IP Library › Granted Patent US 11,592,946
Granted Patent B1
US 11,592,946 · App. 17/481,122 · Granted Feb 28, 2023

Capacitive gap force sensor with multi-layer fill

Inventors: Daniel J. Bechstein (Mountain View, CA); Nahid Harjee (Sunnyvale, CA); Travis N. Owens (Lakeway, TX)
Assignee: Apple Inc.
G06F3/0445G06F3/0412G06F2203/04103G06F2203/04105
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Quick Facts
Patent No.
US 11,592,946
App. No.
17/481,122
Granted
Feb 28, 2023
Kind
B1
Abstract

A capacitive gap force sensor includes a first electrode, a second electrode spaced apart from the first electrode, a first layer of dielectric material positioned between the first electrode and the second electrode, and a second layer of conductive material positioned between the first layer and the second electrode. The first layer has a first compression resistance less than a second compression resistance of the second layer. An effective capacitive sensing gap is defined between the first electrode and the second layer. The first layer is configured to compress or deform and alter the effective capacitive sensing gap when a force is received at the first electrode or the second electrode.

Claims (61)

1. An electronic device, comprising:

a capacitive gap force sensor, comprising:

a first electrode;

a second electrode spaced apart from the first electrode;

a first layer of dielectric material positioned between the first electrode and the second electrode; and

a second layer of conductive material positioned between the first layer and the second electrode; and

a housing having a force input surface; wherein,

the first layer has a first compression resistance less than a second compression resistance of the second layer;

an effective capacitive sensing gap is defined between the first electrode and the second layer;

the capacitive gap force sensor is positioned near or against an interior surface of the housing, under the force input surface; and

the first layer is configured to compress or deform and alter the effective capacitive sensing gap when a force is received on the force input surface.

2. The electronic device of claim 1 , wherein the first layer and the second layer are part of a multi-layer fill that spans an entirety of a space between the first electrode and the second electrode.

3. The electronic device of claim 1 , wherein the first layer comprises a polymer foam.

4. The electronic device of claim 1 , wherein each of the first layer and the second layer comprises a polymer foam.

5. The electronic device of claim 1 , wherein the housing comprises acrylonitrile butadiene styrene (ABS).

6. The electronic device of claim 5 , wherein a first stiffness of the first electrode and a second stiffness of the first layer are at least an order of magnitude less stiff than a third stiffness of the force input surface.

7. The electronic device of claim 1 , wherein the capacitive gap force sensor defines an air gap between one of:

the first electrode and the first layer; or

the first layer and the second layer.

8. The electronic device of claim 1 , further comprising:

a capacitive force sensing circuit coupled to at least one of the first electrode or the second electrode.

9. A capacitive gap force sensor, comprising:

a first electrode;

a second electrode spaced apart from the first electrode;

a first layer of dielectric material positioned between the first electrode and the second electrode; and

a second layer of conductive material positioned between the first layer and the second electrode; wherein,

the first layer has a first compression resistance less than a second compression resistance of the second layer;

an effective capacitive sensing gap is defined between the first electrode and the second layer; and

the first layer is configured to compress or deform and alter the effective capacitive sensing gap when a force is received at the first electrode or the second electrode.

10. The capacitive gap force sensor of claim 9 , wherein each of the first layer and the second layer comprises a hydrophobic material.

11. The capacitive gap force sensor of claim 9 , wherein each of the first layer and the second layer comprises a closed cell foam.

12. The capacitive gap force sensor of claim 9 , wherein the second layer comprises an open cell foam.

13. The capacitive gap force sensor of claim 9 , further comprising:

an adhesive attaching the first layer to the second layer.

14. The capacitive gap force sensor of claim 9 , wherein the second layer comprises a polymer foam at least partially coated with a metal.

15. A method of constructing a capacitive gap force sensor, comprising:

constructing a stack of materials, the constructing including,

attaching a first electrode to a first surface of a first layer of dielectric material;

attaching a second electrode to a first surface of a second layer of conductive material; and

attaching a second surface of the first layer to a second surface of the second layer;

compressing the stack of materials; and

structurally modifying the second layer, after compressing the stack of materials; wherein,

the second surface of the first layer is opposite the first surface of the first layer;

the second surface of the second layer is opposite the first surface of the second layer; and

the stack of materials defines an effective capacitive sensing gap between the first electrode and the second layer of conductive material;

after constructing the stack of materials, the first layer has a first compression resistance greater than a second compression resistance of the second layer; and

the structural modification of the second layer transitions the second compression resistance to a compression resistance greater than the first compression resistance.

16. The method of claim 15 , wherein structurally modifying the second layer comprises:

heating the second layer.

17. The method of claim 15 , wherein structurally modifying the second layer comprises:

exposing the second layer to a predetermined wavelength or wavelengths of light.

18. The method of claim 15 , wherein structurally modifying the second layer comprises:

exposing the second layer to oxygen or removing oxygen from an environment of the second layer.

19. The method of claim 15 , wherein structurally modifying the second layer comprises:

chemically treating the second layer.

20. The method of claim 15 further comprising:

positioning the stack of materials within an electronic device; wherein,

the compressing occurs at least partially during the positioning.

21. The method of claim 15 , further comprising:

positioning the stack of materials within an electronic device; wherein,

the compressing occurs at least partially after the positioning.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 23, 2021
From: BECHSTEIN, DANIEL J.; HARJEE, NAHID; OWENS, TRAVIS N.
To: APPLE INC.
Reel/Frame 057887/0528 →
Cited By (2)
US 12,203,783 US 12,449,936