IP Library › Granted Patent US 12,195,205
Granted Patent B2
US 12,195,205 · App. 17/635,677 · Granted Jan 14, 2025

Propellant injector system for plasma production devices and thrusters

Inventors: David Tsai (El Segundo, CA); Derek Thompson (El Segundo, CA); Mohammed Umair Siddiqui (El Segundo, CA)
Assignee: PHASE FOUR, INC.
B64G1/405F03H1/0012H05H1/54
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Quick Facts
Patent No.
US 12,195,205
App. No.
17/635,677
Granted
Jan 14, 2025
Kind
B2
Abstract

An electrothermal plasma production device is presented. The plasma production device includes: a plasma production chamber; an RF antenna external to the plasma production chamber; a propellant tank and flow regulator external to the plasma production chamber and in communication with the plasma production chamber; and a plenum disposed between the propellant tank and the plasma production chamber. The RF antenna, in combination with an AC power source, is configured to provide an RF energy to an interior region of the plasma production chamber and to an interior region of the plenum with sufficient power to ionize at least some of the propellant in the plenum. The plasma production chamber is configured to include a propellant injector for receiving propellant at a first closed end of the plasma production chamber.

Claims (47)

1. A plasma production device comprising:

(a) a plasma production chamber having a first closed end comprising an aperture and a second open end;

(b) a radio frequency (RF) antenna external to the plasma production chamber, electrically coupled to an AC power source, the RF antenna configured to radiate an RF energy based on an RF frequency generated by the AC power source;

(c) a propellant tank and flow regulator in communication with the plasma production chamber; and

(d) a plenum, wherein the plenum is disposed between the propellant tank and the plasma production chamber, the plenum comprising a plenum chamber that is external to the plasma production chamber;

wherein the plenum is configured to accept propellant at an upstream end of the plenum chamber from the propellant tank and dispense propellant at a downstream end of the plenum chamber into the plasma production chamber through the aperture;

wherein the plasma production device is configured such that, when propellant is flowing from the propellant tank to the plasma production chamber, the propellant has a plenum pressure (Pp) that is greater than a plasma production chamber pressure (Pc),

wherein the RF antenna, in combination with the AC power source, is configured to provide:

a portion of the RF energy to an interior region of the plenum with sufficient power to ionize at least some of the propellant in the plenum thereby producing high-energy electrons that are fed into an interior region of the plasma production chamber, and

another portion of the RF energy to the interior region of the plasma production chamber, so to provide, in combination with the high energy electrons, sufficient power to ionize a remaining portion of the propellant in the plasma production chamber, and

wherein the plasma production device is an electrothermal RF plasma production device.

2. The plasma production device of claim 1 , wherein the RF frequency is in a range from 3 MHz to 300 MHz.

3. The plasma production device of claim 1 , wherein the first closed end comprises a closed-end portion of the RF antenna, the close-end portion of the RF antenna being configured to deliver the RF energy to the interior region of the plenum.

4. The plasma production device of claim 1 , wherein the high energy electrons generated through ionization of the at least some of the propellant in the plenum and fed to the interior region of the plasma production chamber facilitate plasma ignition within the plasma production chamber.

5. The plasma production device of claim 1 , wherein the aperture is configured to maintain Pp>PC when propellant is flowing from the propellant tank into the plasma production chamber.

6. The plasma production device of claim 1 , wherein the propellant tank comprises a solid or liquid propellant.

7. The plasma production device of claim 6 , wherein the propellant is selected from a group consisting of: ammonia, iodine (I2), water, water vapor, bismuth, magnesium, cesium, zinc, caffeine, methane (CH4), ethane (C2H6), propane (C3H8), butane (C4H10), other higher order alkanes, and hydrogen peroxide.

8. The plasma production device of claim 6 , wherein the propellant is selected from a group consisting of: xenon, krypton, argon, air and other N2-O2 mixtures, nitrogen (N2), oxygen (O2), carbon dioxide (CO2), and dinitrogen oxide (N2O).

