IP Library Granted Patent US 12,142,453
Granted Patent B2
US 12,142,453 · App. 17/583,176 · Granted Nov 12, 2024

Multi-beam inspection apparatus

Inventors: Weiming Ren (San Jose, CA); Qian Zhang (San Jose, CA); Xuerang Hu (San Jose, CA); Xuedong Liu (San Jose, CA)
Assignee: ASML Netherlands B.V.
H01J37/1477H01J37/244H01J37/28H01J37/3177H01J2237/24592
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Quick Facts
Patent No.
US 12,142,453
App. No.
17/583,176
Granted
Nov 12, 2024
Kind
B2
Abstract

A multi-beam inspection apparatus including an improved source conversion unit is disclosed. The improved source conversion unit may comprise a micro-structure deflector array including a plurality of multipole structures. The micro-deflector deflector array may comprise a first multipole structure having a first radial shift from a central axis of the array and a second multipole structure having a second radial shift from the central axis of the array. The first radial shift is larger than the second radial shift, and the first multipole structure comprises a greater number of pole electrodes than the second multipole structure to reduce deflection aberrations when the plurality of multipole structures deflects a plurality of charged particle beams.

Claims (47)

1. A micro-structure deflector array including a plurality of multipole structures, each multipole structure comprising a plurality of pole electrodes, the array comprising:

a first multipole structure of the plurality of multipole structures, the first multipole structure having a first radial shift from a central axis of the array; and

a second multipole structure of the plurality of multipole structures, the second multipole structure having a second radial shift from the central axis of the array,

wherein the first radial shift is larger than the second radial shift, and the first multipole structure comprises a greater number of pole electrodes than the second multipole structure.

2. The micro-structure deflector array of claim 1 , wherein the first multipole structure comprises a greater number of pole electrodes than the second multipole structure to reduce deflection aberrations when the plurality of multipole structures deflects a plurality of charged particle beams.

3. The micro-structure deflector array of claim 2 , wherein:

the plurality of pole electrodes of the first multipole structure are electrically connected and driven by a first driver, and

the plurality of pole electrodes of the second multipole structure are electrically connected and driven by a second driver.

4. The micro-structure deflector array of claim 3 , wherein the first driver and the second driver are configured to enable the first multipole structure and the second multipole structure to function as image-forming elements or pre-bending micro-deflectors in a multi-beam apparatus to deflect the plurality of charged particle beams.

5. The micro-structure deflector array of claim 1 , wherein the first multipole structure has an inner diameter larger than an inner diameter of the second multipole structure.

6. The micro-structure deflector array of claim 1 , wherein:

the plurality of pole electrodes of the first multipole structure are electrically connected and driven by a first driver, and

the plurality of pole electrodes of the second multipole structure are electrically connected and driven by a second driver.

7. A method of manufacturing a micro-structure deflector array including a plurality of multipole structures, each multipole structure comprising a plurality of pole electrodes, the method comprising:

forming a first multipole structure to have a first radial shift from a central axis of the array; and

forming a second multipole structure to have a second radial shift from the central axis of the array, wherein the first radial shift is larger than the second radial shift, and wherein the first multipole structure has a different number of pole electrodes from the second multipole structure.

8. The method of claim 7 , further comprising selecting a number of pole electrodes of the first multipole structure and a number of pole electrodes of the second multipole structure based on aberration characteristics of the first and the second multipole structures.

9. The method of claim 8 , wherein selecting the number of pole electrodes of the first multipole structure and the number of pole electrodes of the second multipole structure comprises selecting corresponding numbers of pole electrodes to reduce high-order components of electric fields thereof.

10. The method of claim 7 , wherein the number of pole electrodes of the first multipole structure is greater than the number of pole electrodes of the second multipole structure.

11. The method of claim 7 , further comprising placing the plurality of multipole structures in one or more layers.

12. The method of claim 11 , wherein one multipole structure in a first layer of the one or more layers is aligned with one multipole structure in a second layer of the one or more layers.

