Lithographic apparatus and ultraviolet radiation control system
The present disclosure provides an ultraviolet radiation control system and a related method for control an ultraviolet radiation in a lithographic apparatus. The ultraviolet radiation control system comprises a housing; a conversion crystal ( 540 ), disposed on or in the housing, configured to convert an ultraviolet radiation to a fluorescent radiation; a plurality of photodetectors ( 550 ) configured to detect an intensity of a scattered portion of the fluorescent radiation; and at least one diffusive surface ( 545 ), disposed on or in the conversion crystal, configured to increase the intensity of the scattered portion of the fluorescent radiation.
1. An ultraviolet radiation control system, comprising:
a housing;
a conversion crystal, disposed on or in the housing, configured to convert an ultraviolet radiation to a fluorescent radiation;
a plurality of photodetectors configured to detect an intensity of a scattered portion of the fluorescent radiation; and
at least one diffusive surface, disposed on or in a flat surface of the conversion crystal, configured to increase the intensity of the scattered portion of the fluorescent radiation.
2. The ultraviolet radiation control system of claim 1 , wherein:
the at least one diffusive surface is disposed spatially close to the plurality of photodetectors.
3. The ultraviolet radiation control system of claim 2 , wherein:
the conversion crystal comprises a disk shape; and
the plurality of photodetectors are evenly spaced about an annular peripheral edge of the conversion crystal.
4. The ultraviolet radiation control system of claim 3 , wherein:
the at least one diffusive surface comprises a ring shape.
5. The ultraviolet radiation control system of claim 3 , wherein:
the at least one diffusive surface comprises a plurality of segments arranged in a discontinuous ring shape, each of the plurality of segments being located adjacent a given one of the plurality of photodetectors.
6. The ultraviolet radiation control system of claim 3 , wherein:
the plurality of photodetectors are disposed at a first side of the conversion crystal; and
the at least one diffusive surface is disposed at a second side of the conversion crystal that is opposite to the first side.
7. The ultraviolet radiation control system of claim 3 , wherein:
the plurality of photodetectors are disposed at a first side of the conversion crystal; and
the at least one diffusive surface is disposed at the first side of the conversion crystal.
8. The ultraviolet radiation control system of claim 3 , wherein:
the plurality of photodetectors are disposed at a first side of the conversion crystal; and
the at least one diffusive surface comprises a first diffusive surface disposed at the first side of the conversion crystal, and a second diffusive surface is disposed at a second side of the conversion crystal that is opposite to the first side.
9. The ultraviolet radiation control system of claim 3 , wherein:
the plurality of photodetectors are disposed so as to surround the annular peripheral edge of the conversion crystal; and
the at least one diffusive surface is located at the annular peripheral edge of the conversion crystal.
10. The ultraviolet radiation control system of claim 1 comprising only a single conversion crystal.
11. The ultraviolet radiation control system of claim 1 , wherein:
the ultraviolet radiation is a deep ultraviolet radiation.
12. The ultraviolet radiation control system of claim 11 , wherein:
the ultraviolet radiation is a branched beam from a 193 nm excimer pulsed laser.
13. The ultraviolet radiation control system of claim 1 , wherein:
the plurality of photodetectors are disposed on a ring shaped spacer that is disposed on an insulator.
14. The ultraviolet radiation control system of claim 13 , further comprising:
a light dump or a mirror located in a center of the ring shaped spacer and configured to reflect a portion of the ultraviolet radiation transmitted from the conversion crystal back to the conversion crystal to increase an amount of fluorescent radiation converted from the ultraviolet radiation.
15. The ultraviolet radiation control system of claim 13 , wherein:
the housing is configured to protect the conversion crystal and the plurality of photodetectors; and
the system further comprises:
a purge cap fixed on the housing, and
a purge channel located within the purge cap or between the housing and the purge cap.
16. The ultraviolet radiation control system of claim 15 , further comprising:
a first seal, a plurality of springs, and a crystal spring holder arranged between the purge cap and the insulator.
17. The ultraviolet radiation control system of claim 16 , further comprising:
a second seal and a centering O-ring arranged between the conversion crystal and the housing.
18. The ultraviolet radiation control system of claim 1 , wherein:
the at least one diffusive surface includes impurities embedded in a layer of the conversion crystal configured to scatter the fluorescent radiation.
19. A lithographic apparatus, comprising the ultraviolet radiation control system of claim 1 .
20. A method for detecting radiation, comprising:
receiving ultraviolet radiation at a conversion crystal, wherein the conversion crystal is configured to convert the ultraviolet radiation to a fluorescent radiation; and
detecting an intensity of a scattered portion of the fluorescent radiation using a plurality of photodetectors,
wherein at least one diffusive surface is disposed on or in a flat surface of the conversion crystal to increase the intensity of the scattered portion of the fluorescent radiation.