Substrate processing apparatus and recording medium
There is provided a technique that includes: a controller configured to execute a process recipe including a plurality of steps to perform a predetermined process on a substrate. The controller acquires device data, which includes at least one of a current value, a rotational speed, and a back pressure of a pump, in a specific step among the plurality of steps and compares an acquired value of the device data with a previously acquired value of the device data. The controller generates a notification if at least one of the following conditions is met: the acquired value for the current value is larger than the previously acquired value for the current value, the acquired value for the back pressure is larger than the previously acquired value for the back pressure, and the acquired value for the rotational speed is smaller than the previously acquired value for the rotational speed.
1. A substrate processing apparatus comprising:
a controller configured to execute a process recipe including a plurality of steps to perform a predetermined process on a substrate,
wherein the controller is configured to:
acquire device data, which includes at least one selected from the group of a current value of a pump, a rotational speed of the pump, and a back pressure of the pump, in a specific step among the plurality of steps;
compare an acquired value of the device data with a previously acquired value of the device data; and
generate a notification if at least one selected from the group of the following conditions is met:
(a) the acquired value for the current value is larger than the previously acquired value for the current value,
(b) the acquired value for the back pressure is larger than the previously acquired value for the back pressure, and
(c) the acquired value for the rotational speed is smaller than the previously acquired value for the rotational speed.
2. The substrate processing apparatus of claim 1 , wherein comparing the acquired value of the device data with the previously acquired value of the device data is performed a plural number of times, and
wherein the notification is generated if in at least one selected from the group of (a) and (b), the acquired value has been increased in succession for a preset number of times of executing the process recipe.
3. The substrate processing apparatus of claim 1 , wherein comparing the acquired value of the device data with the previously acquired value of the device data is performed a plural number of times, and
wherein the notification is generated if in (c), the acquired value has been decreased in succession for a preset number of times of executing the process recipe.
4. The substrate processing apparatus of claim 1 , further comprising:
a storage configured to store the device data,
wherein the storage is configured to store at least one selected from the group of the process recipe, a cleaning recipe, a purge recipe.
5. The substrate processing apparatus of claim 4 , wherein the controller is configured to execute the cleaning recipe after the process recipe is completed.
6. The substrate processing apparatus of claim 4 , wherein the controller is configured to execute the cleaning recipe when generating the notification.
7. The substrate processing apparatus of claim 4 , wherein the cleaning recipe includes at least one selected from the group of a first cleaning recipe and a second cleaning recipe, and
wherein the first cleaning recipe is a recipe for directly supplying a cleaning gas to an exhaust pipe by passing the cleaning gas by a process chamber for processing the substrate.
8. The substrate processing apparatus of claim 1 , wherein the process recipe includes at least a substrate-loading step, a preparing step, a film-forming step, a purging step and a substrate-unloading step, and
wherein, prior to the film-forming step, the specific step is selected from the substrate-loading step and the preparing step.
9. The substrate processing apparatus of claim 1 , wherein the specific step is a process of starting evacuation from an atmospheric pressure.
10. The substrate processing apparatus of claim 1 , wherein the controller is configured to acquire a maximum value of the device data in the specific step.
11. The substrate processing apparatus of claim 1 , wherein the controller is configured to calculate an average value of the device data in the specific step.
12. The substrate processing apparatus of claim 1 , wherein the device data comprises at least two device data selected from the group of the current value of the pump, the rotational speed of the pump, and the back pressure of the pump.
13. The substrate processing apparatus of claim 1 , further comprising:
a display configured to display contents of the notification thereon.
14. The substrate processing apparatus of claim 1 , wherein the controller is configured to generate the notification if at least two of the conditions are met.
15. The substrate processing apparatus of claim 1 , wherein the controller is configured to generate the notification when at least one selected from the group of the conditions changes.
16. The substrate processing apparatus of claim 1 , wherein the device data is acquired while executing the process recipe.
17. The substrate processing apparatus of claim 1 , wherein the pump includes at least one selected from the group of an auxiliary pump and a main pump, and
wherein the auxiliary pump is located from the apparatus within a first distance, and the main pump is located from the apparatus with a second distance larger than the first distance.
18. A non-transitory computer-readable recording medium storing a program that causes a controller to execute a process recipe including a plurality of steps to perform a predetermined process on a substrate, wherein the controller is configured to:
acquire device data, which includes at least one selected from the group of a current value of a pump, a rotational speed of the pump, and a back pressure of the pump, in a specific step among the plurality of steps;
compare an acquired value of the device data with a previously acquired value of the device data; and
generate a notification if at least one selected from the group of the following conditions is met:
(a) the acquired value for the current value is larger than the previously acquired value for the current value,
(b) the acquired value for the back pressure is larger than the previously acquired value for the back pressure, and
(c) the acquired value for the rotational speed is smaller than the previously acquired value for the rotational speed.
19. A method of manufacturing a semiconductor device, the method comprising:
acquiring device data, which includes at least one of a current value of a pump, a rotational speed of the pump, and a back pressure of the pump, in a predetermined specific step among a plurality of steps constituting a process recipe,
comparing an acquired value for each of the device data with a previous value for each of the device data acquired in the specific step during previous execution of the process recipe, and
generating a notification if it is determined that at least one of the following conditions is met:
the acquired value for the current value is larger than the previous value for the current value and has been increased in succession for a preset number of times of executing the process recipe,
the acquired value for the back pressure is larger than the previous value for the back pressure and has been increased in succession for a preset number of times of executing the process recipe, and
the acquired value for the rotational speed is smaller than the previous value for the rotational speed and has been decreased in succession for a preset number of times of executing the process recipe.