INTERCONNECT FEATURE WITH NARROW TOP SECTION AND WIDE BOTTOM SECTION
An integrated circuit device includes a device layer comprising a plurality of transistor devices, and an interconnect layer above the device layer. The interconnect layer includes a conductive interconnect feature. In an example, the interconnect feature includes (i) a bottom portion having a first diameter, and (ii) a top portion above the bottom portion. In an example, the top portion has a second diameter that is less than the first diameter by at least 10%. In an example, the interconnect feature includes a monolithic body of conductive material that is within both the top portion and the bottom portion.
1 . An integrated circuit device comprising:
a device layer comprising a plurality of transistor devices; and
an interconnect layer above the device layer, the interconnect layer comprising an interconnect feature, the interconnect feature including (i) a bottom portion having a first diameter, and (ii) a top portion above the bottom portion, the top portion having a second diameter that is less than the first diameter by at least 10%, wherein the interconnect feature comprises a monolithic body of conductive material that is within both the top portion and the bottom portion.
2 . The integrated circuit device of claim 1 , wherein:
the interconnect layer further comprises a dielectric material; and
the interconnect feature, including the top portion and the bottom portion, extends through the dielectric material.
3 . The integrated circuit device of claim 1 , wherein:
the interconnect layer further comprises a first dielectric material, and a second dielectric material above the first dielectric material; and
the top portion of the interconnect feature is within the second dielectric material, and the bottom portion of the interconnect feature is within the first dielectric material.
4 . The integrated circuit device of claim 3 , wherein the first dielectric material and the second dielectric material are etch selective with respect to each other.
5 . The integrated circuit device of claim 1 , wherein the second diameter of the top portion transitions to the first diameter of the bottom portion along an irregular tapered portion of the interconnect feature.
6 . The integrated circuit device of claim 5 , wherein the irregular tapered portion of the interconnect feature extends from an upper perimeter of the irregular tapered portion to a lower perimeter of the irregular tapered portion, and one or both of the upper perimeter and the lower perimeter are curvilinear.
7 . The integrated circuit device of claim 5 , wherein the irregular tapered portion of the interconnect feature extends from an upper perimeter of the irregular tapered portion to a lower perimeter of the irregular tapered portion, and wherein a first distance between a first point on the upper perimeter and a top surface of the interconnect feature is shorter than a second distance between a second point on the upper perimeter and the top surface of the interconnect feature.
8 . The integrated circuit device of claim 5 , wherein the irregular tapered portion of the interconnect feature extends from an upper perimeter of the irregular tapered portion to a lower perimeter of the irregular tapered portion, and wherein a first distance between a first point on the lower perimeter and a top surface of the interconnect feature is shorter than a second distance between a second point on the lower perimeter and the top surface of the interconnect feature.
9 . The integrated circuit device of claim 1 , wherein the top portion has a first height, and the bottom portion has a second height that is greater than the first height.
10 . The integrated circuit device of claim 1 , wherein the interconnect layer further comprises:
a first dielectric material, wherein the interconnect feature, including both the top portion and the bottom portion, extends within the first dielectric material; and
a second dielectric material between at least a section of the conductive material of the top portion of the interconnect feature and the first dielectric material, the second dielectric material different from the first dielectric material,
wherein the second dielectric is absent between the conductive material of the bottom portion of the interconnect feature and the first dielectric material.
11 . The integrated circuit device of claim 10 , wherein the first dielectric material is etch selective with respect to the second dielectric material.
12 . The integrated circuit device of claim 1 , wherein the interconnect layer further comprises:
a first dielectric material, wherein the interconnect feature, including both the top portion and the bottom portion, extends within the first dielectric material; and
one or more discontinuous monolayers of a second dielectric material between at least a section of the conductive material of the top portion of the interconnect feature and the first dielectric material, the second dielectric material different from the first dielectric material,
wherein the second dielectric is absent between the conductive material of the bottom portion of the interconnect feature and the first dielectric material.
13 . An integrated circuit device comprising:
a device layer comprising a plurality of active devices; and
an interconnect layer above the device layer, the interconnect layer comprising an interconnect feature comprising a monolithic body of conductive material extending from a bottom surface of the interconnect feature to a top surface of the interconnect feature,
wherein a first diameter of the bottom surface of the interconnect feature is greater than a second diameter of a top surface of the interconnect feature by at least 10%.
14 . The integrated circuit device of claim 13 , wherein the interconnect layer is a first interconnect layer, and wherein the integrated circuit device further comprises:
an upper interconnect layer above the first interconnect layer, the upper interconnect layer comprising a plurality of upper conductive features arranged at a first pitch; and
a lower interconnect layer below the first interconnect layer, the lower interconnect layer comprising a plurality of lower conductive features arranged at a second pitch that is different from the first pitch,
wherein the interconnect feature conductively couples an upper conductive feature to a lower conductive feature.
15 . The integrated circuit device of claim 14 , wherein one or more of the plurality of lower conductive features are one or more contacts of one or more transistor devices of the device layer.
16 . The integrated circuit device of claim 13 , wherein the interconnect layer comprises:
a bottom layer comprising a first dielectric material; and
a top layer above the bottom layer, the top layer comprising a second dielectric material that is compositionally different from the first dielectric material,
wherein a top portion of the interconnect feature is within the top layer, and a bottom portion of the interconnect feature is within the bottom layer.
17 . The integrated circuit device of claim 16 , wherein the first dielectric material is etch selective with respect to the second dielectric material.
18 . A method of forming an integrated circuit, comprising:
forming one or more layers of dielectric material above a device layer that comprises a plurality of transistors;
forming a recess extending within the one or more layers;
widening a bottom portion of the recess, without correspondingly widening a top portion of the recess, such that a first diameter of the bottom portion of the recess is greater than a second diameter of the top portion of the recess by at least 10%; and
subsequent to widening the bottom portion of the recess, depositing a monolithic body of conductive material within the recess, to form an interconnect feature within the recess, wherein the interconnect feature has (i) a bottom portion having the first diameter, and (ii) a top portion above the bottom portion, the top portion having the second diameter.
19 . The method of claim 18 , wherein the one or more layers of dielectric material comprises at least a first layer of a first dielectric material, and wherein the method further comprises:
subsequent to forming the recess, lining the top portion of the recess with a liner layer comprising a second dielectric material that is different from and etch selective to the first dielectric material,
wherein widening the bottom portion of the recess comprises
etching the bottom portion of the recess using an etchant that does not substantially etch the liner layer, thereby widening the bottom portion of the recess, without correspondingly widening the top portion of the recess.
20 . The method of claim 18 , wherein the one or more layers of dielectric material comprises (i) a first layer of a first dielectric material, and (ii) a second layer of a second dielectric material above the first layer, wherein the bottom portion of the recess is within the first dielectric material, wherein the top portion of the recess is within the second dielectric material, wherein the first dielectric material is etch selective with respect to the second dielectric material, and wherein widening the bottom portion of the recess comprises:
etching the first dielectric material through the bottom portion of the recess using an etchant that does not substantially etch the second dielectric material, thereby widening the bottom portion of the recess, without correspondingly widening the top portion of the recess.