IP Library › Granted Patent US 11,824,513
Granted Patent B2
US 11,824,513 · App. 17/679,403 · Granted Nov 21, 2023

Acoustic wave device

Inventors: Katsuya Daimon (Nagaokakyo, JP); Yasumasa Taniguchi (Nagaokakyo, JP); Koji Yamamoto (Nagaokakyo, JP)
Assignee: MURATA MANUFACTURING CO., LTD.
H03H9/02228H03H9/02015
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Quick Facts
Patent No.
US 11,824,513
App. No.
17/679,403
Granted
Nov 21, 2023
Kind
B2
Abstract

An acoustic wave device includes a piezoelectric substrate and an IDT electrode on the piezoelectric substrate. The IDT electrode includes first and second electrode fingers. When the propagation direction of acoustic waves is a first direction and the direction orthogonal or substantially orthogonal to the first direction is a second direction, an intersecting region of the IDT electrode includes a central region located toward the middle in the second direction and first and second edge regions on both sides in the second direction of the central region. The first and second electrode fingers include epitaxially grown oriented films in the central region and portions that do not include the oriented films in the first and second edge regions.

Claims (42)

1. An acoustic wave device comprising:

a piezoelectric substrate; and

an IDT electrode on the piezoelectric substrate; wherein

the IDT electrode includes a first busbar and a second busbar facing each other, a plurality of first electrode fingers with one ends connected to the first busbar, and a plurality of second electrode fingers with one ends connected to the second busbar, the plurality of first electrode fingers and the plurality of second electrode fingers being interdigitated with each other;

when a propagation direction of acoustic waves is a first direction and a direction orthogonal or substantially orthogonal to the first direction is a second direction, a portion in which the first electrode fingers overlap with the second electrode fingers as viewed in the first direction is an intersecting region including a central region located toward a middle in the second direction, a first edge region in a portion of the central region closer to the first busbar than to the second busbar, and a second edge region disposed in a portion of the central region closer to the second busbar than to the first busbar;

the first electrode fingers and the second electrode fingers include epitaxially grown oriented films in the central region; and

the first electrode fingers and the second electrode fingers include portions that do not include the oriented films in the first edge region and the second edge region.

2. The acoustic wave device according to claim 1 , wherein a dielectric film is provided in at least a portion of a portion between the first and second electrode fingers and the piezoelectric substrate in the first edge region and the second edge region.

3. The acoustic wave device according to claim 2 , wherein

the first edge region includes a first end region including ends of the plurality of second electrode fingers, and the second edge region includes a second end region including ends of the plurality of first electrode fingers; and

the first electrode fingers and the second electrode fingers are directly on the piezoelectric substrate in the first end region and the second end region.

4. The acoustic wave device according to claim 2 , wherein

the first edge region includes a first end region including ends of the plurality of second electrode fingers, and the second edge region includes a second end region including ends of the plurality of first electrode fingers; and

the first electrode fingers and the second electrode fingers do not include the oriented films in the first end region and the second end region.

5. The acoustic wave device according to claim 2 , wherein the first electrode fingers and the second electrode fingers are directly on the piezoelectric substrate in the central region.

6. The acoustic wave device according to claim 2 , wherein a low acoustic velocity region in which an acoustic velocity is lower than in the central region is provided in the first edge region and the second edge region of the IDT electrode.

7. The acoustic wave device according to claim 1 , wherein

the first edge region includes a first end region including ends of the plurality of second electrode fingers, and the second edge region includes a second end region including ends of the plurality of first electrode fingers; and

the first electrode fingers and the second electrode fingers are directly on the piezoelectric substrate in the first end region and the second end region.

8. The acoustic wave device according to claim 7 , wherein

the first edge region includes a first end region including ends of the plurality of second electrode fingers, and the second edge region includes a second end region including ends of the plurality of first electrode fingers; and

the first electrode fingers and the second electrode fingers do not include the oriented films in the first end region and the second end region.

9. The acoustic wave device according to claim 7 , wherein the first electrode fingers and the second electrode fingers are directly on the piezoelectric substrate in the central region.

10. The acoustic wave device according to claim 7 , wherein a low acoustic velocity region in which an acoustic velocity is lower than in the central region is provided in the first edge region and the second edge region of the IDT electrode.

11. The acoustic wave device according to claim 1 , wherein

the first edge region includes a first end region including ends of the plurality of second electrode fingers, and the second edge region includes a second end region including ends of the plurality of first electrode fingers; and

the first electrode fingers and the second electrode fingers do not include the oriented films in the first end region and the second end region.

12. The acoustic wave device according to claim 11 , wherein the first electrode fingers and the second electrode fingers are directly on the piezoelectric substrate in the central region.

13. The acoustic wave device according to claim 11 , wherein a low acoustic velocity region in which an acoustic velocity is lower than in the central region is provided in the first edge region and the second edge region of the IDT electrode.

14. The acoustic wave device according to claim 1 , wherein

the piezoelectric substrate includes a high velocity material layer and a piezoelectric layer directly or indirectly on the high velocity material layer; and

an acoustic velocity of bulk waves propagating through the high velocity material layer is higher than an acoustic velocity of acoustic waves propagating through the piezoelectric layer.

15. The acoustic wave device according to claim 14 , wherein

the piezoelectric substrate includes a low velocity film between the high velocity material layer and the piezoelectric layer; and

an acoustic velocity of bulk waves propagating through the low velocity film is lower than an acoustic velocity of bulk waves propagating through the piezoelectric layer.

16. The acoustic wave device according to claim 14 , wherein the high velocity material layer is a high velocity support substrate.

17. The acoustic wave device according to claim 14 , wherein

the piezoelectric substrate includes a support substrate; and

the high velocity material layer is a high velocity film on the support substrate.

18. The acoustic wave device according to claim 1 , wherein a low acoustic velocity region in which an acoustic velocity is lower than in the central region is provided in the first edge region and the second edge region of the IDT electrode.

19. The acoustic wave device according to claim 18 , wherein a low acoustic velocity region in which an acoustic velocity is lower than in the central region is provided in the first edge region and the second edge region of the IDT electrode.

20. The acoustic wave device according to claim 1 , wherein the first electrode fingers and the second electrode fingers are directly on the piezoelectric substrate in the central region.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 24, 2022
From: DAIMON, KATSUYA; TANIGUCHI, YASUMASA; YAMAMOTO, KOJI
To: MURATA MANUFACTURING CO., LTD.
Reel/Frame 059090/0291 →
Priority Claims (1)
JP 2019-156890 · Aug 29, 2019 · national
Continuity (2)
Continuation PCTJP2020023596 · Jun 16, 2020
Related Publication 20220182035A1 · Jun 9, 2022