Support device of vacuum pipe
According to an embodiment of the present invention, since the vibration transmitted from the vacuum pipe can be reduced according to the movement of the mass, even anti-vibration effect can be expected regardless of the size of the pipe, the characteristics of the fluid or the like and the vibration prevention effect can be improved by further increasing the vibration transmission area by the elasticity of the press member.
1. A support device of a vacuum pipe used in the working environment of a semiconductor or display device having a multilayered structure, comprising:
a housing, through which the vacuum pipe passes and which is coupled to at least one layer of a plurality of layers of the multilayered structure so as to support the vacuum pipe and has an accommodation space formed therein; and
a vibration prevention member provided in the accommodation space of the housing so as to reduce vibration of the vacuum pipe, wherein the vibration prevention member comes into contact with the vacuum pipe so as to reduce the vibration of the vacuum pipe,
the vibration prevention member includes:
a support member disposed in the accommodation space; and
a buffer member, which is coupled to the support member and has a mass accommodated in a sealed inner space thereof so as to dampen the vibration transmitted from the vacuum pipe,
wherein the mass moves by inertia in the opposite direction to the moving direction of the vacuum pipe so as to cushion the vibration of the vacuum pipe.
2. The support device of a vacuum pipe used in the working environment of a semiconductor or display device having a multilayered structure according to claim 1 , further comprising a press member provided adjacent to the vibration prevention member in the accommodation space of the housing and pressurizing the vibration prevention member.
3. The support device of a vacuum pipe used in the working environment of a semiconductor or display device having a multilayered structure according to claim 2 , wherein
the press member includes a first elastic press member for pressing the vibration prevention member in the direction of the vacuum pipe, and
the buffer member includes a first buffer part, which is arranged to be biased in the direction of the vacuum pipe on the basis of the center of the support member so as to come into contact with the vacuum pipe, and has a vertical cross-sectional area, which is larger in one side in the direction in which the vacuum pipe is provided than in the other side in the direction in which the first elastic press member is provided.
4. The support device of a vacuum pipe used in the working environment of a semiconductor or display device having a multilayered structure according to claim 3 , wherein the buffer member further includes a second buffer part arranged to be biased in the upper or lower direction of the support member.
5. The support device of a vacuum pipe used in the working environment of a semiconductor or display device having a multilayered structure according to claim 2 , wherein
a plurality of vibration prevention members are provided so as to be spaced apart from each other, and
the press member includes a second pressurized elastic body provided between the plurality of vibration prevention members so as to press the plurality of vibration prevention members in directions away from each other.
6. The support device of a vacuum pipe used in the working environment of a semiconductor or display device having a multilayered structure according to claim 5 , wherein
the buffer member further includes a second buffer part arranged to be biased in the upper or lower direction of the support member,
the plurality of vibration prevention members are arranged up and down,
the second buffer part of the vibration prevention member disposed in the upper part is arranged to be biased toward the upper side, and
the second buffer part of the vibration prevention member disposed in the lower part is arranged to be biased toward the lower side.
7. The support device of a vacuum pipe used in the working environment of a semiconductor or display device having a multilayered structure according to claim 2 , wherein
the mass is a mixture of two or more substances with specific gravities different from each other.