Dot light emitting device, display apparatus and manufacturing method
Disclosed are a quantum dot material, a quantum dot light emitting device, a display apparatus and a manufacturing method. The quantum dot material includes: a quantum dot, an anionic ligand, and a linking group linking the quantum dot and the anionic ligand, wherein the anionic ligand is configured to bind to a ring molecule by electrostatic force.
1. A quantum dot light emitting device, comprising: a base substrate, a functional layer arranged on a side of the base substrate, a quantum dot film layer arranged on a side, facing away from the base substrate, of the functional layer, and a connecting layer arranged between the functional layer and the quantum dot film layer, wherein the quantum dot film layer comprises a patterned region;
the quantum dot film layer in the patterned region comprises a quantum dot material; and
a region, corresponding to the patterned region, of the connecting layer comprises: a ring molecule, a first structure connected with the ring molecule, and a connecting structure connecting the first structure and the functional layer, wherein the ring molecule and an anionic ligand bind by the electrostatic force, and the first structure is configured to connect or disconnect the ring molecule and the connecting structure under preset conditions;
wherein the quantum dot material comprises: a quantum dot, an anionic ligand, and a linking group linking the quantum dot and the anionic ligand, wherein the anionic ligand is configured to bind to a ring molecule by an electrostatic force.
2. The quantum dot light emitting device according to claim 1 , wherein the ring molecule has hydrogen atoms through which the ring molecule binds to the anionic ligand by the electrostatic force.
3. The quantum dot light emitting device according to claim 1 , wherein the first structure is a photodegradable group configured to disconnect the ring molecule from the connecting structure under ultraviolet irradiation.
4. The quantum dot light emitting device according to claim 3 , wherein the photodegradable group comprises: carbonyl or epoxy group.
5. The quantum dot light emitting device according to claim 1 , wherein the first structure comprises a structure formed after a first photocurable group and a second photocurable group are cross-linked with each other by ultraviolet irradiation, the first photocurable group is connected to the ring molecule, and the second photocurable group is connected to the connecting structure.
6. The quantum dot light emitting device according to claim 5 , wherein the first photocurable group is identical to the second photocurable group.
7. The quantum dot light emitting device according to claim 6 , wherein the first photocurable group comprises one or a combination of:
alkenyl;
alkynyl; and
cyano.
8. The quantum dot light emitting device according to claim 1 , wherein the ring molecule comprises a ring molecule structure composed of n repeating units connected in sequence, wherein 4≤n≤10.
9. The quantum dot light emitting device according to claim 8 , wherein the ring molecule comprises: a polymer of styrene or a polymer of a styrene derivative.
10. The quantum dot light emitting device according to claim 8 , wherein the ring molecule structure is
wherein the ring molecule is of a following structure:
11. The quantum dot light emitting device according to claim 1 , wherein the connecting structure comprises: a silyl chain, or a siloxanyl chain;
wherein the connecting structure further comprises a structure formed by binding one or a combination of following groups connected to a silicon atom with the functional layer:
—Cl;
—OCH 3 ; and
—OH.
12. A display apparatus, comprising the quantum dot light emitting device according to claim 1 .
13. A manufacturing method of the quantum dot light emitting device according to claim 1 , comprising:
providing a base substrate;
forming a functional layer on a side of the base substrate;
forming a connecting layer on a side, facing away from the base substrate, of the functional layer, wherein the connecting layer comprises: a ring molecule, a first structure connected with the ring molecule, and a connecting structure connecting the first structure and the functional layer;
forming a quantum dot film on a side, facing away from the functional layer, of the connecting layer, wherein the quantum dot film comprises: a quantum dot, an anionic ligand, and a linking group linking the quantum dot and the anionic ligand; and
treating the quantum dot film and the connecting layer under preset conditions to form a patterned quantum dot film layer.
14. The manufacturing method according to claim 13 , wherein the first structure comprises a structure formed after a first photocurable group and a second photocurable group are cross-linked with each other by ultraviolet radiation, the first photocurable group is connected to the ring molecule, and the second photocurable group is connected to the connecting structure; and the treating the quantum dot film and the connecting layer through the preset conditions to form the patterned quantum dot film layer comprises:
shielding a region where the quantum dot film is removed, and performing ultraviolet irradiation to make the first photocurable group and the second photocurable group of an irradiated region cross-linked, so as to reserve a quantum dot film in the irradiated region;
wherein the forming the connecting layer on the side, facing away from the base substrate, of the functional layer comprises:
forming a first sub-connecting layer on the side, facing away from the base substrate, of the functional layer, wherein the first sub-connecting layer comprises the connecting structure and the second photocurable group connected with the connecting structure; and
forming a second sub-connecting layer on a side, facing away from the functional layer, of the first sub-connecting layer, wherein the second sub-connecting layer comprises the ring molecule and the first photocurable group connected with the ring molecule;
wherein after the quantum dot film and the connecting layer are treated under the preset conditions to form the patterned quantum dot film layer, the manufacturing method further comprises:
reusing the first sub-connecting layer that is not removed from the shielded region as a first sub-connecting layer to manufacture a quantum dot film of a next emergent light color;
wherein the first structure is a photodegradable group; and the treating the quantum dot film and the connecting layer under the preset conditions to form the patterned quantum dot film layer comprises:
shielding a region where the quantum dot film is reserved and performing ultraviolet irradiation to decompose the photodegradable group in an irradiated region and disconnect the ring molecule from the connecting structure, so as to remove the quantum dot film in the irradiated region;
wherein the forming the connecting layer on the side, facing away from the base substrate, of the functional layer comprises:
forming the connecting layer comprising the ring molecule, the photodegradable group and the connecting structure on the side, facing away from the base substrate, of the functional layer.