9. A plasma production device comprising:

(a) a downstream plasma production chamber having a cylindrical body with a first closed end for receiving a propellant and a second open end for exiting a plasma formed by ionization of the propellant within the downstream plasma production chamber;

(b) a radio frequency (RF) antenna external to the downstream plasma production chamber, electrically coupled to an AC power source, and configured to deliver an RF energy to an interior region of the downstream plasma production chamber; and

(c) an upstream propellant tank and flow regulator in communication with the downstream plasma production chamber, the upstream propellant tank and flow regulator being external to the downstream plasma production chamber,

wherein the cylindrical body of the downstream plasma production chamber comprises a propellant injector for receiving the propellant at the first closed end of the downstream plasma production chamber, the propellant injector providing a propellant flow path between an outer face and an inner face of the propellant injector,

wherein the outer face of the propellant injector comprises at least one outer face aperture at the first closed end for receiving of the propellant from the upstream propellant tank,

wherein the inner face of the propellant injector comprises a plurality of inner face apertures,

wherein the plasma production device is an electrothermal RF plasma production device,

wherein all of the plurality of inner face apertures are laterally offset relative to a longitudinal axis of the cylindrical body of the downstream plasma production chamber, and wherein the at least one outer face aperture consists of a single outer face aperture that is laterally offset relative to the longitudinal axis of the cylindrical body of the downstream plasma production chamber.

10. The plasma production device of claim 9 , wherein the plurality of inner face apertures comprises one inner face aperture aligned with the longitudinal axis of the cylindrical body.

11. The plasma production device of claim 10 , wherein the plurality of inner face apertures further comprises a plurality of inner face apertures that are laterally offset relative to the longitudinal axis of the cylindrical body of the downstream plasma production chamber.

12. The plasma production device of claim 9 , wherein the upstream propellant tank comprises a solid or liquid propellant.

13. A plasma production device comprising:

(a) a downstream plasma production chamber having a cylindrical body with a first closed end for receiving a propellant and a second open end for exiting a plasma formed by ionization of the propellant within the downstream plasma production chamber:

(b) a radio frequency (RF) antenna external to the downstream plasma production chamber, electrically coupled to an AC power source, and configured to deliver an RF energy to an interior region of the downstream plasma production chamber;

(c) an upstream propellant tank and flow regulator in communication with the downstream plasma production chamber, the upstream propellant tank and flow regulator being external to the downstream plasma production chamber; and

(d) a plenum disposed between the upstream propellant tank and the downstream plasma production chamber,

wherein the cylindrical body of the downstream plasma production chamber comprises a propellant injector for receiving the propellant at the first closed end of the downstream plasma production chamber, the propellant injector providing a propellant flow path between an outer face and an inner face of the propellant injector,

wherein the outer face of the propellant injector comprises at least one outer face aperture at the first closed end for receiving of the propellant from the upstream propellant tank,

wherein the inner face of the propellant injector comprises a plurality of inner face apertures,

wherein the plasma production device is an electrothermal RF plasma production device,

wherein the plenum is configured to accept propellant at an upstream end from the upstream propellant tank and dispense propellant at a downstream end into the downstream plasma production chamber through a plenum aperture,

wherein the plasma production device is configured such that, when propellant is flowing from the upstream propellant tank to the downstream plasma production chamber, the propellant has a plenum pressure (Pp) that is greater than a plasma production chamber pressure (Pc), and

wherein the RF antenna, in combination with the AC power source, is further configured to provide an RF energy to an interior region of the plenum with sufficient power to ionize at least some of the propellant in the plenum.

14. The plasma production device of claim 13 , wherein the RF energy radiated from the RF antenna is in a frequency range from 3 MHz to 300 MHZ, and wherein the frequency range provided by the AC power source.

15. The plasma production device of claim 13 , wherein high-energy electrons generated through ionization of at least some of the propellant in the plenum are delivered to the downstream plasma production chamber to facilitate plasma ignition within downstream plasma production chamber.

16. The plasma production device of claim 13 , wherein the first closed end comprises a closed-end portion of the RF antenna that is configured to deliver the RF energy to the interior region of the downstream plasma production chamber and to the interior region of the plenum.

17. The plasma production device of claim 13 , wherein the plenum aperture is configured to maintain Pp>PC when propellant is flowing from the upstream propellant tank into the downstream plasma production chamber.

18. The plasma production device of claim 17 , wherein the propellant pressure (Pp) is established to optimize probability of propellant ionization in the plenum.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 4, 2025
From: PHASE FOUR, INC.
To: QUANTUM SPACE, LLC
Reel/Frame 073110/0970 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 28, 2022
From: TSAI, DAVID; THOMPSON, DEREK; SIDDIQUI, MOHAMMED UMAIR
To: PHASE FOUR, INC.
Reel/Frame 059418/0143 →
Continuity (2)
Provisional Application 62895816 · Sep 4, 2019
Related Publication 20220281620A1 · Sep 8, 2022
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