Sensor deconfliction in multilaser additive manufacturing systems
This disclosure describes an additive manufacturing system that includes a build plane having a first region and a second region. Multiple energy source can be positioned above the build plane and configured to direct energy into the first and second regions of the build plane. The system includes optical sensors configured to monitor an intensity of light emitted from the energy sources. A processor associated with the additive manufacturing system is configured to adjust the sensor outputs in response to the energy sources coming into close proximity.
1. An additive manufacturing system, comprising:
a build plane;
a plurality of energy sources each arranged to direct a respective beam of energy across the build plane;
a plurality of sensors arranged to sense energy emitted from the build plane; and
a processor adapted to receive data from each of the plurality of sensors and to adjust the data received from at least one sensor of the plurality of sensors based on a distance between at least two of the beams of energy at the build plane; and
wherein the processor is adapted to adjust the data when the distance is below a threshold distance and wherein each sensor of the plurality of sensors has a respective field of view and wherein the threshold distance is based on a size of the respective fields of view.
2. The additive manufacturing system of claim 1 wherein the processor is further adapted to adjust the data received from the at least one sensor of the plurality of sensors based on an amount of time that the distance between the at least two of the beams of energy is below a threshold distance.
3. The additive manufacturing system of claim 1 wherein the processor is adapted to adjust the data when at least two of the respective fields of view at least partially overlap.
4. The additive manufacturing system of claim 3 wherein the processor is adapted to adjust the data based on an amount that the at least two respective fields of view overlap.
5. The additive manufacturing system of claim 1 wherein the processor is adapted to attenuate the data received from the at least one sensor based on a location of the at least one sensor relative to a position of the at least two beams of energy on the build plane.
6. The additive manufacturing system of claim 1 wherein the processor adjusts the data by changing a gain of the at least one sensor of the plurality of sensors.
7. The additive manufacturing system of claim 1 wherein each of the plurality of sensors comprise a photodiode, a pyrometer, a phototransistor or a photoresistor.
8. The additive manufacturing system of claim 1 wherein each of the plurality of energy sources comprise a laser.
9. An additive manufacturing system comprising:
a build plane;
first and second energy sources arranged to direct respective first and second beams of energy across the build plane;
first and second sensors arranged to sense energy emitted from the build plane; and
a processor adapted to receive first data from the first sensor and second data from the second sensor and to adjust the first data received from the first sensor based on a distance between the first and the second beams of energy at the build plane; and
wherein the processor is further adapted to adjust the first data received from the first sensor based on an amount of time that the distance between the first and the second beams of energy is below a threshold distance.
10. The additive manufacturing system of claim 9 wherein the processor is further adapted to adjust the second data received from the second sensor.
11. The additive manufacturing system of claim 9 wherein the processor is adapted to adjust at least one of the first data or the second data when the distance is below the threshold distance.
12. The additive manufacturing system of claim 11 wherein the first and second sensors have respective first and second fields of view and wherein the threshold distance is based on a size of the first and second fields of view.
13. The additive manufacturing system of claim 12 wherein the processor is adapted to adjust at least one of the first data or the second data when the first and the second fields of view at least partially overlap.
14. The additive manufacturing system of claim 12 wherein the processor is adapted to adjust at least one of the first data or the second data based on an amount that the first and second fields of view overlap.
15. The additive manufacturing system of claim 9 wherein the processor is adapted to attenuate the first data received from the first sensor based on a location of the first sensor relative to a position of the first and the second beams of energy on the build plane.
16. The additive manufacturing system of claim 9 wherein the processor adjusts the first data received from the first sensor by changing a gain of the first sensor.
17. The additive manufacturing system of claim 9 wherein the first and second sensors each comprise a photodiode, a pyrometer, a phototransistor or a photoresistor.