Pattern-forming method and composition
A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.
1. A composition comprising:
a polymer comprising: a first structural unit which comprises an acid-labile group; and a functional group which selectively bonds to a metal atom or an Si—OH bond;
an acid generating agent; and
a solvent,
wherein the functional group is located at an end of a main chain of the polymer, the functional group being introduced after completing polymerization of monomers that give the first structural unit,
wherein when the functional group selectively bonds to a metal atom, the functional group is at least one selected from the group consisting of a phosphonic acid group, a phosphonic acid ester group, a cyano group, a sulfanyl group, a monohydroxyboryl group, a pyridine ring-containing group, an ethylenic carbon-carbon double bond-containing group, and a carbon-carbon triple bond-containing group, and when the functional group selectively bonds to an Si-OH bond, the functional group is at least one group selected from the group consisting of a silanol group and a tertiary amino group, and
wherein the first structural unit is represented by formula (1-1):
wherein,
R 1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group;
X represents the acid-labile group which is represented by at least one selected from the group consisting of formula (2-1-1), formula (2-3-1), formula (2-3-4), and formula (2-4-1);
R 2 represents a single bond, —O—, —COO—, or —CONH—;
Ar represents a group obtained by removing from an arene having 6 to 20 ring atoms, (m+n+1) hydrogen atoms on an aromatic ring thereof;
m is an integer of 0 to 10, wherein in a case in which m is 1, R 3 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms, in a case in which m is no less than 2, a plurality of R 3 s are identical or different from each other and each R 3 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms, or two or more of the plurality of R 3 s taken together represent an alicyclic structure having 4 to 20 ring atoms, together with the carbon chain to which the two or more of the plurality of R 3 s bond; and
n is an integer of 1 to 11, wherein a sum of m and n is no greater than 11, and in a case in which n is no less than 2, a plurality of Xs are identical or different from each other:
wherein in the formulae (2-1-1), (2-3-1), (2-3-4), and (2-4-1), * denotes a bonding site to the oxygen atom in the formula (1-1).
2. The composition according to claim 1 , wherein the solvent comprises an alcohol solvent.
3. The composition according to claim 1 , wherein the functional group selectively bonds to the metal atom, and the functional group is at least one group selected from the group consisting of a phosphonic acid group, a phosphonic acid ester group, a cyano group, a sulfanyl group, a monohydroxyboryl group, an ethylenic carbon-carbon double bond-containing group, and a carbon-carbon triple bond-containing group.
4. The composition according to claim 1 , wherein the functional group selectively bonds to the metal atom, and the functional group is at least one group selected from the group consisting of a phosphonic acid group, a phosphonic acid ester group and a cyano group.
5. The composition according to claim 1 , wherein the functional group selectively bonds to the Si-OH bond, and the functional group is a silanol group.
6. The composition according to claim 1 , wherein in the formula (1-1), Ar represents a group obtained by removing from an arene having 6 ring atoms, two hydrogen atoms on an aromatic ring thereof; m is 0, n is 1, and R 2 represents a single bond.
7. The composition according to claim 1 , wherein a content of the acid generating agent is no less than 0.1 parts by mass and no greater than 30 parts by mass with respect to 100 parts by mass of the polymer.
8. The composition according to claim 1 , wherein a content of the acid generating agent is no less than 2 parts by mass and no greater than 15 parts by mass with respect to 100 parts by mass of the polymer.
9. The composition according to claim 1 , wherein a content of the polymer in the composition is 80% by mass or more with respect to a total mass of the composition.
10. The composition according to claim 1 , wherein a content of the polymer in the composition is 90% by mass or more with respect to a total mass of the composition.
11. The composition according to claim 1 , wherein a content of the polymer in the composition is 95% by mass or more with respect to a total mass of the composition.