Wireless intracranial monitoring system
Some embodiments of the present disclosure comprise improved systems and methods for monitoring physiological parameters such as intracranial pressure (“ICP”), intracranial temperature, and subject head position. For example, in some embodiments, an implantable apparatus for measuring ICP can be implanted into a subject skull. The apparatus can comprise an implant body having a hermetically sealed chamber housing a gas at a reference pressure, and a pressure conduction catheter having a proximal end and a distal end, wherein the distal end is configured to extend into the brain through a burr hole in the skull and includes a plurality of ports. A barrier can cover the ports of the distal end of the pressure conduction catheter, wherein the barrier and pressure conduction catheter are filled with a number of gas molecules so that the barrier is not in tension in a predefined range of ICPs.
1 . An apparatus for measuring intracranial pressure (ICP) in a head, the apparatus comprising:
an implant body comprising a sealed cavity with a deformable diaphragm and a neck, the neck extending circumferentially around the diaphragm and distally from the implant body, wherein the implant body further comprises one or more strain reliefs configured to isolate the diaphragm from applied side-loading forces;
a catheter junction configured to attach to the neck;
a pressure conduction catheter extending from a proximal end to a distal end and defining an inner lumen therethrough, the distal end of the pressure conduction catheter comprising one or more ports configured to allow media to flow into the inner lumen, and the proximal end of the pressure conduction catheter configured to attach to the catheter junction so that the one or more ports are in fluid communication with the diaphragm, wherein the diaphragm is configured to prevent the media from entering the sealed cavity via the pressure conduction catheter; and
a sensor configured to obtain data indicative of the ICP at the one or more ports.
2 . The apparatus of claim 1 , wherein the implant body comprises a wall, and wherein the wall and the diaphragm are unibody.
3 . The apparatus of claim 1 , wherein the pressure conduction catheter and the catheter junction are attached by epoxy.
4 . The apparatus of claim 3 , wherein the catheter junction comprises an inner threaded section configured to receive the proximal end of the pressure conduction catheter therein such that the inner threaded section provides greater surface area for epoxy bonding.
5 . The apparatus of claim 1 , wherein the inner lumen is configured to fill with media, and wherein the diaphragm prevents the media from exiting the proximal end of the pressure conduction catheter.
6 . The apparatus of claim 5 , wherein the media comprises a gas.
7 . The apparatus of claim 5 , wherein the media comprises a liquid.
8 . The apparatus of claim 1 , wherein the sensor comprises a strain gauge configured to detect deformation of the diaphragm.
9 . The apparatus of claim 1 , wherein the one or more ports comprises a plurality of ports disposed along an axial length of the catheter.
10 . The apparatus of claim 1 , wherein the pressure conduction catheter is configured to be trimmed in length so that the distal end of the pressure conduction catheter terminates at a desired measurement depth when inserted into the head.
11 . The apparatus of claim 1 , further comprising a barrier configured to cover the one or more ports.
12 . An apparatus for measuring intracranial pressure (ICP) in a head, the apparatus comprising:
an implant body comprising a sealed cavity with a deformable diaphragm, one or more strain reliefs configured to isolate the diaphragm from applied side-loading forces, and standoffs extending distally from the implant body and configured to facilitate the conduction of top-loading force along walls of the implant body;
a pressure conduction catheter extending from a proximal end to a distal end and defining an inner lumen therethrough, the distal end of the pressure conduction comprising one or more ports configured to allow media to flow into the inner lumen, and the proximal end of the pressure conduction catheter configured to couple with the implant body so that the one or more ports are in fluid communication with the diaphragm, wherein the diaphragm is configured to prevent the media from entering the sealed cavity via the pressure conduction catheter; and
a sensor configured to obtain data indicative of the ICP at the one or more ports.
13 . The apparatus of claim 12 , further comprising a catheter junction configured to couple the pressure conduction catheter with the implant body.
14 . The apparatus of claim 12 , wherein the inner lumen is configured to fill with media, and wherein the diaphragm prevents the media from exiting the proximal end of the pressure conduction catheter.
15 . The apparatus of claim 12 , further comprising a sensor configured to detect the head position or orientation.
16 . An apparatus for measuring intracranial pressure (ICP) in a head, the apparatus comprising:
an implant body comprising a sealed cavity, a deformable diaphragm, and one or more strain reliefs configured to isolate the diaphragm from applied forces;
a pressure conduction catheter extending from a proximal end to a distal end and defining an inner lumen therethrough, the distal end of the pressure conduction catheter comprising one or more ports, the proximal end of the pressure conduction catheter configured to couple with the implant body so that the one or more ports are in fluid communication with the diaphragm, and the inner lumen configured to fill with media, wherein the diaphragm prevents the media from exiting the proximal end of the pressure conduction catheter and entering the sealed cavity via the pressure conduction catheter; and
a sensor configured to obtain data indicative of the ICP at the one or more ports.
17 . The apparatus of claim 16 , wherein the sensor comprises a strain gauge configured to detect deformation of the diaphragm.
18 . The apparatus of claim 16 , further comprising a catheter junction configured to couple the pressure conduction catheter with the implant body.
19 . The apparatus of claim 18 , wherein the catheter junction comprises an inner threaded section configured to receive the proximal end of the pressure conduction catheter therein such that the inner threaded section provides greater surface area for epoxy bonding.
20 . The apparatus of claim 16 , further comprising a barrier configured to cover the one or more ports.