Marks for overlay measurement and overlay error correction

1. A mark for overlay error correction, comprising:

a first pattern disposed on a first surface of a substrate;

a second pattern disposed on a second surface of the substrate, wherein the second surface of the substrate is opposite to the first surface of the substrate, and

a dummy layer disposed on the first surface of the substrate, wherein the first pattern is defined by the dummy layer;

wherein the first pattern overlaps at least a portion of the second pattern, wherein the first pattern and the second pattern collaboratively define a first overlay error.

2. The mark of claim 1 , wherein a first profile of the first pattern and a second profile of the second pattern are equiform.

3. The mark of claim 1 , wherein the first pattern protrudes from the first surface of the substrate.

4. The mark of claim 1 , further comprising:

a third pattern disposed on the first surface of the substrate; and

a fourth pattern disposed on the first surface of the substrate, wherein the third pattern at least overlaps the fourth pattern, and the second pattern is located at a first horizontal level different than a horizontal level of the fourth pattern.

5. The mark of claim 4 , wherein the first pattern is located at a horizontal level different from that of the third pattern.

6. The mark of claim 1 , further comprising:

a plurality of fifth patterns disposed on the second surface of the substrate and located at a horizontal level the same as that of the second pattern; and

a plurality of sixth patterns disposed on the second surface of the substrate and located at a horizontal level between that of the first pattern and that of the second pattern, and the plurality of fifth patterns and the plurality of sixth patterns are utilized to collaboratively generate a second overlay error.

7. The mark of claim 6 , wherein each of the plurality of fifth patterns is free from overlapping the plurality of sixth patterns.

8. The mark of claim 6 , wherein each of the plurality of fifth patterns is located in a quadruple area, respectively.

9. A mark for overlay error correction, comprising:

a first overlay mark comprising a first pattern and a second pattern disposed on a first surface of a substrate, wherein the first overlay mark is utilized to generate a first overlay error; and

a second overlay mark comprising a third pattern disposed on a second surface of the substrate and a fourth pattern disposed on the first surface of the substrate, wherein the first surface of the substrate is opposite to the second surface of the substrate,

wherein the second overlay mark is utilized to generate a second overlay error, and the second overlay mark is utilized to correct the first overlay error.

10. The mark of claim 9 , wherein the third pattern overlaps at least the fourth pattern.

11. The mark of claim 9 , wherein a profile of the third pattern and a profile of the fourth pattern are equiform in a plan view.

12. The mark of claim 9 , wherein the third pattern protrudes from the second surface of the substrate.

13. The mark of claim 9 , further comprising:

a dummy layer disposed on the second surface of the substrate, wherein the third pattern is defined by the dummy layer.

14. The mark of claim 9 , wherein the third pattern is recessed from the second surface of the substrate.

15. The mark of claim 9 , wherein the second pattern is located at a horizontal level the same as that of the fourth pattern.

16. The mark of claim 15 , wherein the first pattern is located at a horizontal level between that of the second pattern and that of the third pattern.

17. The mark of claim 9 , wherein the first pattern is free from overlapping the second pattern, and the third pattern is composed of a single continuous pattern.