Water-resistant nanofilm, preparation method and article thereof
The present disclosure provides a water-resistant nanofilm, a preparation method and an article thereof, in which fluorocarbon gas is used as a plasma source and is formed on a substrate surface of substrate by a plasma enhanced chemical vapor deposition method, so that the water-resistance performance of the substrate surface is improved.
1. A water-resistant nanofilm, wherein the water-resistant nanofilm is formed on a surface of a substrate by plasma enhanced chemical vapor deposition through using fluorocarbon gas as plasma source,
wherein the fluorocarbon gas has a structural formula selected from C x F 2x+2 and C x F 2x , and x is 1, 2 or 3,
wherein the water-resistant nanofilm is formed of one, two or three selected from a group consisting of monomer 1, monomer 2 and monomer 3 as reaction materials for vapor deposition,
wherein the monomer 1 has a structural formula (I):
Y—C m H 2m —C n F 2n+1 (I)
where m is an integer ranging from 0 to 4, n is an integer ranging from 1 to 12, and Y represents an organic functional group and is selected from the following structure: vinyl, halogened vinyl, alkyl substituted vinyl, acrylate group, C═C—O—C(O), methacrylate group, and, hydroxyl,
and the monomer 2 has a structural formula (II)
where R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are respectively selected from hydrogen, alkyl, aryl, halogenated aryl, halogen, halogenated alkyl, alkoxy and vinyl, and k is an integer ranging from 0 to 4,
and the monomer 3 comprises one or more selected from a group consisting of glycidyl methacrylate, allyl glycidyl ether, 1,2-epoxy-4-vinyl cyclohexane, 3-(2,3-epoxy-propoxy) propyl vinyl dimethoxysilane and enbucrilate, or the monomer 3 has a structural formula (III),
where R 7 , R 8 , R 9 , R 10 , R 11 and R 12 are respectively selected from hydrogen, alkyl, aryl, halogen, halogenated alkyl, and halogenated aryl, and i as well as h are integers ranging from 0 to 10 but not both be 0 in the meantime, and R 13 represents bond, —CO—, —COO—, arylene, alicyclic alkylene or hydroxyl substituted aliphatic alkylene,
wherein a thickness of the water-resistant nanofilm ranges from 10 to 2000 nm.
2. The water-resistant nanofilm according to claim 1 , wherein the fluorocarbon gas is selected from a group consisting of: carbon tetrafluoride, tetrafluoroethylene and hexafluoroethane.
3. The water-resistant nanofilm according to claim 1 , wherein a static contact angle of water of the water-resistant nanofilm is selected from 110°˜115°, 115°˜120°, 120°˜125°, 125°˜130°, 130°˜135°, 135°˜140°, 140°˜145°, and 145°˜150°.
4. The water-resistant nanofilm according to claim 1 , wherein m is an integer ranging from 0 to 2, n is an integer ranging from 1 to 7.
5. The water-resistant nanofilm according to claim 1 , wherein p is 1 or 2 and q is 1.
6. The water-resistant nanofilm according to claim 1 , wherein the monomer 1 is selected from a group consisting of: 1H,1H,2H,2H-Perfluorooctylacrylate, 1H,1H,2H,2H-perfluorohexylacrylate, perfluoro-2-methyl-2-pentene, and 1H,1H,2H,2H-Perfluorooctyltriethoxysilane.
7. The water-resistant nanofilm according to claim 1 , wherein k is an integer ranging from 0 to 2.
8. The water-resistant nanofilm according to claim 1 , wherein the monomer 2 is selected from a group consisting of: vinyl triethoxysilane and vinyl trimethoxysilane.
9. The water-resistant nanofilm according to claim 1 , wherein the substrate is one selected from a group consisting of: electronic products, silk fabric, woven bag, metal products, glass products and ceramic products.
10. An article comprising a water-resistant nanofilm, wherein the article is prepared by exposing the article to plasma source which contains a structural formula C x F 2x+2 or C x F 2x , and forming the water-resistant nanofilm on at least a part of surfaces of the article from reaction materials by plasma enhanced chemical vapor deposition, wherein x is 1, 2 or 3,
wherein the water-resistant nanofilm is formed of one, two or three selected from a group consisting of monomer 1, monomer 2 and monomer 3 as reaction materials for vapor deposition,
wherein the monomer 1 has a structural formula (I):
Y—C m H 2m —C n F 2n+1 (I)
where m is an integer ranging from 0 to 4, n is an integer ranging from 1 to 12, and Y represents an organic functional group and is selected from the following structure: vinyl, halogened vinyl, alkyl substituted vinyl, acrylate group, C—C—O—C(O), methacrylate group, and, hydroxyl,
and the monomer 2 has a structural formula (II)
where R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are respectively selected from hydrogen, alkyl, aryl, halogenated aryl, halogen, halogenated alkyl, alkoxy and vinyl, and k is an integer ranging from 0 to 4, and the monomer 3 comprises one or more selected from a group consisting of glycidyl methacrylate, allyl glycidyl ether, 1,2-epoxy-4-vinyl cyclohexane, 3-(2,3-epoxy-propoxy) propyl vinyl dimethoxysilane and enbucrilate, or the monomer 3 has a structural formula (III),
where R 7 , R 8 , R 9 , R 10 , R 11 and R 12 are respectively selected from hydrogen, alkyl, aryl, halogen, halogenated alkyl, and halogenated aryl, and i as well as h are integers ranging from 0 to 10 but not both be 0 in the meantime, and R 13 represents bond, —CO—, —COO—, arylene, alicyclic alkylene or hydroxyl substituted aliphatic alkylene,
wherein a thickness of the water-resistant nanofilm ranges from 10 to 2000 nm.