Thermal mismatch reduction in semiconductor device modules
In a general aspect, a semiconductor device assembly includes a direct-bonded-metal (DBM) substrate having a ceramic layer, and a first metal layer having a uniform thickness that is disposed on a first surface of the DBM substrate. The assembly further includes a second metal layer disposed on a second surface of the DBM substrate opposite the first surface. The second metal layer includes a first portion having a first thickness, and a second portion having a second thickness, the second thickness being greater than the first thickness. The second portion of the second metal layer includes a metal alloy having a coefficient of thermal expansion (CTE) in a range of 7 to 11 parts-per-million per degrees Celsius (ppm/° C.). The assembly also includes a semiconductor die having a first surface coupled with the second portion of the second metal layer.
1. A semiconductor device assembly comprising:
a first direct-bonded-metal (DBM) substrate including:
a first ceramic layer, and
a first metal layer disposed on a first surface of the first ceramic layer, the first metal layer including:
a first portion having a first thickness; and
a second portion having a second thickness, the second thickness being greater than the first thickness, the second portion including a metal alloy having a coefficient of thermal expansion (CTE) in a range of 7 to 11 part-per-million per degrees Celsius (ppm/° C.);
a first semiconductor die having a first surface coupled with the second portion of the first metal layer;
a second DBM substrate including a second ceramic layer, and a second metal layer disposed on a first surface of the second ceramic layer, the second metal layer including a first portion having the first thickness, and a second portion having the second thickness and including the metal alloy; and
a second semiconductor die having a first surface coupled with the second portion of the second metal layer, and a second surface coupled with the first portion of the first metal layer,
a second surface of the first semiconductor die being coupled with the first portion of the second metal layer.
2. The semiconductor device assembly of claim 1 , wherein the CTE of the metal alloy is in a range of 8 to 10 ppm/° C.
3. The semiconductor device assembly of claim 1 , wherein the metal alloy includes a copper molybdenum (CuMo) metal alloy.
4. The semiconductor device assembly of claim 1 , wherein the first portion of the first metal layer includes the metal alloy.
5. The semiconductor device assembly of claim 1 , wherein:
the metal alloy is a first metal;
the second portion of the first metal layer includes a layer of a second metal disposed on the first ceramic layer;
the second metal having a CTE greater than the CTE of the metal alloy; and
the first metal being disposed on the second metal.
6. The semiconductor device assembly of claim 5 , wherein the first metal is grown on the second metal.
7. The semiconductor device assembly of claim 5 , wherein the layer of the second metal includes a copper layer.
8. The semiconductor device assembly of claim 7 , wherein the first portion of the first metal layer is included in the copper layer.
9. The semiconductor device assembly of claim 1 , wherein the first metal layer is coupled with the first ceramic layer using one of:
active metal brazing;
diffusion bonding; or
sintering.
10. The semiconductor device assembly of claim 1 , further comprising:
a third metal layer disposed on a first second surface of the first ceramic layer opposite the first surface of the first ceramic layer, the third metal layer having a uniform thickness; and
a fourth metal layer disposed on a second surface of the second ceramic layer opposite the first surface of the second ceramic layer, the fourth metal layer having a uniform thickness.
11. The semiconductor device assembly of claim 10 , wherein:
the first semiconductor die includes a high-side switch of a half-bridge circuit; and
the second semiconductor die includes a low-side switch of the half-bridge circuit.
12. A semiconductor device assembly comprising:
a first direct-bonded-metal (DBM) substrate including:
a first ceramic layer; and
a first metal layer disposed on a first surface of the first ceramic layer, the first metal layer including:
a first portion having a first thickness; and
a second portion having a second thickness, the second thickness being greater than the first thickness,
the first metal layer including a metal alloy having a coefficient of thermal expansion (CTE) in a range of 7 to 11 part-per-million per degrees Celsius (ppm/° C.);
a first semiconductor die having a first surface coupled with the second portion of the first metal layer;
a second DBM substrate including a second ceramic layer, and a second metal layer disposed on a first surface of the second ceramic layer, the second metal layer including a first portion having the first thickness, and a second portion having the second thickness; and
a second semiconductor die having a first surface coupled with the second portion of the second metal layer, and a second surface coupled with the first portion of the first metal layer,
a second surface of the first semiconductor die being coupled with the first portion of the second metal layer.
13. The semiconductor device assembly of claim 12 , further comprising a third metal layer disposed on a second surface of the first ceramic layer opposite the first surface of the first ceramic layer, the third metal layer including the metal alloy.
14. The semiconductor device assembly of claim 13 , wherein the metal alloy includes a copper molybdenum (CuMo) metal alloy.
15. The semiconductor device assembly of claim 12 , further comprising:
a third metal layer disposed on a second surface of the first ceramic layer opposite the first surface of the first ceramic layer, the third metal layer having a uniform thickness; and
a fourth metal layer disposed on a second surface of the second ceramic layer opposite the first surface of the second ceramic layer, the fourth metal layer having a uniform thickness.
16. The semiconductor device assembly of claim 15 , where the second metal layer, the third metal layer, and the fourth metal layer include the metal alloy.
17. A semiconductor device assembly comprising:
a direct-bonded-metal (DBM) substrate including:
a ceramic layer;
a first metal layer disposed on a first surface of ceramic layer, the first metal layer having a uniform thickness; and
a second metal layer disposed on a second surface of the ceramic layer opposite the first surface, the second metal layer having a uniform thickness;
a third metal layer directly disposed on a portion of the second metal layer, the third metal layer including a metal alloy having a coefficient of thermal expansion (CTE) in a range of 7 to 11 part-per-million per degrees Celsius (ppm/° C.), the CTE of the third metal layer being less than a CTE of the second metal layer; and
a semiconductor die having a first surface coupled with the third metal layer.
18. The semiconductor device assembly of claim 17 , wherein:
the first metal layer and the second metal layer include copper; and
the metal alloy includes a copper molybdenum (CuMo) metal alloy.
19. The semiconductor device assembly of claim 17 , wherein the metal alloy is grown on the second metal layer.