IP Library Granted Patent US 12,006,210
Granted Patent B2
US 12,006,210 · App. 17/661,805 · Granted Jun 11, 2024

System and methods for fabricating boron nitride nanostructures

Inventors: Aidin Fathalizadeh (Berkeley, CA); Thang Pham (Berkeley, CA); William Mickelson (Albany, CA); Alexander Zettl (Kensington, CA)
Assignee: The Regents of the University of California
C01B21/0641B01J19/08B82Y40/00C01B21/064C04B35/583C04B35/622B01J2219/0879B01J2219/0894B82Y30/00C01P2002/82C01P2004/03C01P2004/04C01P2004/13C01P2004/24C04B2235/5276C04B2235/5284C04B2235/5454C04B2235/767C04B2235/95Y10S977/762Y10S977/896
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Quick Facts
Patent No.
US 12,006,210
App. No.
17/661,805
Granted
Jun 11, 2024
Kind
B2
Abstract

This disclosure provides systems, methods, and apparatus related to boron nitride nanomaterials. In one aspect, a method includes generating a directed flow of plasma. A boron-containing species is introduced to the directed flow of the plasma. Boron nitride nanostructures are formed in a chamber. In another aspect, a method includes generating a directed flow of plasma using nitrogen gas. A boron-containing species is introduced to the directed flow of the plasma. The boron-containing species can consist of boron powder, boron nitride powder, and/or boron oxide powder. Boron nitride nanostructures are formed in a chamber, with a pressure in the chamber being about 3 atmospheres or greater.

Claims (35)

1. A system comprising:

a chamber, configured to contain a chamber pressure of about 3 atmospheres or greater;

an inductively coupled plasma-generating torch comprising a torch body, a nozzle, a top port, a first radial port, and a second radial port, wherein the top port is on a top portion of the torch body, wherein the first and second radial ports are positioned at a bottom portion of the torch body, and wherein the bottom portion of the torch body is attached to the chamber, wherein the inductively coupled plasma-generating torch is configured to contain a torch pressure of about 3 atmospheres or greater;

a power supply in electrical communication with the inductively coupled plasma-generating torch;

a top source comprising a gas composition, wherein the top source is in fluid communication with the top port;

a first source comprising a boron-containing species, wherein the first source is in fluid communication with the first radial port; and

a system controller, wherein the system controller is configured to:

generate a directed flow of plasma from the nozzle toward the bottom portion of the torch body using the gas composition;

radially introduce the boron-containing species through the first radial port into to the directed flow of the plasma downstream of the nozzle, wherein the directed flow of plasma is a fully formed and stable plume; and

continuously form a product selected from the group consisting of boron nitride nanostructures, boron-carbon-nitride nanostructures and combinations thereof in the chamber.

2. The system of claim 1 , wherein the first radial port is positioned at a location adjacent to the directed flow of plasma.

3. The system of claim 1 , wherein the first source further comprises a carbon-containing species.

4. The system of claim 1 , wherein the second radial port is positioned at a location above the directed flow of plasma.

5. The system of claim 1 , wherein the chamber includes a quench modifier.

6. The system of claim 5 , wherein the quench modifier is selected from the group consisting of a wire, a mesh, or combinations thereof.

7. The system of claim 1 , wherein the chamber further comprises at least one chamber port.

8. The system of claim 1 , wherein the chamber is configured to contain a chamber pressure of between 3 atm and 100 atm.

9. The system of claim 1 , wherein the chamber includes a chamber cooling system.

10. The system of claim 1 , further comprising a second source comprising a plasma gas, wherein the second source is in fluid communication with the second radial port, and wherein the system controller is further configured to radially introduce the plasma gas through the second radial port such that the plasma gas travels from the bottom to the top of the torch body along an inner wall of the torch body and down through a center of the torch body.

11. A system comprising:

a chamber, configured to contain a chamber pressure of about 3 atmospheres or greater;

an inductively coupled plasma-generating torch comprising a torch body, a nozzle, a first port, and a bottom portion, wherein the bottom portion of the torch body is attached to the chamber, and wherein the inductively coupled plasma-generating torch is configured to contain a torch pressure of about 3 atmospheres or greater;

a power supply in electrical communication with the inductively coupled plasma-generating torch;

a source comprising a gas composition, wherein the source is in fluid communication with the first port;

a first source comprising a boron-containing species; and

a system controller, wherein the system controller is configured to:

generate a directed flow of plasma from the nozzle toward the bottom portion of the torch body using the gas composition;

introduce the boron-containing species into to the directed flow of the plasma downstream of the nozzle, wherein the directed flow of plasma is a fully formed and stable plume; and

continuously form a product selected from the group consisting of boron nitride nanostructures, boron-carbon-nitride nanostructures, and combinations thereof, in the chamber.

12. The system of claim 11 , wherein the inductively coupled plasma-generating torch further comprises a first radial port and a second radial port, wherein the first and second radial ports are positioned at the bottom portion of the torch body.

13. The system of claim 12 , wherein the first radial port is positioned at a location adjacent to the directed flow of plasma.

14. The system of claim 12 , wherein the first source further comprises a carbon-containing species.

15. The system of claim 12 , wherein the second radial port is positioned at a location above the directed flow of plasma.

16. The system of claim 11 , wherein the chamber includes a quench modifier.

17. The system of claim 12 , further comprising a second source comprising a plasma gas, wherein the second source is in fluid communication with the second radial port, and wherein the system controller is further configured to radially introduce the plasma gas through the second radial port such that the plasma gas travels from the bottom to the top of the torch body along an inner wall of the torch body and down through a center of the torch body.

Assignments (3)
CONFIRMATORY LICENSE Recorded Jun 8, 2022
From: UNIVERSITY OF CALIF-LAWRENC BERKELEY LAB
To: UNITED STATES DEPARTMENT OF ENERGY
Reel/Frame 060134/0746 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 5, 2022
From: FATHALIZADEH, AIDIN; PHAM, THANG; MICKELSON, WILLIAM; ZETTL, ALEXANDER
To: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
Reel/Frame 059828/0420 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 3, 2022
From: FATHALIZADEH, AIDIN; PHAM, THANG; MICKELSON, WILLIAM; ZETTL, ALEXANDER
To: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
Reel/Frame 059801/0847 →
Continuity (5)
Division 15321177
Provisional Application 62140553 · Mar 31, 2015
Provisional Application 62019767 · Jul 1, 2014
Provisional Application 62017038 · Jun 25, 2014
Related Publication 20220281743A1 · Sep 8, 2022