Defect inspection method
According to an embodiment, a defect inspection method is performed with a defect inspection apparatus. The defect inspection apparatus is adapted to irradiate a first sample with illumination light to acquire a first sample image, and compare the first sample image to a reference image to inspect a defect. The defect inspection method includes generating the reference image, acquiring the first sample image, setting a defect detection condition using an index based on a result of defect inspection of a second sample different from the first sample, and discriminating a nuisance from a result of comparison between the reference image and the first sample image based on the defect detection condition.
1. A defect inspection method performed with a defect inspection apparatus, the defect inspection apparatus adapted to irradiate a first sample with illumination light to acquire a first sample optical image, and compare the first sample optical image to a reference image to inspect a defect of a mask used in a semiconductor manufacturing process, the defect inspection method comprising:
generating the reference image based on data of the mask;
acquiring the first sample optical image;
setting a defect detection condition using an index based on a result of defect inspection of a second sample different from the first sample; and
discriminating a nuisance from a result of comparison between the reference image and the first sample optical image based on the defect detection condition.
2. The defect inspection method according to claim 1 , wherein the reference image is generated based on design data of the mask used for the first sample.
3. The defect inspection method according to claim 1 , wherein the reference image is generated for a region different from a region for which the first sample optical image is acquired but having a same pattern of the mask used for the first sample.
4. The defect inspection method according to claim 1 , wherein the index is prepared based on the result of the defect inspection of the second sample and a prediction of yields which is based on design data for the first sample.
5. The defect inspection method according to claim 4 , wherein the result of the defect inspection of the second sample comprises sensitivity information indicative of detection sensitivity for the nuisance.
6. The defect inspection method according to claim 1 , wherein the defect inspection of the second sample uses a defect detection condition set based on design data for the first sample.
7. The defect inspection method according to claim 1 , wherein the index is set based on the result of the defect inspection of the second sample and information on manufacturing capability for a product which is based on the second sample, wherein the information on the manufacturing capability for the product comprises information on defect inspection, a review result for the product, and yield information of the product.
8. The defect inspection method according to claim 1 , wherein the setting the defect detection condition comprises:
conducting defect detection of a third sample different from the first sample and the second sample; and
predicting yields based on a result of the defect inspection of the third sample.
9. The defect inspection method according to claim 1 , wherein the defect detection condition comprises multiple elements including defect categorization, defect grouping, defect detection sensitivity, and nuisance filtering.
10. The defect inspection method according to claim 9 , wherein the multiple elements are selected and/or excluded based on the index.
11. The defect inspection method according to claim 9 , wherein the defect detection sensitivity is set based on the index.
12. The defect inspection method according to claim 1 , further comprising setting an optical-system condition based on design data for the first sample.