Semiconductor device with low resistances and methods of forming such
In an exemplary aspect, the present disclosure is directed to a device. The device includes a semiconductor substrate, a stack of semiconductor layers over the semiconductor substrate, a gate structure over and between the stack of semiconductor layers, where the gate structure engages with the stack of semiconductor layers. Moreover, the device also includes a silicide layer extending along sidewall surfaces of the stack of semiconductor layers, and a source/drain feature on a sidewall surface of the silicide layer.
1. A device, comprising:
a semiconductor substrate;
a stack of semiconductor layers over the semiconductor substrate;
a gate structure over and between the stack of semiconductor layers, and engaging with the stack of semiconductor layers;
a plurality of inner spacers disposed between two vertically adjacent semiconductor layers of the stack of semiconductor layers and next to the gate structure;
an epitaxial layer extending along sidewall surfaces of the stack of semiconductor layers and sidewall surfaces of the plurality of inner spacers;
a silicide layer extending along a sidewall surface of the epitaxial layer; and
a source/drain feature on a sidewall surface of the silicide layer.
2. The device of claim 1 , wherein the source/drain feature includes a metal material.
3. The device of claim 2 , wherein the source/drain feature is a first source/drain feature, the device further comprising a second source/drain feature having a semiconductor material.
4. The device of claim 1 , wherein the silicide layer extends from below a bottom surface of a lowest layer of the stack of semiconductor layers.
5. The device of claim 1 , wherein the silicide layer has a first sidewall surface facing the stack of semiconductor layers and a second sidewall surface facing away from the stack of semiconductor layers, wherein the second sidewall surface extends substantially parallel to the first sidewall surface.
6. The device of claim 1 , wherein the silicide layer has a first height along a vertical direction perpendicular to a top surface of the semiconductor substrate, a semiconductor layer of the stack of semiconductor layers has a second height along the vertical direction, and a ratio of the first height to the second height is about 5:1 to about 15:1.
7. The device of claim 1 , wherein the source/drain feature is spaced apart from the plurality of inner spacers by the epitaxial layer and the silicide layer.
8. The device of claim 1 , wherein a bottom surface of the source/drain feature is lower than a bottom surface of a bottommost semiconductor layer of the stack of semiconductor layers.
9. The device of claim 1 , wherein composition of the epitaxial layer is different than composition of the stack of semiconductor layers.
10. The device of claim 9 , wherein the epitaxial layer comprises a first layer and a second layer extending along an outer sidewall surface of the first layer, the first layer comprises boron doped silicon germanium, and the second layer comprises undoped silicon germanium.
11. A device, comprising:
a semiconductor substrate;
a first source/drain feature and a second source/drain feature over the semiconductor substrate;
a stack of semiconductor layers between the first source/drain feature and the second source/drain feature;
a first inner spacer disposed between the semiconductor substrate and a bottommost semiconductor layer of the stack of semiconductor layers;
a gate structure between the first source/drain feature and the second source/drain feature and further on and between adjacent layers of the stack of semiconductor layers;
an epitaxial layer extending along a sidewall surface of the first inner spacer and a sidewall surface the bottommost semiconductor layer of the stack of semiconductor layers; and
a silicide layer between a sidewall surface of the epitaxial layer and a sidewall surface of the first source/drain feature.
12. The device of claim 11 , wherein the epitaxial layer includes silicon germanium (SiGe).
13. The device of claim 11 , wherein the first source/drain feature includes a conductive material.
14. The device of claim 11 , wherein the second source/drain feature includes a semiconductor material.
15. The device of claim 11 , wherein the silicide layer extends from below a bottom surface of the bottommost semiconductor layer of the stack of semiconductor layers to above a top surface of a topmost semiconductor layer of the stack of semiconductor layers.
16. The device of claim 14 , further comprising:
a source/drain contact disposed over the second source/drain feature, wherein the source/drain contact and the first source/drain feature comprise same composition, and a top surface of the source/drain contact is lower than a topmost surface of the gate structure.
17. A semiconductor device, comprising:
a fin-shaped active region over a substrate and comprising a channel region and a source/drain region adjacent to the channel region;
a gate structure over the channel region;
inner spacers laterally disposed between the channel region and the gate structure;
a source/drain layer in and over the source/drain region and coupled to the channel region; and
a silicide layer and a continuous epitaxial layer disposed between the source/drain layer and the channel region, wherein the continuous epitaxial layer extends along sidewall surfaces of the inner spacers.
18. The semiconductor device of claim 17 , wherein the silicide layer wraps around a lower portion of the source/drain layer.
19. The semiconductor device of claim 17 , wherein the source/drain layer is formed of a metal layer.
20. The semiconductor device of claim 17 , wherein a bottommost surface of the silicide layer is lower than a top surface of a bottommost inner spacer of the inner spacers.