Microstructural image analysis device and microstructural image analysis method
The invention is to provide a microstructural image analysis device and a microstructural image analysis method capable of quantifying the relations in a plurality of regions included in a microstructural image. There is provided a microstructural image analysis device for analyzing a microstructural image. The microstructural image analysis device includes a region processing unit that extracts a first region and a second region from the microstructural image and expands the first region and the second region, an overlapping region extraction unit that extracts an overlapping region of both the first region and the second region each time the first region and the second region are expanded, and a persistence diagram generation unit that generates a persistence diagram based on a hole region generated and eliminated due to the overlapping region.
1. A microstructural image analysis device for analyzing a microstructural image, the device comprising:
a processor and a memory that stores instructions that when executed by the processor configure the processor to:
extract a first region and a second region from the microstructural image;
expand the first region and the second region in an expansion processing by converting values of one or more pixels around the first region and the second region to different values;
extract an overlapping region of both the first region and the second region each time the first region and the second region are expanded; and
generate a persistence diagram, which is a two-dimensional coordinate system, based on a hole region generated and eliminated due to the overlapping region increasing each time the first region and the second region are expanded, the coordinate system having a horizontal axis indicating a number of repetitions of the expansion processing when a hole region is generated, and a vertical axis indicating a number of repetitions of the expansion processing when the hole region is eliminated.
2. The microstructural image analysis device according to claim 1 ,
wherein the processor is further configured to repeat the expansion processing of the first region and the second region until an end condition is satisfied.
3. The microstructural image analysis device according to claim 2 ,
wherein the end condition is that the first region and the second region cover the entire image.
4. The microstructural image analysis device according to claim 2 ,
wherein the end condition is an upper limit of the number of repetitions of expansion of the first region and the second region.
5. The microstructural image analysis device according to claim 2 ,
wherein the end condition is a threshold value for a ratio at which the overlapping region becomes larger.
6. The microstructural image analysis device according to claim 1 ,
wherein the processor is further configured to set expansion amounts of the first region and the second region according to an emphasized item, the expansion amounts being a number of pixels having their values converted in the expansion processing.
7. The microstructural image analysis device according to claim 1 ,
wherein the processor is further configured to:
analyze a plurality of microstructural images and extract the first region and the second region from each of the plurality of microstructural images, and
generate persistence diagrams for the plurality of microstructural images, and an integrated persistence diagram by integrating the persistence diagrams.
8. A microstructural image analysis method for analyzing a microstructural image, the method comprising:
a region processing step of extracting a first region and a second region from the microstructural image;
expanding the first region and the second region in an expansion processing by converting values of one or more pixels around the first region and the second region to different values;
an overlapping region extraction step of extracting an overlapping region of both the first region and the second region each time the first region and the second region are expanded; and
a persistence diagram generation step of generating a persistence diagram, which is a two-dimensional coordinate system, based on a hole region generated and eliminated due to the overlapping region increasing each time the first region and the second region are expanded, the coordinate system having a horizontal axis indicating a number of repetitions of the expansion processing when a hole region is generated, and a vertical axis indicating a number of repetitions of the expansion processing when the hole region is eliminated.