. A support is bonded to the insulating substrate. A first through-hole in the insulating substrate and a second through-hole in the support are continuous with each other to serve as a gas inlet. A porous member is located in the second through-hole. The second through-hole has, at its opening adjacent to the insulating substrate (opening adjacent to the substrate), a larger diameter than the first through-hole. The opening of the second through-hole and an electrostatic attraction electrode are at different positions in a direction parallel to the sample holding surface. The electrostatic attraction electrode and the second through-hole avoid overlapping each other as viewed from above.
1. An electrostatic chuck, comprising:
a substrate having a first main surface for holding a sample, a second main surface, and a first through-hole extending from the first main surface to the second main surface;
an electrode for electrostatic attraction located inside the substrate;
a bond material on the second main surface of the substrate that bonds a support to the second main surface;
the support having a second through-hole that is continuous with the first through-hole, and that extends from a surface of the support adjacent to the second main surface; and
a porous member located in the second through-hole and fixed to the second main surface,
wherein a diameter of the second through-hole, at an opening of the second through-hole adjacent to the substrate, is larger than a diameter of the first through-hole, and
the opening of the second through-hole and the electrode are at different positions in a direction parallel to the first main surface.
2. The electrostatic chuck according to claim 1 , further comprising:
a tubular member located in the second through-hole and surrounding the porous member.
3. The electrostatic chuck according to claim 1 , wherein
the substrate has a recess on the second main surface, and
the porous member is fixed in the recess.
4. The electrostatic chuck according to claim 3 , wherein
the porous member is fixed in the recess with an adhesive, and
a thermal conductivity of the adhesive is higher than a thermal conductivity of the substrate.
5. The electrostatic chuck according to claim 3 , wherein
the recess and the electrode are at different positions in the direction parallel to the first main surface.
6. The electrostatic chuck according to claim 3 , wherein
the recess has a wall, and
the electrostatic chuck comprises a plasma-resistant member on the wall.