Method and device for spatial charged particle bunching
A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam configured to hit the target.
1. A charged particle bunching system comprising:
a series of electrodes arranged to generate a shaped electric field, the series comprising a first electrode, a last electrode and one or more intermediate electrodes; and
a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to spatially distribute charged particles propagating along the series of electrodes to form a charged particle beam comprising a plurality of nodes and antinodes, wherein the nodes have a charged particle density and the antinodes have substantially no charged particle density.
2. The system of claim 1 , further comprising a magnetically confined ion source configured to provide the charged particles to the electrodes.
3. The system of claim 1 , wherein the electrodes comprise apertures with tapered surfaces, the apertures configured to allow the charged particles to pass through the electrodes.
4. The system of claim 1 , further comprising a deflector comprising electrode deflection stages disposed longitudinally along an axis of the charged particle beam.
5. The system of claim 1 , further comprising a deflector comprising magnetic deflection stages disposed longitudinally along an axis of the charged particle beam.
6. The system of claim 1 , further comprising a deflector comprising a deflector lens configured to demagnify the nodes.
7. The system of claim 1 , further comprising an objective lens configured to demagnify and focus the nodes.
8. The system of claim 1 , further comprising a stage configured to continuously move a workpiece while the workpiece is exposed to the charged particle beam.
9. The system of claim 1 , wherein the charged particle beam is configured to be applied to a workpiece for biomedical research and alterations.
10. The system of claim 1 , wherein the charged particle beam is configured to be applied to a workpiece.
11. The system of claim 1 , wherein the charged particle beam is configured to provide spacecraft propulsion.
12. The system of claim 1 , wherein the charged particle beam is configured to be applied onto surveillance targets.
13. The system of claim 1 , wherein the charged particle beam is configured to be applied in open space for data transfer communications.
14. The system of claim 1 , wherein the charged particle beam is configured to interact with electromagnetic radiation that applies a pulsed incident neutralizing beam to the charged particle beam.
15. The system of claim 14 , wherein the electromagnetic radiation comprises a pulsed laser beam.
16. The system of claim 1 where the charged particle beam has a current greater than 1 nanoamp per node.
17. The system of claim 1 , wherein the charged particle beam has a total beam current greater than 1 milliamp.
18. A charged particle collimator comprising:
a beam buncher in operative communication with a source of charged particles;
a deflector configured to receive the charged particles; and
an objective lens assembly configured to receive the charged particles from the deflector, the objective lens comprising a lens, a mirror, and reflective and refractive optic lenses configured to demagnify, focus, and deflect groups of the charged particles received from the deflector to a workpiece.
19. The collimator of claim 18 , wherein the beam buncher is configured to apply a pulsed laser beam to the charged particle source.
20. The collimator of claim 18 , wherein the beam buncher is configured to modulate an on/off state of the charged particle source.
21. The collimator of claim 18 , further comprising an aperture configured to shape the charged particle beam.
22. The collimator of claim 18 , wherein the beam buncher is configured to deflect individual groups of the charged particles in a direction substantially perpendicular to an axis of propagation of the charged particle beam.