Semiconductor memory device and manufacturing method of the semiconductor memory device

1. A method of manufacturing a semiconductor memory device, the method comprising:

forming a preliminary structure over lower contact plugs, the preliminary structure including a first semiconductor pattern and a second semiconductor pattern separated from each other by an insulating layer;

forming a stack structure including interlayer insulating layers and sacrificial layers alternately stacked on each other over the preliminary structure;

forming a channel hole and a first contact hole passing through the stack structure, wherein the channel hole overlaps the first semiconductor pattern, and wherein the first contact hole extends into an upper portion of the second semiconductor pattern;

forming a memory layer on a surface of each of the channel hole and the first contact hole;

filling the channel hole with a channel structure;

forming a first contact plug in the first contact hole, wherein the first contact plug passes through the memory layer in the first contact hole and a lower portion of the second semiconductor pattern such that the first contact plug is connected to a corresponding lower contact plug, among the lower contact plugs; and

replacing the sacrificial layers by conductive patterns,

wherein the conductive patterns surround the channel structure and the first contact plug with a corresponding memory layer interposed between each of the conductive patterns and each of the channel structure and the first contact plug.

2. The method of claim 1 ,

wherein the stack structure includes a stepped structure, and

wherein the first contact hole passes through the stepped structure of the stack structure.

3. The method of claim 1 ,

wherein the stack structure includes a stepped structure overlapping the first semiconductor pattern, and

wherein the method further comprises:

forming a dummy hole passing through the stepped structure and overlapping the first semiconductor pattern by using a process of forming the channel hole and the first contact hole;

forming a dummy memory layer on a surface of the dummy hole by using a same process that is used for forming of the memory layer on the surface of each of the channel hole and the first contact hole; and

filling the dummy hole with a supporting pillar by using the filling of the channel hole with the channel structure, wherein the supporting pillar and the channel structure comprise a same material.

4. The method of claim 1 , further comprising, before forming the first contact plug, forming an oxide layer on the memory layer in the first contact hole,

wherein the first contact plug passes through the oxide layer.

5. The method of claim 1 ,

wherein a width of the first contact hole is smaller than a width of the second semiconductor pattern.

6. A method of manufacturing a semiconductor memory device, the method comprising:

forming a preliminary structure including a first semiconductor pattern and a second semiconductor pattern separated from each other by an insulating layer;

forming a stack structure including interlayer insulating layers and sacrificial layers alternately stacked on each other over the preliminary structure;

forming a channel hole and a first contact hole passing through the stack structure, wherein the channel hole overlaps the first semiconductor pattern, and wherein the first contact hole overlaps and extends into a portion of the second semiconductor pattern;

forming a memory layer on a surface of each of the channel hole and the first contact hole;

filling the channel hole with a channel structure;

forming a first contact plug in the first contact hole, wherein the first contact plug passes through the memory layer in the first contact hole and the second semiconductor pattern; and

replacing the sacrificial layers by conductive patterns,

wherein the conductive patterns surround the channel structure and the first contact plug with a corresponding memory layer interposed between each of the conductive patterns and each of the channel structure and the first contact plug,

wherein forming the preliminary structure comprises:

sequentially stacking a first semiconductor layer, a sacrificial stack structure, and a second semiconductor layer over a substrate, the substrate including a first lower contact plug connected to a discharge impurity region and a second lower contact plug connected to a transistor;

forming openings by etching through the first semiconductor layer, the sacrificial stack structure, and the second semiconductor layer such that parts of each of the first semiconductor layer, the sacrificial stack structure, and the second semiconductor layer remain as the first semiconductor pattern overlapping the first lower contact plug and the second semiconductor pattern overlapping the second lower contact plug; and

forming the insulating layer in each of the openings.

7. The method of claim 6 , further comprising:

removing the sacrificial stack structure of the first semiconductor pattern to expose the memory layer in the channel hole;

removing an exposed region of the memory layer to expose the channel structure; and

forming a channel coupling pattern contacting the channel structure between the first semiconductor layer and the second semiconductor layer of the first semiconductor pattern,

wherein each of the first semiconductor layer and the channel coupling pattern includes a doped semiconductor layer.

8. The method of claim 6 , further comprising forming vertical doped semiconductor patterns on sidewalls of the first and second semiconductor patterns before forming the insulating layer.

9. A method of manufacturing a semiconductor memory device, the method comprising:

forming a preliminary structure including a first semiconductor pattern and a second semiconductor pattern separated from each other by an insulating layer;

forming a stack structure including interlayer insulating layers and sacrificial layers alternately stacked on each other over the preliminary structure;

forming a channel hole and a first contact hole passing through the stack structure, wherein the channel hole overlaps the first semiconductor pattern, and wherein the first contact hole overlaps and extends into a portion of the second semiconductor pattern;

forming a memory layer on a surface of each of the channel hole and the first contact hole;

filling the channel hole with a channel structure;

forming a first contact plug in the first contact hole, wherein the first contact plug passes through the memory layer in the first contact hole and the second semiconductor pattern; and

replacing the sacrificial layers by conductive patterns,

wherein the conductive patterns surround the channel structure and the first contact plug with a corresponding memory layer interposed between each of the conductive patterns and each of the channel structure and the first contact plug,

wherein the preliminary structure further includes a third semiconductor pattern separated from the first semiconductor pattern and the second semiconductor pattern by the insulating layer, and

wherein replacing the sacrificial layers by the conductive patterns is controlled such that a part of each of the sacrificial layers that overlaps the third semiconductor pattern remains.

10. The method of claim 9 , further comprising:

forming a second contact hole passing through the stack structure and overlapping the third semiconductor pattern by using a process of forming the channel hole and the first contact hole; and

forming a second contact plug in the second contact hole by a same process that is used for forming of the first contact plug in the first contact hole.

11. The method of claim 10 ,

wherein a width of the second contact hole is smaller than a width of the third semiconductor pattern.