IP Library Granted Patent US 11,742,177
Granted Patent B2
US 11,742,177 · App. 17/500,627 · Granted Aug 29, 2023

Charged particle beam apparatus and control method thereof

Inventors: Ayana Muraki (Tokyo, JP); Tatsuya Asahata (Tokyo, JP); Atsushi Uemoto (Tokyo, JP)
Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
H01J37/3045H01J37/222H01J37/28H01J2237/30405
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Quick Facts
Patent No.
US 11,742,177
App. No.
17/500,627
Granted
Aug 29, 2023
Kind
B2
Abstract

Automated processing is provided. A charged particle beam apparatus includes: an image identity degree determination unit determining whether an identity degree is equal to or greater than a predetermined value, the identity degree indicating a degree of identity between a processing cross-section image that is an SEM image obtained through observation of a cross section of the sample by a scanning electron microscope, and a criterion image that is the processing cross-section image previously registered; and a post-determination processing unit performing a predetermined processing operation according to a result of the determination by the image identity degree determination unit.

Claims (47)

1. A control method of a charged particle beam apparatus that processes a sample by irradiating the sample with a charged particle beam and comprises a scanning electron microscope (SEM), the control method comprising:

acquiring a processed cross-section image of the sample;

determining whether a particular structure appears on the processed cross-section image or not based on a criterion image; and

performing processing of the sample again or terminating the processing of the sample based on a result of determination,

wherein the criterion image is an image on which the particular structure appears and the particular structure is a structure which appears at a processing end,

the criterion image is acquired by producing a cross section, and

a scan speed of SEM when producing the cross section to acquire the criterion image is lower than a scan speed of SEM when acquiring the processed cross section image.

2. The method according to claim 1 , further comprising producing a cross-section to acquire the criterion image,

wherein resolution of SEM when acquiring the processed cross-section image is lower than resolution of SEM when producing the cross-section to acquire the criterion image.

3. A control method of a charged particle beam apparatus that processes a sample by irradiating the sample with a charged particle beam and comprises a scanning electron microscope (SEM), the control method comprising:

acquiring a processed cross-section image of the sample;

determining whether a particular structure appears on the processed cross-section image or not based on a criterion image; and

performing processing of the sample again or terminating the processing of the sample based on a result of determination,

wherein the criterion image is an image on which the particular structure appears, the particular structure is a structure which appears at a processing end, and

the criterion image is acquired by producing a cross section and

wherein magnification of SEM when acquiring the processed cross-section image is lower than magnification of SEM when producing the cross-section to acquire the criterion image.

4. A control method of a charged particle beam apparatus that processes a sample having a periodic structure by irradiating the sample with a charged particle beam, the control method comprising:

acquiring a processed cross-section image of the sample;

determining whether a particular structure appears on the processed cross-section image or not based on a criterion image; and

counting a number of times determination is made based on a result of determination,

wherein the criterion image is an image on which a particular structure appears and the particular structure is a structure which appears at a processing end, the criterion image is acquired by producing a cross section, and

a scan speed of SEM when producing the cross section to acquire the criterion image is lower than a scan speed of SEM when acquiring the processed cross section image.

5. The method according to claim 4 , wherein processed thickness is calculated by counting the number of times determination is made and terminating processing when the processed thickness becomes a predetermined thickness.

6. A control method of a charged particle beam apparatus that processes a sample by irradiating the sample with a charged particle beam, the control method comprising:

acquiring a processed cross-section image of the sample;

determining whether a particular structure appears on the processed cross-section image or not based on a criterion image; and

performing processing of the sample again when it is determined that the particular structure does not appear on the processed cross-section image,

wherein the criterion image is an image on which a particular structure appears,

the particular structure is a structure that characterizes a processing end,

the criterion image is acquired by producing a cross section, and

a scan speed of SEM when producing the cross section to acquire the criterion image is lower than a scan speed of SEM when acquiring the processed cross section image.

7. A control method of a charged particle beam apparatus that

processes a sample having a periodic structure by irradiating the sample with a charged particle beam, the control method comprising:

acquiring a processed cross-section image of the sample;

determining the processed cross-section image based on a criterion image; and

counting a number of times determination is made based on a result of determination,

wherein the criterion image is an image on which a particular structure appears and the particular structure is a structure which appears at a processing end,

the criterion image is acquired by producing a cross section, and

wherein magnification of SEM when acquiring the processed cross-section image is lower than magnification of SEM when producing the cross section to acquire the criterion image.

8. A control method of a charged particle beam apparatus that processes a sample by irradiating the sample with a charged particle beam, the control method comprising:

acquiring a processed cross-section image of the sample;

determining whether a particular structure appears on the processed cross section image or not based on a criterion image and

performing processing of the sample again when it is determined that the particular structure does not appear on the processed cross-section image,

wherein the criterion image is an image on which a particular structure appears,

the particular structure is a structure that characterizes a processing end,

the criterion image is acquired by producing a cross section, and

wherein magnification of SEM when acquiring the processed cross-section image is lower than magnification of SEM when producing the cross section to acquire the criterion image.

Assignments (2)
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072903/0672 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 28, 2023
From: MURAKI, AYANA; ASAHATA, TATSUYA; UEMOTO, ATSUSHI
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 064099/0391 →
Priority Claims (1)
JP 2019-057813 · Mar 26, 2019 · national
Continuity (2)
Continuation 16820852 · Mar 17, 2020
Related Publication 20220084785A1 · Mar 17, 2022