GLASS CERAMICS, CHEMICALLY STRENGTHENED GLASS, AND SEMICONDUCTOR SUBSTRATE

1 . A glass ceramic having a visible-light transmittance of 85% or more in terms of a thickness of 0.7 mm, and a haze value of 1.0% or less in terms of a thickness of 0.7 mm, and

comprising, in mass % on an oxide basis:

45-70% of SiO 2 ;

1-15% of Al 2 O 3 ; and

10-25% of Li 2 O.

2 . The glass ceramic according to claim 1 , having a content of K 2 O of 5% or less in mass % on an oxide basis.

3 . The glass ceramic according to claim 1 , comprising lithium metasilicate crystals.

4 . The glass ceramic according to claim 1 , comprising lithiumphosphate crystals.

5 . The glass ceramic according to claim 3 , wherein, in a case where lithium disilicate crystals are contained, the lithium disilicate crystals have a crystal size of 45 nm or less, the crystal size being determined using Scherrer equation from a width of an X-ray diffraction peak of the lithium disilicate crystals.

6 . The glass ceramic according to claim 1 , having a glass transition point that differs by 200° C. or less from a glass transition point of an amorphous glass having the same glass composition as a glass composition of the glass ceramic.

7 . The glass ceramic according to claim 1 , wherein the haze value is 0.4% or less in terms of a thickness of 0.7 mm.

8 . A semiconductor-supporting substrate comprising the glass ceramic according to claim 1 .

9 . A chemically strengthened glass having a compressive stress layer in a surface thereof, the chemically strengthened glass being a glass ceramic that has a visible-light transmittance of 85% or more in terms of a thickness of 0.7 mm, and a haze value of 0.5% or less in terms of a thickness of 0.7 mm,

has a surface compressive stress value of 500 MPa or more and a depth of the compressive stress layer of 80 μm or more, and

comprises, in mass % on an oxide basis:

45-70% of SiO 2 ;

1-15% of Al 2 O 3 ; and

10-25% of Li 2 O.

10 . The chemically strengthened glass according to claim 9 , comprising lithium metasilicate crystals.

11 . The chemically strengthened glass according to claim 10 , comprising lithiumphosphate crystals.

12 . The chemically strengthened glass according to claim 9 , having a compressive stress value of 100 MPa or more at a depth of 50 m from the surface.

13 . The chemically strengthened glass according to claim 9 , having an average thermal expansion coefficient at 50° C.-350° C. of 90×10 −7 /° C.-140×10 −7 /° C.

14 . The chemically strengthened glass according to claim 9 , having a Vickers hardness of 600 or more.

15 . A semiconductor-supporting substrate comprising the chemically strengthened glass according to claim 9 .

16 . An electronic appliance comprising the chemically strengthened glass according to claim 9 .