13. The method of claim 12 , further comprising grouping a subset of multipole structures in the first layer of the one or more layers to share a first driver, wherein the subset of multipole structures in the first layer:

have a same number of pole electrodes, and

are equal or substantially equal in radial shift and an orientation angle.

14. The method of claim 12 , further comprising grouping a subset of multipole structures in the second layer of the one or more layers to share a second driver, wherein the subset of multipole structures in the second layer:

have a same number of pole electrodes, and

are equal or substantially equal in radial shift and an orientation angle.

15. The method of claim 7 , further comprising grouping a subset of multipole structures to share one driver, wherein the subset of multipole structures:

have a same number of pole electrodes, and

are equal or substantially equal in radial shift and an orientation angle.

16. A non-transitory computer readable medium that stores a set of instructions that is executable by at least one processor of a computer system to cause the computer system to perform a method of manufacturing a micro-structure deflector array including a plurality of multipole structures, each multipole structure comprising a plurality of pole electrodes, the method comprising:

forming a first multipole structure to have a first radial shift from a central axis of the array; and

forming a second multipole structure to have a second radial shift from the central axis of the array, wherein the first radial shift is larger than the second radial shift, and wherein the first multipole structure has a different number of pole electrodes from the second multipole structure.

17. The non-transitory computer readable medium of claim 16 , wherein the set of instructions is executable by the at least one processor to cause the computer system to further perform selecting a number of pole electrodes of the first multipole structure and a number of pole electrodes of the second multipole structure based on aberration characteristics of the first and the second multipole structures.

18. The non-transitory computer readable medium of claim 17 , wherein selecting the number of pole electrodes of the first multipole structure and the number of pole electrodes of the second multipole structure comprises selecting corresponding numbers of pole electrodes to reduce high-order components of electric fields thereof.

19. The non-transitory computer readable medium of claim 16 , wherein the number of pole electrodes of the first multipole structure is greater than the number of pole electrodes of the second multipole structure.

20. The non-transitory computer readable medium of claim 16 , wherein the set of instructions is executable by the at least one processor to cause the computer system to further perform placing the plurality of multipole structures in one or more layers.

21. The non-transitory computer readable medium of claim 20 , wherein one multipole structure in a first layer of the one or more layers is aligned with one multipole structure in a second layer of the one or more layers.

22. The non-transitory computer readable medium of claim 21 , wherein the set of instructions is executable by the at least one processor to cause the computer system to further perform grouping a subset of multipole structures in the first layer of the one or more layers to share a first driver, wherein the subset of multipole structures in the first layer:

have a same number of pole electrodes, and

are equal or substantially equal in radial shift and an orientation angle.

23. The non-transitory computer readable medium of claim 21 , wherein the set of instructions is executable by the at least one processor to cause the computer system to further perform grouping a subset of multipole structures in the second layer of the one or more layers to share a second driver, wherein the subset of multipole structures in the second layer:

have a same number of pole electrodes, and

are equal or substantially equal in radial shift and an orientation angle.

24. The non-transitory computer readable medium of claim 16 , wherein the set of instructions is executable by the at least one processor to cause the computer system to further perform grouping a subset of multipole structures to share one driver, wherein the subset of multipole structures:

have a same number of pole electrodes, and

are equal or substantially equal in radial shift and an orientation angle.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 3, 2024
From: REN, WEIMING; ZHANG, QIAN; HU, XUERANG; LIU, XUEDONG
To: HERMES MICROVISION, INC.
Reel/Frame 069106/0985 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 3, 2024
From: HERMES MICROVISION, INC.
To: HERMES MICROVISION INCORPORATED B.V.
Reel/Frame 068782/0905 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 3, 2024
From: HERMES MICROVISION INCORPORATED B.V.
To: ASML NETHERLANDS B.V.
Reel/Frame 068783/0009 →
Continuity (3)
Continuation 16729190 · Dec 27, 2019
Provisional Application 62787157 · Dec 31, 2018
Related Publication 20220216029A1 · Jul 7, 2022