Low-profile intercranial device with enhancing grounding to ensure proper impedance measurements
A low-profile intercranial device adapted for housing a functional neurosurgical implant in manner providing for convenient and reliable grounding to ensure proper impedance measurements includes a static cranial implant including a base cranial implant member including an outer first surface, an inner second surface, and a recess shaped and dimensioned for receiving a functional neurosurgical implant. The low-profile intercranial device includes a plurality of fluid passageways extending between the inner second surface and the recess allowing for the flow of bodily fluid between an external environment of the base cranial implant member and a cavity defined by the recess.
1. A cranial implant providing for convenient and reliable grounding of a functional neurosurgical implant to ensure proper impedance measurements, comprising:
a base cranial implant member including an outer first surface, an inner second surface, and a recess, the recess being shaped and dimensioned to selectively receive a functional neurosurgical implant;
at least one fluid passageway extending between the inner second surface and the recess allowing for flow of bodily fluid between an external environment of the base cranial implant member and a cavity defined by the recess providing for bodily fluid contact with the functional neurosurgical implant to ground the functional neurosurgical implant;
a cover cranial implant member shaped and dimensioned to cover the recess.
2. The intercranial device according to claim 1 , wherein the base cranial implant member has a geometry that substantially conforms with a resected portion of a patient's anatomy.
3. The intercranial device according to claim 1 , wherein the recess includes internal side walls and a recess base surface, and the at least one fluid passageway extends between the inner second surface and the recess base surface.
4. The intercranial device according to claim 1 , further including a functional neurosurgical implant positioned within the recess.
5. The intercranial device according to claim 1 , wherein the at least one fluid passageway includes a plurality of fluid passageways.
6. The intercranial device according to claim 5 , wherein the plurality of fluid passageways are formed in opposed corners of the recess.
7. The intercranial device according to claim 1 , further including suture holes within a recess base surface of the recess.
8. The intercranial device according to claim 1 , wherein the base cranial implant member is made of a clear material.
9. The intercranial device according to claim 1 , wherein the base cranial implant member further includes channels accommodating leads of the functional neurosurgical implant.
10. The intercranial device according to claim 1 , wherein the functional neurosurgical implant is a neurostimulation device.