IP Library Granted Patent US 12,148,809
Granted Patent B2
US 12,148,809 · App. 17/583,225 · Granted Nov 19, 2024

Layout pattern of static random access memory

Inventors: Chun-Hsien Huang (Tainan, TW); Yu-Tse Kuo (Tainan, TW); Shu-Ru Wang (Taichung, TW); Chien-Hung Chen (Taipei, TW); Li-Ping Huang (Miaoli County, TW); Chun-Yen Tseng (Tainan, TW)
Assignee: UNITED MICROELECTRONICS CORP.
H01L29/42376G11C5/063G11C11/412H01L29/7851H10B10/12
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Quick Facts
Patent No.
US 12,148,809
App. No.
17/583,225
Granted
Nov 19, 2024
Kind
B2
Abstract

The present invention provides a layout pattern of static random access memory, comprising a PU 1 (first pull-up transistor), a PU 2 (second pull-up transistor), a PD 1 A (first pull-down transistor), a PD 1 B (second pull-down transistor), a PD 2 A (third pull-down transistor), a PD 2 B (fourth pull-down transistor), a PG 1 A (first access transistor), a PG 1 B (second access transistor), a PG 2 A (third access transistor) and a PG 2 B (fourth access transistor) located on the substrate. The PD 1 A and the PD 1 B are connected in parallel with each other, the PD 2 A and the PD 2 B are connected in parallel with each other, wherein the gate structures include a first J-shaped gate structure, and the first J-shaped gate structure is an integrally formed structure.

Claims (15)

1. A layout pattern of a static random access memory (SRAM), comprising:

a plurality of fin structures located on a substrate;

a plurality of gate structures located on the substrate, wherein the plurality of gate structures span the plurality of fin structures, to form a PU 1 (first pull-up transistor), a PU 2 (second pull-up transistor), a PD 1 A (first pull-down transistor), a PD 1 B (second pull-down transistor), a PD 2 A (third pull-down transistor), a PD 2 B (fourth pull-down transistor), a PG 1 A (first access transistor), a PG 1 B (second access transistor), a PG 2 A (third access transistor) and a PG 2 B (fourth access transistor) on the substrate, wherein the PD 1 A and the PD 1 B are connected in parallel, and the PD 2 A and the PD 2 B are connected in parallel;

wherein the plurality of gate structures include a first J-shaped gate structure, the first J-shaped gate structure spans a part of the fin structures and forms the PU 1 , the PD 1 A and the PD 1 B, the first J-shaped gate structure comprises a long side structure, a short side structure and a connection structure, and the first J-shaped gate structure is an integrally formed structure; and

a third gate structure disposed beside the long side structure of the first J-shaped gate structure, and the third gate structure spans a part of the fin structures and constitutes the PG 1 B, wherein the connection structure of the first J-shaped gate structure is disposed between the third gate structure and the short side structure of the first J-shaped gate structure.

2. The layout pattern of SRAM according to claim 1 , wherein the long side structure and the short side structure are arranged along a first direction, and the connection structure and each fin structure are arranged along a second direction.

3. The layout pattern of SRAM according to claim 1 , wherein the short side structure of the first J-shaped gate structure spans a part of the fin structures and constitutes the PD 1 B.

4. The layout pattern of SRAM according to claim 1 , wherein the long side structure of the first J-shaped gate structure spans a part of the fin structures and constitutes the PU 1 and the PD 1 A.

5. The layout pattern of SRAM according to claim 2 , further comprising a second gate structure arranged along the first direction, and the second gate structure spans a part of the fin structures and constitutes the PG 1 A.

6. The layout pattern of SRAM according to claim 5 , wherein the second gate structure and the short side structure are aligned with each other in the first direction.

7. The layout pattern of SRAM according to claim 6 , wherein the third gate structure and the long side structure are aligned with each other in the first direction.

8. The layout pattern of SRAM according to claim 7 , further comprising a first local interconnection layer and a second local interconnection layer, wherein the first local interconnection layer is located between the second gate structure and the third gate structure.

9. The layout pattern of SRAM according to claim 8 , wherein the second local interconnection layer is located between the long side structure and the short side structure.

10. The layout pattern of SRAM according to claim 9 , wherein the connection structure is located between the first local interconnection layer and the second local interconnection layer.

11. The layout pattern of SRAM according to claim 8 , further comprising a metal wire electrically connecting the first local interconnection layer and the second local interconnection layer, wherein the metal wire and the connection structure are located in different layers.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 25, 2022
From: HUANG, CHUN-HSIEN; KUO, YU-TSE; WANG, SHU-RU; CHEN, CHIEN-HUNG; HUANG, LI-PING; TSENG, CHUN-YEN
To: UNITED MICROELECTRONICS CORP.
Reel/Frame 058750/0165 →
Priority Claims (1)
CN 202111588319.7 · Dec 23, 2021 · national
Continuity (1)
Related Publication 20230207648A1 · Jun 29, 2023