Granted Patent B2

US 12,565,416 · App. 17/476,348 · Granted Mar 3, 2026

Inventors: Sergiu Langa (Dresden, DE); Holger Conrad (Dresden, DE); Bert Kaiser (Dresden, DE)

Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.

B81B3/0021H04R19/005B81B2201/0257B81B2201/032B81B2201/033B81B2201/036B81B2203/051H04R2201/003

Abstract

Claims (13)

1 . A microelectromechanical system (MEMS), comprising:

a substrate comprising a cavity;

a movable layer arrangement arranged in the cavity comprising a first beam, a second beam and a third beam that is arranged between the first beam and the second beam and that is fixed at discrete areas electrically insulated from the same;

wherein the movable layer arrangement is configured to perform a movement along a direction of movement in-plane with respect to a substrate plane in response to an electrical potential between the first beam and the third beam or in response to an electrical potential between the second beam and the third beam;

wherein the first beam, the second beam and the third beam are part of a first layer of the movable layer arrangement and the movable layer arrangement comprises a second layer that is arranged adjacent to the first layer along a direction perpendicular to the substrate plane, wherein the second layer is arranged movably along the direction of movement;

wherein, in relation to the first layer, the second layer provides additional area for interaction with a fluid.

2 . The MEMS according to claim 1 , wherein the first beam, the second beam and the third beam form a movable element and wherein the second layer forms a resistor structure for interaction with a fluid in the cavity, which is mechanically connected to the movable element and which is moved together and/or deformed together with the movable element.

3 . The MEMS according to claim 2 , wherein the resistor structure comprises several partial elements that are arranged perpendicular to the direction of movement and in parallel to the substrate plane along an axial extension direction of the movable layer arrangement.

4 . The MEMS according to claim 3 , wherein the partial elements are at a distance to one another along the axial extension direction.

5 . The MEMS according to claim 4 , wherein the distance is at most 100 μm, advantageously at most 100 μm, most advantageously at most 1 μm.

6 . The MEMS according to claim 3 , wherein the partial elements are mechanically firmly connected either to the first beam or to the second beam or to the third beam.

7 . The MEMS according to claim 3 , wherein the partial elements are arranged on at least two of the first beam, the second beam and the third beam.

8 . The MEMS according to claim 2 , wherein the resistor structure is adapted to provide a mechanical fluidical resistance when interacting with the fluid.

Assignments (1)

Priority Claims (1)

Continuity (2)

References Cited (27)