IP Library Granted Patent US 12,525,639
Granted Patent B2
US 12,525,639 · App. 17/678,450 · Granted Jan 13, 2026

Stabilizing garnet-type solid-state electrolytes through atomic layer deposition of ultra-thin layered materials and methods of making same

Inventors: Leela Mohana Reddy Arava (Troy, MI); Sathish Rajendran (Detroit, MI); Jeffry Kelber (Plano, TX); Aparna Pilli (Josephine, TX)
Assignee: Wayne State University
H01M10/0562C23C16/45555H01M10/052H01M2300/0071
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Quick Facts
Patent No.
US 12,525,639
App. No.
17/678,450
Granted
Jan 13, 2026
Kind
B2
Abstract

A method of stabilizing a garnet-type solid-state electrolyte (SSE) includes obtaining pellets of SSE, removing surface impurities of the SSE, and depositing a passivation layer onto the SSE after the surface impurities are removed, the passivation layer including two of boron, carbon, and nitrogen.

Claims (32)

1 . A method of stabilizing a garnet-type solid-state electrolyte (SSE), comprising: obtaining pellets of SSE; removing surface impurities of the SSE; and depositing a passivation layer of boron nitride (BN) comprising dangling boron bonds onto the SSE, after the surface impurities are removed, using precursor materials including tris(dimethylamino)borane (TDMAB) and ammonia (NH 3 ) via alternating exposures of TDMAB and NH 3 for a predetermined number of cycles.

2 . The method of claim 1 , further comprising positioning lithium on the passivation layer.

3 . The method of claim 2 , further comprising at least one of:

heating the lithium to at least 220° C.; and

heating the lithium for at least one hour.

4 . The method of claim 1 , further comprising coating a cathode composite material onto the passivation layer.

5 . The method of claim 1 , wherein the passivation layer comprises hexagonal boron nitride (h-BN).

6 . The method of claim 1 , wherein removing the surface impurities further comprises Argon ion sputtering a surface of the SSE.

7 . The method of claim 6 , wherein the Argon ion sputtering is at 227° C.

8 . The method of claim 1 , wherein removing the surface impurities further comprises annealing a surface of the SSE.

9 . The method of claim 1 , further comprising forming a BN x O y layer between the passivation layer of BN and the SSE.

10 . The method of claim 1 , wherein depositing the passivation layer comprises depositing 3 nm of thickness of the passivation layer.

11 . The method of claim 1 , wherein depositing the passivation layer further comprises depositing the passivation layer through atomic layer deposition (ALD).

12 . The method of claim 1 , wherein the predetermined number of cycles is between 3 and 20 cycles.

13 . A lithium battery, comprising:

a garnet-type solid-state electrolyte (SSE);

a passivation layer on the SSE;

an interface layer of BN x O y disposed between the passivation layer and the SSE;

a cathode composite positioned on the passivation layer; and

wherein the passivation layer comprises a boron nitride (BN) film with dangling boron bonds.

14 . The lithium battery of claim 13 , wherein the BN film comprises atomic layer deposited hexagonal boron nitride (h-BN).

15 . The lithium battery of claim 13 , wherein the passivation layer has a thickness of 3 nm.

16 . The lithium battery of claim 13 , wherein at least one of:

the SSE includes Li 6.5 La 3 Zr 1.5 Ta 0.5 O 12 (LLZT); and

the cathode composite comprises LiFePO 4 (LFP).

17 . The lithium battery of claim 13 , further comprising a lithium metal anode.

18 . A method of stabilizing a garnet-type solid-state electrolyte (SSE), comprising:

providing pellets of SSE;

removing surface impurities of the SSE;

depositing a passivation layer onto the SSE after the surface impurities are removed, the passivation layer including a boron nitride (BN) film with dangling boron bonds; and

forming a BN x O y interface between the passivation layer and the SSE.

19 . The method of claim 18 , wherein the passivation layer is deposited using precursor materials including tris(dimethylamino)borane (TDMAB) and ammonia (NH 3 ) via alternating exposures of TDMAB and NH 3 for a predetermined number of cycles.

Assignments (4)
CONFIRMATORY LICENSE Recorded Feb 6, 2025
From: WAYNE STATE UNIVERSITY
To: NATIONAL SCIENCE FOUNDATION
Reel/Frame 070127/0642 →
CORRECTIVE ASSIGNMENT TO CORRECT THE SECOND LISTED INVENTOR NAME INSIDE THE ASSIGNMENT DOCUMENT AND ON THE COVER SHEET PREVIOUSLY RECORDED ON REEL 059077 FRAME 0945. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded May 23, 2023
From: REDDY ARAVA, LEELA MOHANA; RAJENDRAN, SATHISH
To: WAYNE STATE UNIVERSITY
Reel/Frame 063732/0532 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 23, 2022
From: REDDY ARAVA, LEELA MOHANA; RAJENDREN, SATHISH
To: WAYNE STATE UNIVERSITY
Reel/Frame 059077/0945 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 23, 2022
From: KELBER, JEFFRY; PILLI, APARNA
To: UNIVERSITY OF NORTH TEXAS
Reel/Frame 059078/0094 →
Continuity (2)
Provisional Application 63152945 · Feb 24, 2021
Related Publication 20220271334A1 · Aug 25, 2022
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