Organometallic compounds for the deposition of high purity tin oxide and dry etching of the tin oxide films and deposition reactors
Specific organometallic compounds of Formula I: Q x -Sn-(A 1 R 1 ′ z ) 4-x or Formula II: Sn(NR 2 (CH 2 ) n A 2 ) 2 useful for the deposition of high purity tin oxide, as well as methods of using such compounds are disclosed. Also disclosed are compositions of organometallic compounds useful for the deposition of high purity tin oxide that in combination improve stability. Also disclosed are processes for dry etching tin oxide with a particular etchant gas and/or a process for dry etching a substrate using a particular etchant gas with a specific additive.
1 . An organometallic compound of Formula II:
Sn(NR 2 (CH 2 ) n A 2 ) 2
wherein:
each A 2 is independently selected from NR 2 ′ or O;
each R 2 group is independently selected from the group consisting of an alkyl having from 1 to 10 carbon atoms and an aryl group;
each R 2 ′ group is independently selected from the group consisting of hydrogen, an alkyl or acyl group having from 1 to 10 carbon atoms and an aryl group;
or when one or two of A 2 is NR 2 ′, then one or two of the R 2 ′ may optionally form a bond to the R 2 that is in the same ring as the R 2 ′;
n is 2 or 3;
optionally at least one of the (CH 2 ) has one or more substitutions with an alkyl group having from 1 to 10 carbon atoms.
2 . The organometallic compound of claim 1 , wherein each A 2 is O.
3 . The organometallic compound of claim 2 , wherein each R 2 group is independently selected from the group consisting of an alkyl group having 1 to 4 carbon atoms.
4 . The organometallic compound of claim 1 , wherein at least one of the CH 2 has one or more substitutions with an alkyl group having from 1 to 10 carbon atoms.
5 . The organometallic compound of claim 4 , wherein only one of the CH 2 in each NR 2 (CH 2 ) n A 2 ligand has one or more substitutions with an alkyl group having from 1 to 10 carbon atoms.
6 . The organometallic compound of claim 5 , wherein the only one of the CH 2 in each amine has two substitutions with methyl or ethyl.
7 . The organometallic compound of claim 1 , wherein each A 2 is N and Formula II is represented by Formula IIb:
wherein each R 2 ″ group and each R 2 ′″ group is an independently selected alkyl group having 1 to 10 carbon atoms.
8 . The organometallic compound of claim 7 , wherein each R 2 ″ group and each R 2 ′″ group is methyl or ethyl.
9 . The organometallic compound of claim 4 , wherein each R 2 group and each R 2 ′ group is independently selected from the group consisting of an alkyl group having 1 to 4 carbon atoms.
10 . The organometallic compound of claim 4 , wherein each R 2 ′ group is hydrogen.
11 . The organometallic compound of claim 1 , wherein one or two of A 2 is NR 2 ′ and at least one R 2 ′ forms a bond to the R 2 that is in the same ring as the R 2 ′.
12 . The organometallic compound of claim 11 , wherein the organometallic compound of Formula II is Sn(N 2 C 4 H 8 ) 2 :
13 . The organometallic compound of claim 1 , wherein each (NR 2 (CH 2 ) n A 2 ) is selected from the group consisting of N,N′-dimethylethylenediamine (NMe(CH 2 ) 2 NMe), piperazine (N 2 C 4 H 8 ), N,N′-diethylethylenediamine (NEt(CH 2 ) 2 NEt), N,N′-diisopropylethylenediamine (NiPr(CH 2 ) 2 NiPr), N,N′-di-tert-butylethylenediamine (NtBu(CH 2 ) 2 NtBu), N,N′-dimethyl-1,3-propanediamine (NMe(CH 2 ) 3 NMe), 2-(methylamino)ethanol (NMe(CH 2 ) 2 O), and 2-(ethylamino)ethanol (NEt(CH 2 ) 2 O).