RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN

1 . A radiation-sensitive resin composition comprising:

a polymer which comprises: a first structural unit comprising a phenolic hydroxyl group; and a second structural unit represented by formula (1); and

a radiation-sensitive acid generating agent which comprises a compound represented by formula (2):

wherein; in the formula (1), R 1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; R 2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; and R 3 represents a divalent monocyclic alicyclic hydrocarbon group having 3 to 12 ring atoms, and

in the formula (2), Ar 1 represents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; R 4 represents a monovalent organic group having 1 to 20 carbon atoms; p is an integer of 1 to 3, wherein in a case in which p is 1, two R 4 s are identical or different from each other; q is an integer of 0 to 7; wherein in a case in which q is 1, R 5 represents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, and in a case in which q is no less than 2, a plurality of R 5 s are identical or different and each R 5 represents a halogen atom; a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or at least two of the plurality of R 5 s taken together represent an alicyclic structure having 4 to 20 ring atoms or an aliphatic heterocyclic structure having 4 to 20 ring atoms, together with the carbon chain to which the at least two of the plurality of R 5 s bond; in a case in which p is no less than 2, a plurality of Ar 1 s are identical or different from each other, and a plurality of q's are identical or different from each other; and X − represents a monovalent anion.

2 . The radiation-sensitive resin composition according to claim 1 , wherein p in the formula (2) is 1.

3 . The radiation-sensitive resin composition according to claim 1 , wherein X − in the formula (2) is represented by formula (3):

R 6 —Y −   (3)

Wherein, in the formula (3), R 6 represents a monovalent organic group having 1 to 30 carbon atoms; and Y − represents a group obtained by removing one proton from an acid group.

4 . The radiation-sensitive resin composition according to claim 3 , wherein in the formula (2), in a case in which q is 1, R 5 represents a halogen atom, a nitro group, a monovalent unsubstituted hydrocarbon group having 1 to 20 carbon atoms, or a monovalent hydrocarbon group having 1 to 20 carbon atoms in which a part or all of hydrogen atoms are substituted with a substituent, and in a case in which q is no less than 2, a plurality of R 5 s are identical or different and each R 5 represents a halogen atom, a nitro group, a monovalent unsubstituted hydrocarbon group having 1 to 20 carbon atoms, or a monovalent hydrocarbon group having 1 to 20 carbon atoms in which a part or all of hydrogen atoms are substituted with a substituent, or at least two of the plurality of R 5 s taken together represent an alicyclic structure having 4 to 20 ring atoms or an aliphatic heterocyclic structure having 4 to 20 ring atoms, together with the carbon chain to which the at least two of the plurality of R 5 s bond.

5 . The radiation-sensitive resin composition according to claim 4 , wherein the acid group is a sulfo group or a carboxy group.

6 . The radiation-sensitive resin composition according to claim 1 , wherein the first structural unit is represented by formula (4):

wherein, in the formula (4), R 7 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; R 8 represents a single bond, —O—, —COO—, or —CONH—; Ar 2 represents a group obtained by removing (r+s+1) hydrogen atoms on an aromatic ring from an arene having 6 to 20 ring atoms; r is an integer of 0 to 10, wherein in a case in which r is 1, R 9 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms, and in a case in which r is no less than 2, a plurality of R 9 s are identical or different and each R 9 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms, or at least two of the plurality of les taken together represent a ring structure having 4 to 20 ring atoms together with the carbon chain to which the at least two of the plurality of R 9 s bond; and s is an integer of 1 to 11, wherein a sum of r and s is no greater than 11.

7 . A radiation-sensitive resin composition comprising:

a polymer which comprises: a first structural unit represented by formula (5); and a second structural unit represented by formula (6); and

a radiation-sensitive acid generating agent which comprises a compound represented by formula (2):

wherein, in the formula (5), R 10 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; Ar 3 represents a group obtained by removing (t+u+1) hydrogen atoms on an aromatic ring from an arene having 6 to 20 ring atoms; t is an integer of 0 to 10, wherein in a case in which t is 1, R 11 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms, and in a case in which t is no less than 2, a plurality of R 11 s are identical or different and each R 11 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms, or at least two of the plurality of R 11 s taken together represent a ring structure having 4 to 20 ring atoms together with the carbon chain to which the at least two of the plurality of R 11 s bond; and u is an integer of 1 to 11, wherein a sum of t and u is no greater than 11,

in the formula (6), R 12 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; R 13 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; and R 14 represents a divalent alicyclic hydrocarbon group having 3 to 30 ring atoms, and

in the formula (2), Ar 1 represents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; R 4 represents a monovalent organic group having 1 to 20 carbon atoms; p is an integer of 1 to 3, wherein in a case in which p is 1, two R 4 s are identical or different from each other; q is an integer of 0 to 7, wherein in a case in which q is 1; R 5 represents a halogen atom; a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, and in a case in which q is no less than 2, a plurality of R 5 s are identical or different and each R 5 represents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or at least two R 5 s taken together represent an alicyclic structure having 4 to 20 ring atoms or an aliphatic heterocyclic structure having 4 to 20 ring atoms, together with the carbon chain to which the at least two R 5 s bond; in a case in which p is no less than 2, a plurality of Ar 1 s are identical or different from each other, and a plurality of q's are identical or different from each other; and X − represents a monovalent anion.

8 . The radiation-sensitive resin composition according to claim 7 , wherein p in the formula (2) is 1.

9 . The radiation-sensitive resin composition according to claim 7 , wherein X − in the formula (2) is represented by formula (3):

R 6 —H −   (3)

wherein; in the formula (3), R 6 represents a monovalent organic group having 1 to 30 carbon atoms; and Y − represents a group obtained by removing one proton from an acid group.

10 . The radiation-sensitive resin composition according to claim 9 , wherein in the formula (2), in a case in which q is 1, R 5 represents a halogen atom, a nitro group, a monovalent unsubstituted hydrocarbon group having 1 to 20 carbon atoms, or a monovalent hydrocarbon group having 1 to 20 carbon atoms in which a part or all of hydrogen atoms are substituted with a substituent, and in a case in which q is no less than 2; a plurality of R 5 s are identical or different and each R 5 represents a halogen atom, a nitro group, a monovalent unsubstituted hydrocarbon group having 1 to 20 carbon atoms, or a monovalent hydrocarbon group having 1 to 20 carbon atoms in which a part or all of hydrogen atoms are substituted with a substituent, or at least two of the plurality of R 5 s taken together represent an alicyclic structure having 4 to 20 ring atoms or an aliphatic heterocyclic structure having 4 to 20 ring atoms, together with the carbon chain to which the at least two of the plurality of R 5 s bond.

11 . The radiation-sensitive resin composition according to claim 10 , wherein the acid group is a sulfo group or a carboxy group.

12 . The radiation-sensitive resin composition according to claim 1 , which is suitable for exposure to extreme ultraviolet light or exposure to an electron beam.

13 . The radiation-sensitive resin composition according to claim 7 , which is suitable for exposure to extreme ultraviolet light or exposure to an electron beam.

14 . A method of forming a resist pattern, the method comprising:

forming a resist film directly or indirectly on a substrate by applying the radiation-sensitive resin composition according to claim 1 ;

exposing the resist film; and

developing the resist film exposed.

15 . A method of forming a resist pattern, the method comprising:

forming a resist film directly or indirectly on a substrate by applying the radiation-sensitive resin composition according to claim 7 ;

exposing the resist film; and

developing the resist film exposed.