X-ray based measurements in patterned structure
A method and system are presented for use in X-ray based measurements on patterned structures. The method comprises: processing data indicative of measured signals corresponding to detected radiation response of a patterned structure to incident X-ray radiation, and subtracting from said data an effective measured signals substantially free of background noise, said effective measured signals being formed of radiation components of reflected diffraction orders such that model based interpretation of the effective measured signals enables determination of one or more parameters of the patterned structure, wherein said processing comprises: analyzing the measured signals and extracting therefrom a background signal corresponding to the background noise; and applying a filtering procedure to the measured signals to subtract therefrom signal corresponding to the background signal, resulting in the effective measured signal.
1. A method for use in X-ray based measurements on patterned structures of a sample, the method being carried out by a computer system and comprising:
illuminating the patterned structures, by an incident X-ray radiation;
detecting, by a detection unit, an X-ray radiation response from the patterned structures
processing, by a processor utility of the computer system, measured signals corresponding to the X-ray radiation response of the patterned structures;
wherein the measured signals are indicative of a) an angular span of plurality of diffraction orders that were scattered from the patterned structure, and (b) background signals;
deducting, by a fitting module, the background signals to provide deducted background signals;
subtracting from measured signals within the angular span, the background signals to provide background removed signals that are substantially free of the background signals, and
determining, based on the background removed signals, one or more parameters of the patterned structure.
2. The method according to claim 1 , wherein the background signals comprise signals that are indicative of a roughness of the sample.
3. The method according to claim 1 , wherein the background signals comprise background noise signals.
4. The method according to claim 1 , wherein the incident X-ray radiation has a wavelength that is within a same range as one or more dimensions of the patterned structures.
5. The method according to claim 4 , wherein the determining of the one or more parameters of the patterned structures comprises using a dimensional model of the patterned structures.
6. The method according to claim 1 , comprising detecting the X-ray radiation response using a two dimensional array of pixels.
7. The method according to claim 6 , wherein the processing of the measured signals comprises image processing.
8. The method according to claim 1 , comprising deducing of the deduced background signals within the angular span.
9. The method according to claim 8 , wherein the deducing of the deduced background signals within the angular span comprises expanding the background signals outside of the angular span.
10. The method according to claim 9 , wherein the deducing of the deduced background signals within the angular span comprises ignoring signals originating from the different spatially separated regions on the radiation sensitive surface of the detector.
11. The method according to claim 1 , comprising determining a selected angular span of illumination that once applied results in the different diffraction orders interact with different spatially separated regions on a radiation sensitive surface of a detector.
12. The method according to claim 11 , comprising performing one or more measurement sessions on the patterned structure using the selected angular span of illumination.
13. The method according to claim 1 wherein the deducing of the deduced background signals comprises deducing the background signals over an entire image acquired by a radiation sensitive surface of a detector.
14. A measurement system for use in X-ray based measurements on patterned structures of a sample, the system comprising:
an illumination unit configured to illuminate the patterned structures, by an incident X-ray radiation;
a detection unit that is configured to detect an X-ray radiation response from the patterned structures;
a computer system that is configured to process measured signals corresponding to the X-ray radiation response of the patterned structures; wherein the measured signals are indicative of a) an angular span of plurality of diffraction orders that were scattered from the patterned structure, and (b) background signals;
a filling module that is configured to deduce the background signals to provide deducted background signals;
wherein the compute system is further configured to:
subtract from measured signals within the angular span, the background signals to provide background removed signals that are substantially free of the background signals, and
determine, based on the background removed signals, one or more parameters of the patterned structure.
15. The measurement system according to claim 14 , wherein the incident X-ray radiation has a wavelength that is within a same range as one or more dimensions of the patterned structures.
16. The measurement system according to claim 15 , wherein the compute system is configured to determine the one or more parameters of the patterned structures by using a dimensional model of the patterned structures.
17. The measurement system according to claim 16 , wherein the detection unit comprises a two dimensional array of pixels.
18. The measurement system according to claim 17 , wherein the computer system is configured to process the measured signals by performing image processing.
19. The measurement system according to claim 14 , wherein the computer system is configured to deduce the deduced background signals within the angular span.
20. The measurement system according to claim 19 , wherein the computer system is configured to expand the background signals outside of the angular span.