Method for manufacturing a semiconductor structure using isolation layers for etching the trenches in a substrate
Embodiments of the present disclosure provide a semiconductor structure and a method for manufacturing the same. The manufacturing method includes: providing a substrate and bit line structures on the substrate; forming a first isolation layer, the first isolation layer being located on side walls of the bit line structures and on the substrate; forming a second isolation layer, the second isolation layer covering the first isolation layer located on the side walls of the bit line structures, and exposing the first isolation layer located on the substrate; removing the first isolation layer exposed by the second isolation layer and part of the first isolation layer below the second isolation layer, so that remaining of the first isolation layer is recessed compared to the second isolation layer toward the side walls of the bit line structures to form a groove.
1. A method for manufacturing a semiconductor structure, the manufacturing method comprising:
providing a substrate and bit line structures on the substrate;
forming a first isolation layer, the first isolation layer being located on side walls of the bit line structures and on the substrate;
forming a second isolation layer, the second isolation layer covering the first isolation layer located on the side walls of the bit line structures, and exposing the first isolation layer located on the substrate;
removing the first isolation layer exposed by the second isolation layer and part of the first isolation layer below the second isolation layer, so that remaining of the first isolation layer is recessed compared to the second isolation layer toward the side walls of the bit line structures to form grooves;
forming a third isolation layer filling the grooves, the third isolation layer covering a surface of the first isolation layer exposed by the grooves, and a material of the third isolation layer being different from a material of the first isolation layer;
etching the substrate between adjacent parts of the second isolation layers to form trenches, the trenches being located between adjacent bit line structures; and
forming a capacitor contact layer, the capacitor contact layer filling the trenches and being located between the adjacent bit line structures.
2. The method for manufacturing the semiconductor structure according to claim 1 , wherein the first isolation layer exposed by the second isolation layer and part of the first isolation layer below the second isolation layer are removed by dry etching process; wherein an etching selection ratio of the first isolation layer to the second isolation layer in the dry etching process is 5:1 to 10:1.
3. The method for manufacturing the semiconductor structure according to claim 2 , wherein etching gas used in the dry etching process comprises nitrogen trifluoride, hydrogen and nitrogen; a flow ratio of the nitrogen trifluoride, the hydrogen and the nitrogen is (5-10):(200-500):(2000-5000).
4. The method for manufacturing the semiconductor structure according to claim 2 , wherein process parameters of the dry etching process comprise: radio frequency power of 300 W to 1500 W, etching time of 10 s to 60 s, and etching temperature of 30° C. to 50° C.
5. The method for manufacturing the semiconductor structure according to claim 2 , wherein after the grooves are formed, in a direction parallel to a surface of the substrate, a distance from a surface of the first isolation layer exposed by the groove to the side walls of the bit line structures is a first distance, a distance from a side of the second isolation layer away from the bit line structure to the side walls of the bit line structures is a second distance, and a difference between the first distance and the second distance is 3 nm to 10 nm.
6. The method for manufacturing the semiconductor structure according to claim 2 , wherein in a direction perpendicular to a surface of the substrate, a thickness ratio of the first isolation layer to the second isolation layer on the substrate is 0.3 to 4.
7. The method for manufacturing the semiconductor structure according to claim 1 , wherein the step of forming the second isolation layer comprises:
forming an initial second isolation layer, the initial second isolation layer covering a surface of the first isolation layer; and
removing part of the initial second isolation layer on the substrate to expose the first isolation layer on the substrate, remaining of the initial second isolation layer serving as the second isolation layer.
8. The method for manufacturing the semiconductor structure according to claim 1 , wherein the third isolation layer is also located on side walls of the second isolation layer, and the step of forming the third isolation layer comprises:
forming an initial third isolation layer, the initial third isolation layer being located on a surface of the second isolation layer and the substrate, and also filling the grooves; and
removing the initial third isolation layer on the substrate, remaining of the initial third isolation layer serving as the third isolation layer.
9. The method for manufacturing the semiconductor structure according to claim 8 , wherein the initial third isolation layer is formed by atomic layer deposition process.
10. The method for manufacturing the semiconductor structure according to claim 1 , before forming the capacitor contact layer, the manufacturing method further comprises: performing wet cleaning on a surface of the trenches to remove impurities on the surface of the trenches.