IP Library Granted Patent US 11,898,845
Granted Patent B2
US 11,898,845 · App. 17/444,723 · Granted Feb 13, 2024

Micromachined multi-axis gyroscopes with reduced stress sensitivity

Inventors: Cenk Acar (Santa Clara, CA); Brenton Simon (Fremont, CA); Sandipan Maity (San Carlos, CA)
Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
G01C19/5712B81B3/0018B81C1/00134G01C19/5656B81B2201/0242B81B2203/056
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Quick Facts
Patent No.
US 11,898,845
App. No.
17/444,723
Granted
Feb 13, 2024
Kind
B2
Abstract

In a general aspect, a micromachined gyroscope can include a substrate and a static mass suspended in an x-y plane over the substrate by a plurality of anchors attached to the substrate. The static mass can be attached to the anchors by anchor suspension flexures. The micromachined gyroscope can include a dynamic mass surrounding the static mass and suspended from the static mass by one or more gyroscope suspension flexures.

Claims (47)

1. A micromachined gyroscope comprising:

a substrate;

a static mass suspended in an x-y plane over the substrate;

a dynamic mass surrounding the static mass and suspended from the static mass;

at least one out-of-plane sense electrode disposed on the substrate at an edge of the gyroscope;

at least one in-plane drive electrode; and

at least one in-plane drive sensing electrode, the at least on in-plane drive electrode and the at least one in-plane drive sensing electrode being disposed in a region of the gyroscope closer to a center of the gyroscope than the at least one out-of-plane sense electrode.

2. The micromachined gyroscope of claim 1 , further comprising:

a plurality of anchors coupled with the substrate; and

a plurality of anchor suspension flexures coupling the static mass to the plurality of anchors.

3. The micromachined gyroscope of claim 2 , wherein:

the static mass has an X-shape; and

the plurality of anchors includes a symmetrical arrangement of four anchors, each anchor of the four anchors being attached to the substrate at a same radial distance from a center of the gyroscope.

4. The micromachined gyroscope of claim 3 , wherein the dynamic mass is coupled with the static mass at bottoms of valleys of the X-shape by at least one gyroscope suspension flexure.

5. The micromachined gyroscope of claim 4 , wherein the at least one gyroscope suspension flexure including at least one C-beam flexure.

6. The micromachined gyroscope of claim 2 , wherein the static mass is suspended in the x-y plane over the substrate by a geometrically distributed arrangement of the plurality of anchors.

7. The micromachined gyroscope of claim 6 , wherein the geometrically distributed arrangement of the plurality of anchors is configured to:

track substrate deformation; and

average capacitive gaps between the dynamic mass and out-of-plane rate sense electrodes disposed on the substrate.

8. The micromachined gyroscope of claim 1 , further comprising at least one gyroscope suspension flexure coupling the dynamic mass with the static mass.

9. The micromachined gyroscope of claim 1 , wherein the at least one out-of-plane sense electrode is configured to detect x-axis acceleration and y-axis acceleration of the dynamic mass.

10. The micromachined gyroscope of claim 1 , wherein the at least one in-plane drive electrode and the at least one in-plane drive sensing electrode are coupled with the substrate by respective anchors.

11. The micromachined gyroscope of claim 1 , wherein:

the at least one in-plane drive electrode includes a pair of drive electrodes disposed on a first side of the static mass; and

the at least one in-plane drive sensing electrode includes a pair of drive sensing electrodes disposed on a second side of the static mass, the second side being opposite the first side.

12. The micromachined gyroscope of claim 1 , further comprising at least one in-plane rate sensing electrode.

13. The micromachined gyroscope of claim 12 , wherein the at least one in-plane rate sensing electrode is configured to detect z-axis acceleration of the dynamic mass.

14. The micromachined gyroscope of claim 12 , wherein the at least one in-plane rate sensing electrode includes:

a first z-axis rate sensing electrode disposed on a first side of the static mass; and

a second z-axis rate sensing electrode disposed on a second side of the static mass, the second side being opposite the first side.

15. A micromachined gyroscope comprising:

a substrate;

a static mass suspended in an x-y plane over the substrate;

a dynamic mass surrounding the static mass and suspended from the static mass;

at least one out-of-plane rate sensing electrode disposed on the substrate at an edge of the gyroscope; and

at least one in-plane rate sensing electrode, the at least one in-plane rate sensing electrode being disposed in a region of the gyroscope closer to a center of the gyroscope than the at least one out-of-plane rate sensing electrode.

16. The micromachined gyroscope of claim 15 , wherein the at least one in-plane rate sensing electrode includes:

a first z-axis rate sensing electrode disposed on a first side of the static mass; and

a second z-axis rate sensing electrode disposed on a second side of the static mass, the second side being opposite the first side.

17. The micromachined gyroscope of claim 15 , further comprising:

at least one in-plane drive electrode; and

at least one in-plane drive sensing electrode, the at least one in-plane drive electrode and the at least one in-plane drive sensing electrode being disposed in the region of the gyroscope closer to the center of the gyroscope than the at least one out-of-plane rate sensing electrode.

18. The micromachined gyroscope of claim 17 , wherein:

the at least one in-plane drive electrode includes a pair of drive electrodes disposed on a first side of the static mass; and

the at least one in-plane drive sensing electrode includes a pair of drive sensing electrodes disposed on a second side of the static mass, the second side being opposite the first side.

19. The micromachined gyroscope of claim 15 , wherein the at least one in-plane rate sensing electrode is configured to detect z-axis acceleration of the dynamic mass.

20. The micromachined gyroscope of claim 15 , wherein the at least one out-of-plane rate sensing electrode is configured to detect x-axis acceleration and y-axis acceleration of the dynamic mass.

Assignments (3)
RELEASE OF SECURITY INTEREST IN PATENTS PREVIOUSLY RECORDED AT REEL 058828, FRAME 0123 Recorded Aug 16, 2023
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 064615/0449 →
SECURITY INTEREST Recorded Nov 5, 2021
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 058828/0123 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 9, 2021
From: ACAR, CENK; SIMON, BRENTON; MAITY, SANDIPAN
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 057124/0943 →