Exposure apparatus and method of manufacturing article

1. An exposure apparatus that exposes a substrate while moving an original and the substrate in a scanning direction, comprising

an illumination optical system configured to illuminate a surface to be illuminated of the original with light from a light source,

wherein the illumination optical system comprises

a first light shielding unit including a first light shielding member and a second light shielding member, which include end portions facing each other in an equivalent direction equivalent to the scanning direction in a conjugate plane of the surface to be illuminated and in which a relative distance therebetween in the equivalent direction can be changed, and arranged at a position away from the conjugate plane to a side of the light source, and

a second light shielding unit including a third light shielding member and a fourth light shielding member, which include end portions facing each other in the equivalent direction and in which a relative distance therebetween in the equivalent direction can be changed, and arranged at a position away from the conjugate plane to a side of the surface to be illuminated, and

wherein the first light shielding unit and the second light shielding unit are arranged such that, at a predetermined position in a direction orthogonal to the equivalent direction in the conjugate plane, the end portion of the first light shielding member and the end portion of the third light shielding member exist at the same side with respect to a plane including an optical axis of the illumination optical system and orthogonal to the equivalent direction, distances from the plane to the end portion of the first light shielding member and to end portion of the third light shielding member are different from each other, a midpoint between the end portion of the first light shielding member and the end portion of the second light shielding member facing each other and a midpoint between the end portion of the third light shielding member and the end portion of the fourth light shielding member facing each other exist at the same side with respect to the plane and at positions away from the plane and a distance from the plane to the midpoint between the end portion of the first light shielding member and the end portion of the second light shielding member facing each other matches a distance from the plane to the midpoint between the end portion of the third light shielding member and the end portion of the fourth light shielding member facing each other.

2. The exposure apparatus according to claim 1 , further comprising an adjustment unit configured to adjust the positions of the first light shielding unit and the second light shielding unit.

3. The exposure apparatus according to claim 2 , wherein

the adjustment unit includes

a first moving unit configured to move one of the first light shielding member and the second light shielding member along the equivalent direction, and

a second moving unit configured to move one of the third light shielding member and the fourth light shielding member along the equivalent direction, and

positions, in the equivalent direction, of the other one of the first light shielding member and the second light shielding member and the other one of the third light shielding member and the fourth light shielding member are fixed.

4. The exposure apparatus according to claim 2 , wherein the adjustment unit moves at least one of the first light shielding member and the second light shielding member and at least one of the third light shielding member and the fourth light shielding member along the equivalent direction in synchronization with each other such that the first distance matches the second distance.

5. The exposure apparatus according to claim 2 , wherein the adjustment unit moves at least one of the first light shielding member and the second light shielding member and at least one of the third light shielding member and the fourth light shielding member along the equivalent direction in the same moving amount.

6. The exposure apparatus according to claim 2 , wherein

one of the first light shielding member and the second light shielding member includes a plurality of first light shielding plates arrayed along a direction orthogonal to the equivalent direction in the plane of the conjugate plane,

one of the third light shielding member and the fourth light shielding member includes a plurality of second light shielding plates arrayed along the direction orthogonal to the equivalent direction in the plane of the conjugate plane, and

the adjustment unit

independently moves the plurality of first light shielding plates along the equivalent direction, and

independently moves the plurality of second light shielding plates along the equivalent direction.

7. A manufacturing method of an article, comprising:

exposing a substrate using an exposure apparatus defined in claim 1 ;

developing the exposed substrate; and

manufacturing the article from the developed substrate.

8. The exposure apparatus according to claim 1 , wherein a distance between the first light shielding unit and the conjugate plane is different from a distance between the second light shielding unit and the conjugate plane in a direction of the optical axis.

9. An exposure apparatus that exposes a substrate while moving an original and the substrate in a scanning direction, comprising

an illumination optical system configured to illuminate a surface to be illuminated of the original with light from a light source,

wherein the illumination optical system comprises

a first light shielding unit including a first light shielding member and a second light shielding member, which include end portions facing each other in an equivalent direction equivalent to the scanning direction in a conjugate plane of the surface to be illuminated and in which a relative distance therebetween in the equivalent direction can be changed, and arranged at a position away from the conjugate plane to a side of the light source, and

a second light shielding unit including a third light shielding member and a fourth light shielding member, which include end portions facing each other in the equivalent direction and in which a relative distance therebetween in the equivalent direction can be changed, and arranged at a position away from a conjugate plane of the surface to be illuminated to a side of the surface to be illuminated, and

