Semiconductor storage device
A semiconductor storage device includes a first conductive layer, a second conductive layer, a third conductive layer, a contact plug, a memory trench extending between the second conductive layer and the third conductive layer. The memory trench is formed around the contact plug, and surrounds a first area in which the contact plug is disposed. A second area is separated from the first area and includes a pillar penetrating the first conductive layer. The second conductive layer extends between the first and second areas, and is connected to the first conductive layer. The third conductive layer is on the opposite side of the first area to the second area, and is connected to the first conductive layer.
1. A semiconductor storage device comprising:
a plurality of first conductive layers, provided on a substrate, that extends in a first direction and extends in a second direction orthogonal to the first direction;
a plurality of second conductive layers, provided on the substrate, that extends in the first direction and the second direction, and are separated from the plurality of first conductive layers in a third direction orthogonal to the second direction;
a first insulating layer, arranged between the plurality of first conductive layers and the plurality of second conductive layers, that extends in the first direction and the second direction;
a plurality of first pillars, arranged in the first insulating layer along the second direction, that extend in the first direction;
a plurality of third conductive layers, provided on the substrate in the first direction, that extend in the second direction and are separated from the second conductive layer in the third direction;
a plurality of fourth conductive layers, provided on the substrate in the first direction, that extend in the second direction and are separated from the plurality of third conductive layers in the third direction;
a second insulating layer, arranged between the plurality of third conductive layers and the plurality of fourth conductive layers, that extends in the first direction and the second direction;
a plurality of second pillars, arranged in the second insulating layer along the second direction, that extend in the first direction; and
a contact plug, provided in the second insulating layer, that extends in the first direction,
wherein a width of the second insulating layer in the third direction is greater than a width of the first insulating layer in the third direction.
2. The semiconductor storage device according to claim 1 , further comprising:
a plurality of first insulating portions, arranged either in the first insulating layer or the second insulating layer, that extend in the first direction,
wherein the contact plug is arranged on a line along the third direction passing through the first insulating portions.
3. The semiconductor storage device according to claim 2 , wherein the second insulating layer has a plurality of insulating layers,
the device further comprising:
a second insulating portion, provided between the plurality of insulating layers, that extends in the first direction; and
a bit line, provided above the first pillar, that is electrically connected to the first pillar,
wherein the second insulating portion is arranged between the bit line and the substrate.
4. The semiconductor storage device according to claim 2 , wherein a width of each of the first insulating portions in the third direction is greater than the width of the first insulating layer in the third direction.
5. The semiconductor storage device according to claim 2 , wherein the contact plug and the first insulating portions are aligned along the third direction.
6. The semiconductor storage device according to claim 1 , wherein each of the plurality of first pillars is configured as a plurality of memory cell transistors.