IP Library Granted Patent US 12,264,095
Granted Patent B2
US 12,264,095 · App. 17/642,525 · Granted Apr 1, 2025

Reflective member and glass layered member production method

Inventors: Toru Segawa (Tokyo, JP); Kazuhiro Yamaguchi (Tokyo, JP); Tomonori Watanabe (Tokyo, JP); Daiki Fujita (Yamagata, JP)
Assignees: Shin-Etsu Quartz Products Co., Ltd.; Heraeus Quarzglas GmbH & Co. KG
C03B19/066B32B5/16B32B17/06B32B17/068C03B19/063C03B23/203B32B2255/20B32B2264/1021B32B2307/416C03C3/076
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Quick Facts
Patent No.
US 12,264,095
App. No.
17/642,525
Granted
Apr 1, 2025
Kind
B2
Abstract

One aspect is a reflective member, which has a laminated structure in which transparent quartz glass members are formed on an upper surface and a lower surface of an opaque siliceous sintered powder layer. The opaque siliceous sintered powder layer has a thickness of 0.1 mm or more and a thickness distribution of ±0.05 mm or less. When a load is applied to each of the transparent quartz glass members on an upper surface and a lower surface of the laminated structure in a direction parallel to the laminated structure, the reflective member is fractured at a load of 5 N or more per square centimeter. The laminated structure includes a semi-transparent portion having a width of 0.01 mm or less, which has an intermediate opacity between an opacity of the opaque siliceous sintered powder layer and an opacity of each of the transparent quartz glass members.

Claims (10)

1. A reflective member comprising:

a laminated structure in which transparent quartz glass members are formed on an upper surface and a lower surface of an opaque siliceous sintered powder layer,

wherein the opaque siliceous sintered powder layer has a thickness of 0.1 mm or more and a thickness distribution of ±0.05 mm or less,

wherein, when a load is applied to each of the transparent quartz glass members on an upper surface and a lower surface of the laminated structure in a direction parallel to the laminated structure, the reflective member is fractured at a load of 5 N or more per square centimeter, and

wherein the laminated structure includes, in a boundary between the opaque siliceous sintered powder layer and each of the transparent quartz glass members of the laminated structure, a semi-transparent portion having a width of 0.01 mm or less, which has an intermediate opacity between an opacity of the opaque siliceous sintered powder layer and an opacity of each of the transparent quartz glass members.

2. The reflective member according to claim 1 , wherein the reflective member has a reflectance of 60% or more at a wavelength of from 1,000 nm to 2,000 nm.

3. The reflective member according to claim 1 , wherein the siliceous sintered powder layer has a bulk density of from 1.3 g/cm 3 to 1.5 g/cm 3 .

4. The reflective member according to claim 1 ,

wherein the reflective member comprises a plurality of the siliceous sintered powder layers, and

wherein the siliceous sintered powder layers and the quartz glass members are alternately laminated.

Assignments (2)
MERGER Recorded Sep 16, 2022
From: YAMAGATA SHIN-ETSU QUARTZ CO., LTD.
To: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.
Reel/Frame 061123/0251 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 26, 2022
From: SEGAWA, TORU; YAMAGUCHI, KAZUHIRO; WATANABE, TOMONORI; FUJITA, DAIKI
To: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.; YAMAGATA SHIN-ETSU QUARTZ CO., LTD.; HERAEUS QUARZGLAS GMBH & CO. KG
Reel/Frame 060909/0685 →
Priority Claims (1)
JP 2019-167467 · Sep 13, 2019 · national
Continuity (1)
Related Publication 20220324740A1 · Oct 13, 2022
References Cited (16)
US 8920878B2 · Werdecker · 2014 [cited by examiner]
US 20090308315A1 · De Ridder · 2009 [cited by examiner]
US 20100319608A1 · Kanda · 2010 [cited by examiner]
US 20120237685A1 · Werdecker · 2012 [cited by examiner]
JP H08119650 · 1996 [cited by applicant]
JP 2002160930 · 2002 [cited by applicant]
JP 2004067456 · 2004 [cited by applicant]
JP 2009084113 · 2009 [cited by applicant]
JP 2009302547 · 2009 [cited by applicant]
JP 2013035723 · 2013 [cited by applicant]
JP 5679591 · 2013 [cited by applicant]
JP 2017154945 · 2017 [cited by applicant]
JP 2017165643 · 2017 [cited by applicant]
JP 2018531863 · 2018 [cited by applicant]
JP2013035723A EPO Machine Translation Retrieved Jul. 17, 2024. (Year: 2024). [cited by examiner]
Written Opintion and International Search Report in PCT/JP2020/031011 dated Nov. 2, 2020. [cited by applicant]