Apparatus for treating substrate and assembly for distributing gas
A gas distribution assembly provided in an apparatus for treating a substrate with plasma to distribute gas includes a gas distribution plate formed with a plurality of gas introduction holes for diffusing gas supplied from the gas supply unit; a shower head plate disposed at the upper portion or lower portion of the gas distribution plate to be in contact with the gas distribution plate and having a plurality of gas supply holes formed at positions communicating with the gas introduction holes to penetrate through the upper surface and the lower surface; and a fastening member provided at a side surface in contact with the gas distribution plate and the shower head plate and including a first coupling portion coupled to the gas distribution plate and a second coupling portion supporting the lower surface of the shower head plate to contact the gas distribution plate and the shower head plate.
1. An apparatus for treating a substrate comprising:
a chamber defining a treating space therein;
a support unit configured to support the substrate in the treating space;
a gas supply unit configured to supply gas to the treating space;
a plasma source configured to generate plasma from the gas; and
a gas distribution assembly disposed above the support unit, wherein the gas distribution assembly includes:
a gas distribution plate formed with a plurality of gas introduction holes for diffusing the gas supplied from the gas supply unit;
a shower head plate disposed in contact with an upper portion or a lower portion of the gas distribution plate and having a plurality of gas supply holes formed at positions communicating with the plurality of gas introduction holes; and
a fastening member in contact with the gas distribution plate and the shower head plate to maintain adhesion between the gas distribution plate and the shower head plate, the fastening member including a first coupling portion inserted into a side surface of the gas distribution plate and coupled to the gas distribution plate, and a second coupling portion supporting the lower surface of the shower head plate,
wherein the gas distribution plate and the shower head plate have different thermal expansion coefficients.
2. The apparatus for treating the substrate of claim 1 ,
wherein the fastening member is made of metal or ceramic or engineering plastic having elasticity and heat resistance.
3. The apparatus for treating the substrate of claim 1 ,
wherein the gas distribution plate and the first coupling portion of the fastening member are screwed to each other.
4. The apparatus for treating the substrate of claim 1 ,
wherein the gas introduction holes of the gas distribution plate and the gas supply holes communicating with the gas introduction holes in the shower head plate are provided at communicating positions even in deformation due to the thermal expansion of the gas distribution plate and the shower head plate generated according to the substrate process.
5. The apparatus for treating the substrate of claim 4 ,
wherein the diameter of the gas introduction hole is provided greater than the diameter of the gas supply hole.
6. The apparatus for treating the substrate of claim 5 ,
wherein the plurality of gas supply holes communicates with one of the plurality of gas introduction holes.
7. The apparatus for treating the substrate of claim 4 ,
wherein the plurality of gas supply holes communicates with one of the plurality of gas introduction holes.
8. The apparatus for treating the substrate of claim 1 , further comprising:
a ring-shaped cover member located on the lower surface of the fastening member to cover a surface where the fastening member is exposed to the treating space.
9. The apparatus for treating the substrate of claim 1 ,
wherein the gas distribution plate is made of a material containing metal, and
wherein the shower head plate is made of a material which reacts with plasma generated from the gas supplied by the gas supply unit to generate a compound.
10. The apparatus for treating the substrate of claim 1 , further comprising:
a heat transfer member provided between the gas distribution plate and the shower head plate and provided in a shape corresponding to the lower surface of the gas distribution plate or the upper surface of the shower head plate,
wherein the heat transfer member is made of a silicon material containing at least one of ceramic or metal.
11. The apparatus for treating the substrate of claim 1 ,
wherein in the gas distribution plate, a surface in contact with the shower head plate is formed as any one of a concave surface and a convex surface, and
wherein in the shower head plate, a surface in contact with the gas distribution plate is formed as the other surface of the concave surface and the convex surface.
12. A gas distribution assembly provided in an apparatus for treating a substrate with plasma to distribute gas, the gas distribution assembly comprising:
a gas distribution plate formed with a plurality of gas introduction holes for diffusing the gas supplied from the gas supply unit;
a shower head plate disposed at the upper portion or lower portion of the gas distribution plate to be in contact with the gas distribution plate and having a plurality of gas supply holes formed at positions communicating with the gas introduction holes to penetrate through the upper surface and the lower surface; and
a fastening member in contact with the gas distribution plate and the shower head plate to maintain adhesion between the gas distribution plate and the shower head plate, and including a first coupling portion inserted into a side surface of the gas distribution plate and coupled to the gas distribution plate, and a second coupling portion supporting the lower surface of the shower head plate,
wherein the gas distribution plate and the shower head plate have different thermal expansion coefficients.
13. The gas distribution assembly of claim 12 ,
wherein the gas distribution plate is made of a material containing metal.
14. The gas distribution assembly of claim 12 ,
wherein the fastening member is made of metal or ceramic or engineering plastic having elasticity and heat resistance.
15. The gas distribution assembly of claim 12 ,
wherein the gas distribution plate and the first coupling portion of the fastening member are screwed to each other.
16. The gas distribution assembly of claim 12 ,
wherein the gas introduction holes of the gas distribution plate and the gas supply holes communicating with the gas introduction holes in the shower head plate are provided at communicating positions even in deformation due to the thermal expansion of the gas distribution plate and the shower head plate generated according to the substrate process.
17. The gas distribution assembly of claim 16 ,
wherein the diameter of the gas introduction hole is provided greater than the diameter of the gas supply hole.
18. The gas distribution assembly of claim 12 , further comprising:
a heat transfer member provided between the gas distribution plate and the shower head plate and provided in a shape corresponding to the lower surface of the gas distribution plate or the upper surface of the shower head plate,
wherein the heat transfer member is made of a silicon material containing at least one of ceramic or metal.
19. The gas distribution assembly of claim 12 ,
wherein in the gas distribution plate, a surface in contact with the shower head plate is formed as any one of a concave surface and a convex surface, and
wherein in the shower head plate, a surface in contact with the gas distribution plate is formed as the other surface of the concave surface and the convex surface.
20. An apparatus for treating a substrate comprising:
a chamber configured to have a treating space therein;
a support unit configured to support the substrate in the treating space;
a gas supply unit configured to supply gas to the treating space;
a plasma source configured to generate plasma from the gas; and
a gas distribution assembly disposed above the support unit,
the gas distribution assembly includes
a gas distribution plate made of a metallic material, configured to diffuse the gas supplied from the gas supply unit, and formed with a plurality of gas introduction holes;
a shower head plate made of a material containing silicon, disposed at the lower portion of the gas distribution plate to be in contact with the gas distribution plate, and having a plurality of gas supply holes formed at positions communicating with the gas introduction holes to penetrate through the upper surface and the lower surface; and
a fastening member in contact with the gas distribution plate and the shower head plate, made of metal or ceramic or engineering plastic having elasticity and heat resistance, and including a first coupling portion inserted into a side surface of the gas distribution plate and then screwed with the gas distribution plate, a second coupling portion supporting the lower surface of the shower head plate, and a connection portion connecting the first coupling portion and the second coupling portion,
wherein the fastening member is provided to maintain adhesion between the gas distribution plate and the shower head plate,
wherein the gas introduction holes of the gas distribution plate and the gas supply holes communicating with the gas introduction holes in the shower head plate are provided at communicating positions even in deformation due to the thermal expansion of the gas distribution plate and the shower head plate generated according to the substrate process.