IP Library Granted Patent US 11,953,390
Granted Patent B2
US 11,953,390 · App. 17/537,807 · Granted Apr 9, 2024

Backpressure monitoring apparatus

Inventors: Sukti Chatterjee (San Jose, CA); David Masayuki Ishikawa (Mountain View, CA); Yuriy V. Melnik (San Jose, CA); David A. Britz (Los Gatos, CA); Lance A. Scudder (Sunnyvale, CA)
Assignee: Applied Materials, Inc.
G01L13/00G01F1/34B05B12/006
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Quick Facts
Patent No.
US 11,953,390
App. No.
17/537,807
Granted
Apr 9, 2024
Kind
B2
Abstract

Exemplary backpressure monitoring apparatuses may include a fluid supply source having a fluid port. The backpressure monitoring apparatuses may include a flow control mechanism fluidly coupled with the fluid port. The backpressure monitoring apparatuses may include a delivery tube fluidly coupled with the flow control mechanism and the fluid port. The backpressure monitoring apparatuses may include a pressure differential gauge fluidly coupled with the delivery tube. The pressure differential gauge may include an interface mechanism that is engageable with an outlet of a fluid flow device.

Claims (48)

1. A method of monitoring backpressure in a fluid flow device, comprising:

introducing a fluid through a flow control mechanism, wherein the fluid is at a fixed flow rate;

flowing the fluid through an inlet of a nozzle;

measuring a pressure differential between the inlet and a spray outlet of the nozzle;

measuring a difference between the pressure differential and a baseline pressure differential that is indicative of flow through a new nozzle; and

determining whether flow conductance is reduced through the nozzle based on the difference between the pressure differential and the baseline pressure differential.

2. The method of monitoring backpressure in a fluid flow device of claim 1 , wherein:

the nozzle comprises an additional inlet; and

the method further comprises:

measuring an additional pressure differential between the additional inlet and the outlet;

measuring a difference between the additional pressure differential and an additional baseline pressure differential; and

determining whether flow conductance is reduced through the nozzle based on the difference between the pressure differential and the baseline pressure differential and the difference between the additional pressure differential and an additional baseline pressure differential.

3. The method of monitoring backpressure in a fluid flow device of claim 2 , further comprising:

determining a source of reduced flow conductance through the nozzle based on the pressure differential between the inlet and the outlet and the pressure differential between the additional inlet and the outlet.

4. The method of monitoring backpressure in a fluid flow device of claim 1 , wherein:

the flow control mechanism comprises a restrictor valve;

the fluid is introduced while the restrictor valve is at a first valve position; and

the method further comprises:

adjusting a restrictor valve to a second valve position; and

measuring the pressure differential between the inlet and the outlet at the second valve position.

5. The method of monitoring backpressure in a fluid flow device of claim 1 , further comprising:

determining a flow conductance through the nozzle based on the pressure differential.

6. The method of monitoring backpressure in a fluid flow device of claim 1 , wherein:

a negative pressure source is used to introduce the fluid through the flow control mechanism.

7. The method of monitoring backpressure in a fluid flow device of claim 1 , further comprising:

coating an interior of the nozzle with an anti-coking material;

measuring a pressure differential between the inlet and the outlet of the coated nozzle; and

measuring a difference between the pressure differential between the inlet and the outlet of the coated nozzle and the baseline pressure differential.

8. A method of monitoring backpressure in a fluid flow device, comprising:

flowing a fluid through an inlet of a fluid flow device;

measuring a pressure differential between the inlet and a spray outlet of the fluid flow device;

measuring a difference between the pressure differential and a baseline pressure differential that is indicative of flow through a new fluid flow device; and

determining whether flow conductance is reduced through the fluid flow device based on the difference between the pressure differential and the baseline pressure differential.

9. The method of monitoring backpressure in a fluid flow device of claim 8 , wherein:

the fluid flow device comprises a fuel nozzle, a cooling channel, a showerhead for distributing fluid, an endoscope, or a nanopore.

10. The method of monitoring backpressure in a fluid flow device of claim 8 , wherein:

the outlet delivers the fluid to a pressurized environment; and

the method further comprises coupling a first end of a fluid conduit with the outlet and positioning an open second end of the fluid conduit within the pressurized environment.

11. The method of monitoring backpressure in a fluid flow device of claim 8 , further comprising:

measuring the pressure differential between the inlet and the outlet at a plurality of different flow settings of a flow control mechanism that is coupled with a source of the fluid; and

generating a pressure differential curve based on the pressure differential measured at each of the plurality of different flow settings of the flow control mechanism.

12. The method of monitoring backpressure in a fluid flow device of claim 8 , further comprising:

determining a flow conductance through the fluid flow device based on the pressure differential.

13. The method of monitoring backpressure in a fluid flow device of claim 8 , further comprising:

monitoring changes in flow conductance through the fluid flow device based on a plurality of pressure differential measurements.

14. The method of monitoring backpressure in a fluid flow device of claim 13 , further comprising:

emitting a spray of the fluid through the outlet of the fluid flow device; and

mapping the changes in flow conductance to changes in spray patterns of the fluid flow device.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 27, 2021
From: CHATTERJEE, SUKTI; ISHIKAWA, DAVID MASAYUKI; MELNIK, YURIY V.; BRITZ, DAVID A.; SCUDDER, LANCE A.
To: APPLIED MATERIALS, INC.
Reel/Frame 058480/0643 →
Continuity (1)
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