wherein the first light shielding unit and the second light shielding unit are arranged such that, at a predetermined position in a direction orthogonal to the scanning direction in the conjugate plane, the end portion of the first light shielding member and the end portion of the third light shielding member exist at the same side with respect to a plane including an optical axis of the illumination optical system and orthogonal to the equivalent direction, distances from the plane to the end portion of the first light shielding member and to end portion of the third light shielding member are different from each other, and a midpoint between the end portion of the first light shielding member and the end portion of the second light shielding member facing each other a midpoint between the end portion of the third light shielding member and the end portion of the fourth light shielding member facing each other exist at the same side with respect to the plane and at positions away from the plane, a value obtained by dividing a distance between a midpoint between the end portion of the first light shielding member and the end portion of the second light shielding member facing each other and the plane by a magnification between the conjugate plane and the surface to be luminated matches a distance between a midpoint between the end portion of the third light shielding member and the end portion of the fourth light shielding member facing each other and the plane.

10. A manufacturing method of an article, comprising:

exposing a substrate using an exposure apparatus defined in claim 9 ;

developing the exposed substrate; and

manufacturing the article from the developed substrate.

11. An exposure apparatus that exposes a substrate while moving an original and the substrate in a scanning direction, comprising

an illumination optical system configured to illuminate a surface to be illuminated of the original with light from a light source,

wherein the illumination optical system comprises

a first light shielding unit including a first light shielding member and a second light shielding member, which include end portions facing each other in an equivalent direction equivalent to the scanning direction in a conjugate plane of the surface to be illuminated and in which a relative distance therebetween in the equivalent direction can be changed, and arranged at a position away from the conjugate plane to a side of the light source, and

a second light shielding unit including a third light shielding member and a fourth light shielding member, which include end portions facing each other in the equivalent direction and in which a relative distance therebetween in the equivalent direction can be changed, and arranged at a position away from the conjugate plane to a side of the surface to be illuminated, and

wherein the first light shielding unit and the second light shielding unit are arranged such that, at a predetermined position in a direction orthogonal to the equivalent direction in the conjugate plane, the end portion of the first light shielding member and the end portion of the third light shielding member exist at the same side with respect to a plane including an optical axis of the illumination optical system and orthogonal to the equivalent direction, distances from the plane to the end portion of the first light shielding member and to end portion of the third light shielding member are different from each other, and a midpoint between the end portion of the first light shielding member and the end portion of the second light shielding member facing each other and a midpoint between the end portion of the third light shielding member and the end portion of the fourth light shielding member facing each other exit at the same side with respect to the plane and at positions away from the plane.

12. A manufacturing method of an article, comprising:

exposing a substrate using an exposure apparatus defined in claim 11 ;

developing the exposed substrate; and

manufacturing the article from the developed substrate.

13. The exposure apparatus according to claim 11 , wherein a distance between the first light shielding unit and the conjugate plane is different from a distance between the second light shielding unit and the conjugate plane in a direction of the optical axis.

14. The exposure apparatus according to claim 11 , further comprising an adjustment unit configured to adjust the positions of the first light shielding unit and the second light shielding unit.

15. The exposure apparatus according to claim 14 , wherein

the adjustment unit includes

a first moving unit configured to move one of the first light shielding member and the second light shielding member along the equivalent direction, and

a second moving unit configured to move one of the third light shielding member and the fourth light shielding member along the equivalent direction, and

positions, in the equivalent direction, of the other one of the first light shielding member and the second light shielding member and the other one of the third light shielding member and the fourth light shielding member are fixed.

16. The exposure apparatus according to claim 14 , wherein the adjustment unit moves at least one of the first light shielding member and the second light shielding member and at least one of the third light shielding member and the fourth light shielding member along the equivalent direction in synchronization with each other such that the first distance matches the second distance.

17. The exposure apparatus according to claim 14 , wherein the adjustment unit moves at least one of the first light shielding member and the second light shielding member and at least one of the third light shielding member and the fourth light shielding member along the equivalent direction in the same moving amount.

18. The exposure apparatus according to claim 14 , wherein

one of the first light shielding member and the second light shielding member includes a plurality of first light shielding plates arrayed along a direction orthogonal to the equivalent direction in the plane of the conjugate plane,

one of the third light shielding member and the fourth light shielding member includes a plurality of second light shielding plates arrayed along the direction orthogonal to the equivalent direction in the plane of the conjugate plane, and

the adjustment unit

independently moves the plurality of first light shielding plates along the equivalent direction, and

independently moves the plurality of second light shielding plates along the equivalent direction.