Systems and methods for synthesis of spheroidized metal powders
Disclosed herein are embodiments of systems and method for processing feedstock materials using microwave plasma processing. Specifically, the feedstock materials disclosed herein pertain to metal powders. Microwave plasma processing can be used to spheroidize the metal powders and form metal nitride or metal carbide powders. The stoichiometry of the metal nitride or metal carbide powders can be controlled by changing the composition of the plasma gas and the residence time of the feedstock materials during plasma processing.
1. A method for manufacturing a spheroidized powder, the method comprising:
providing a feedstock to a microwave plasma torch, the feedstock comprising titanium powder;
introducing the feedstock into a microwave plasma generated by the microwave plasma torch, the microwave plasma generated by subjecting a reactive plasma gas to microwaves from a microwave power source, the reactive plasma gas comprising at least nitrogen-containing gas; and
forming the spheroidized powder, the spheroidized powder formed by at least partially melting the feedstock and initiating a chemical reaction between the feedstock and the reactive plasma gas within the microwave plasma torch, and the spheroidized powder comprising one or more particles, the one or more particles comprising titanium nitride throughout a complete mass of the one or more particles,
wherein the one or more particles comprise a pre-determined concentration of nitrogen to form a TiN, Ti 2 N, or TiN 2 phase within the one or more particles by controlling an amount of the nitrogen-containing gas and a residence time of the feedstock in the reactive plasma gas.
2. The method of claim 1 , further comprising selecting a desired porosity, composition, or microstructure of the spheroidized powder, and wherein the spheroidized powder comprises the desired porosity, composition, or microstructure.
3. The method of claim 1 , wherein the spheroidized powder comprises a particle-size distribution between 15-106 microns.
4. The method of claim 1 , wherein the titanium powder comprises commercially pure titanium (cpTi) powder.
5. The method of claim 1 , wherein the titanium powder comprises gas atomized titanium powder, hydride-dehydride (HDH) titanium powder, or hydrided titanium powder.
6. The method of claim 1 , wherein the nitrogen-containing gas comprises one or more of hydrogen, helium, neon, argon, krypton, or xenon.
7. The method of claim 1 , wherein the reactive plasma gas comprises nitrogen gas (N 2 ).
8. The method of claim 1 , wherein the chemical reaction comprises:
2Ti+N 2 →2TiN; or
4Ti+N 2 →2Ti 2 N.
9. A method for manufacturing a spheroidized metal nitride powder, the method comprising:
providing a metal powder as a feedstock to a microwave plasma torch;
introducing the feedstock into a microwave plasma generated by the microwave plasma torch, the microwave plasma generated by subjecting a nitrogen-containing gas to microwaves from a microwave power source; and
forming the spheroidized metal nitride powder, the spheroidized metal nitride powder formed by at least partially melting the feedstock and initiating a chemical reaction between the feedstock and the nitrogen-containing gas within the microwave plasma torch, and the spheroidized metal nitride powder comprising one or more particles, the one or more particles comprising metal nitride throughout a complete mass of the one or more particles,
wherein the one or more particles comprise a pre-determined concentration of nitrogen to form a TiN, Ti 2 N, or TiN 2 phase within the one or more particles by controlling an amount of the nitrogen-containing gas and a residence time of the feedstock in the reactive plasma gas.