IP Library Granted Patent US 11,869,744
Granted Patent B2
US 11,869,744 · App. 17/570,481 · Granted Jan 9, 2024

Electron microscope sample holder fluid handling with independent pressure and flow control

Inventors: Franklin Stampley Walden, II (Raleigh, NC); John Damiano, Jr. (Holly Springs, NC); Daniel Stephen Gardiner (Wake Forest, NC); William Bradford Carpenter (Asheville, NC)
Assignee: Protochips, Inc.
H01J37/20G01F1/34G05D7/0635H01J2237/006H01J2237/26
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,869,744
App. No.
17/570,481
Granted
Jan 9, 2024
Kind
B2
Abstract

A fluid metering system for gas independent pressure and flow control through an electron microscope sample holder includes: a pressure control system that supplies gas; an inlet line providing gas from the pressure control system to the sample holder; an outlet line receiving gas from the sample holder; and a variable leak valve that controls gas flow in the outlet line. The gas flows from an upstream tank of the pressure control system through the sample holder and variable leak valve to a downstream tank of the pressure control system due to the pressure difference of the two tanks as the variable leak valve meters flow in the outlet line. Flow rates are established by monitoring pressure changes at source and collection tanks of known volumes with gas independent pressure gauges. A method of directing the gas flow to a residual gas analyzer (RGA) is also presented.

Claims (18)

1. A system for controlling fluid flow through an electron microscope sample holder, the system comprising:

a pressure control system that supplies source gas, the pressure control system comprising an upstream tank and a downstream low pressure source;

an inlet line for providing the source gas from the pressure control system to the sample holder;

an outlet line for receiving the source gas from the sample holder; and

at least one variable leak valve connected to the outlet line and positioned downstream from the sample holder, wherein the at least one variable leak valve meters the gas flow to achieve a target gas flow rate through the sample holder based on a rate of change of pressure.

2. The system of claim 1 , further comprising a residual gas analyzer (RGA) connected to the outlet line, wherein the RGA is positioned downstream of the sample holder.

3. The system of claim 2 , wherein the RGA is positioned downstream of the variable leak valve.

4. The system of claim 2 , wherein pressures in the upstream tank and the downstream low pressure source are measured with gas independent pressure gauges.

5. The system of claim 1 , wherein a pressure in a tip of the sample holder is maintained by controlling the variable leak valve to change conduction through the sample holder as a higher pressure experimental gas is added to the source gas.

6. The system of claim 1 , further comprising a boom for supporting the variable leak valve in proximity to the sample holder.

7. The system of claim 1 , wherein pressures in the upstream tank and the downstream low pressure source are measured with gas independent pressure gauges.

8. The system of claim 1 , wherein a largest pressure drop in the system is across the variable leak valve.

9. The system of claim 1 , wherein the target gas flow rate is based on a rate of change in pressure in at least one of the upstream tank and/or the downstream low pressure source.

10. The system of claim 1 , further comprising a switching valve downstream of the variable leak valve designed to direct outlet gas to the downstream low pressure source and/or a residual gas analyzer (RGA).

11. The system of claim 1 , wherein the sample holder further comprises a gate valve designed to simultaneously close an inlet of the sample holder and an outlet of the sample holder.

12. The system of claim 1 , further comprising a T-junction valve positioned between the at least one variable leak valve and the downstream low pressure source,

wherein the T-junction valve is configured to direct the gas flow to the downstream low pressure source or to a spectrometer, and

wherein the spectrometer is a residual gas analyzer (RGA), where some or all the source gas can be diverted from the variable leak valve to the RGA via the T-junction valve.

Assignments (2)
SECURITY INTEREST Recorded May 25, 2022
From: PROTOCHIPS, INC.
To: SALEM INVESTMENT PARTNERS IV, LIMITED PARTNERSHIP
Reel/Frame 060012/0315 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 7, 2022
From: WALDEN, FRANKLIN STAMPLEY, II; DAMIANO, JOHN, JR.; GARDINER, DANIEL STEPHEN; CARPENTER, WILLIAM BRADFORD
To: PROTOCHIPS, INC.
Reel/Frame 058582/0229 →
Continuity (4)
Continuation 16734548 · Jan 6, 2020
Continuation PCTUS2018041048 · Jul 6, 2018
Provisional Application 62529195 · Jul 6, 2017
Related Publication 20220130637A1 · Apr 28, 2022