Metasurface arrangement
The present disclosure relates to a metasurface arrangement including a first metasurface and a second metasurface which run mutually parallel and face each other. Each metasurface includes a corresponding periodic or quasi-periodic structure formed in a respective pattern. The first metasurface is formed in a dielectric material structure and the second metasurface is formed in either a dielectric material structure or in an electrically conducting structure. The periodic or quasi-periodic structure on the first metasurface is configured to yield a first response to an incident electromagnetic wave between the two metasurfaces, and the periodic or quasi-periodic structure on the second metasurface is configured to yield a second response to the incident electromagnetic wave between the two metasurfaces that is equivalent to the first response, thereby rendering the two metasurfaces mutually electromagnetically symmetric.
1. A metasurface arrangement comprising a first metasurface and a second metasurface which run mutually parallel and face each other, each metasurface comprising a corresponding periodic or quasi-periodic structure in a respective pattern, wherein the first metasurface is in a dielectric material structure and the second metasurface is in either a dielectric material structure or in an electrically conducting structure, wherein:
the periodic or quasi-periodic structure on the first metasurface is configured to yield a first response to an incident electromagnetic wave between the two metasurfaces, and the periodic or quasi-periodic structure on the second metasurface is configured to yield a second response to the incident electromagnetic wave between the two metasurfaces that is equivalent to the first response, thereby rendering the two metasurfaces mutually electromagnetically symmetric, and
the second metasurface comprises a second periodic or quasi-periodic structure, where each periodic or quasi-periodic structure of the first and second metasurfaces have mutually different geometries rendering the first and second metasurfaces mutually electromagnetically symmetric.
2. The metasurface arrangement according to claim 1 , wherein there is a distance (h) between the metasurfaces.
3. The metasurface arrangement according to claim 1 , wherein the metasurfaces are in dielectric materials having the same conducting properties or wherein the first metasurface is in a first material and the second metasurface is in a second material, where the first material and the second material have mutually different conducting properties.
4. The metasurface arrangement according to claim 1 , wherein the first metasurface is in a first material and the second metasurface is in a second material, where the first material and the second material have mutually different conducting properties.
5. The metasurface arrangement according to claim 1 , wherein each metasurface comprises a corresponding set of mutually identical electrically conducting structures in the corresponding periodic or quasi-periodic structure.
6. The metasurface arrangement according to claim 1 , wherein each periodic or quasi-periodic structure comprises electrically conducting structures.
7. The metasurface arrangement according to claim 6 , wherein the electrically conducting structures comprise three-dimensional cavities.
8. The metasurface arrangement according to claim 7 , wherein each three-dimensional cavity has a circular or a rectangular cross-section.
9. The metasurface arrangement according to claim 7 , wherein each cavity that is in a dielectric material structure and comprises an electrically conducting bottom layer that is parallel to a main lateral extension of the dielectric material structures, and electrically conducting vias that run in the dielectric material structure and a wall structure that runs perpendicular to the bottom layer.
10. The metasurface arrangement according to claim 5 , wherein the metasurfaces are positioned such that opposing electrically conducting structures face each other, providing minor symmetry.
11. The metasurface arrangement according to claim 5 , wherein the metasurfaces are positioned such that opposing electrically conducting structures are laterally displaced with respect to each other such that a glide-symmetric metasurface arrangement is formed.
12. A method for providing a metasurface arrangement, the method comprising:
providing a first metasurface by providing a first periodic or quasi-periodic structure in a first pattern in a dielectric material;
providing a second metasurface by providing a second periodic or quasi-periodic structure in a second pattern in either a dielectric material or a metallic material;
positioning the metasurfaces such that they run mutually parallel and face each other; and
configuring the corresponding periodic or quasi-periodic structure for each metasurface such that a first response to an incident electromagnetic wave between the two metasurfaces is obtained for the first metasurface, and a second response to the incident electromagnetic wave between the two metasurfaces is obtained for the second metasurface, where the second response is equivalent to the first response, thereby rendering the two metasurfaces mutually electromagnetically symmetric,
wherein configuring a corresponding periodic or quasi-periodic structure comprises providing, for each metasurface, a corresponding set of mutually identical electrically conducting structures, and the electrically conducting structures are in the form of three-dimensional cavities.
13. The method according to claim 12 , wherein positioning the metasurfaces comprises providing a distance (h) between the metasurfaces.
14. The method according to claim 12 , wherein the metasurfaces are in dielectric materials having the same conducting properties or wherein the first metasurface is in a first material and the second metasurface is in a second material, wherein the first material and the second material have mutually different conducting properties.
15. The method according to claim 12 , wherein each periodic or quasi-periodic structure is with mutually different geometries, rendering the two metasurfaces mutually electromagnetically symmetric.
16. The method according to claim 12 , wherein each three-dimensional cavity has a circular or a rectangular cross-section.
17. The method according to claim 12 , wherein positioning the metasurfaces comprises positioning the metasurfaces such that opposing electrically conducting structures face each other, providing mirror symmetry.
18. The method according to claim 12 , wherein positioning the metasurfaces comprises positioning the metasurfaces such that opposing electrically conducting structures are laterally displaced with respect to each other such that a glide-symmetric metasurface arrangement is formed.
19. A metasurface arrangement comprising a first metasurface and a second metasurface which run mutually parallel and face each other, each metasurface comprising a corresponding periodic or quasi-periodic structure in a respective pattern, wherein the first metasurface is in a dielectric material structure and the second metasurface is in either a dielectric material structure or in an electrically conducting structure, wherein:
the periodic or quasi-periodic structure on the first metasurface is configured to yield a first response to an incident electromagnetic wave between the two metasurfaces, and the periodic or quasi-periodic structure on the second metasurface is configured to yield a second response to the incident electromagnetic wave between the two metasurfaces that is equivalent to the first response, thereby rendering the two metasurfaces mutually electromagnetically symmetric, and
each metasurface comprises a corresponding set of mutually identical electrically conducting structures in the corresponding periodic or quasi-periodic structure, and the metasurfaces are positioned such that opposing electrically conducting structures are laterally displaced with respect to each other such that a glide-symmetric metasurface arrangement is formed.