Infrared sensor
An infrared sensor includes a substrate, an active pixel array, a reference pixel array, a light absorbing layer, a sidewall spacer, and a shading layer. The active pixel array is over the substrate. The reference pixel is over the substrate, adjacent to the active pixel array, and having a reference pixel. The reference pixel includes a platform, a resistor, and an infrared sensing material layer. The resistor is on the platform. The infrared sensing material layer is over the resistor. The light absorbing layer is over the reference pixel. The sidewall spacer is over the reference pixel and extends along a sidewall of the light absorbing layer. The shading layer is conformally formed over the light absorbing layer and the sidewall spacer.
1. An infrared sensor, comprising:
a substrate;
an active pixel array over the substrate;
a reference pixel array over the substrate, adjacent to the active pixel array, and having a first reference pixel, the first reference pixel comprising:
a first platform;
a first resistor on the first platform; and
a first infrared sensing material layer over the first resistor;
a first light absorbing layer over the first reference pixel;
a first sidewall spacer over the first reference pixel, the first sidewall spacer laterally abutting a protruding portion of the first light absorbing layer and extending vertically along a sidewall of the protruding portion; and
a first light shielding layer conformally formed over the first light absorbing layer and the first sidewall spacer.
2. The infrared sensor of claim 1 , wherein the first light absorbing layer extends beyond opposite edges of the first platform.
3. The infrared sensor of claim 2 , wherein the reference pixel array further comprises a second reference pixel adjacent to the first reference pixel, the first light absorbing layer extending to the second reference pixel and overlapping the second reference pixel.
4. The infrared sensor of claim 1 , wherein the reference pixel array further comprises a second reference pixel adjacent to the first reference pixel, the first light absorbing layer non-overlapping the second reference pixel.
5. The infrared sensor of claim 4 , wherein the second reference pixel comprises:
a second platform;
a second resistor on the second platform; and
a second infrared sensing material layer over the second resistor, the infrared sensor further comprising:
a second light absorbing layer over the second reference pixel;
a second sidewall spacer over the second reference pixel and extending along a sidewall of the second light absorbing layer; and
a second light shielding layer conformally formed over the second light absorbing layer and the second sidewall spacer.
6. The infrared sensor of claim 1 , wherein the first sidewall spacer is made of a different than the first light absorbing layer.
7. The infrared sensor of claim 1 , wherein the first sidewall spacer is made of silicon oxide, and the first light absorbing layer is made of silicon nitride.
8. The infrared sensor of claim 1 , wherein the first light shielding layer has an inverted U-shaped cross section.
9. The infrared sensor of claim 1 , wherein the first light shielding layer is made of a conductive material.
10. The infrared sensor of claim 1 , wherein the first infrared sensing material layer is made of vanadium oxide.