RF pulsing within pulsing for semiconductor RF plasma processing

1. A matchless plasma source comprising:

a clock source configured to generate a clock signal;

a pulsing circuit configured to generate a pulsing signal, wherein the clock signal has a frequency greater than a frequency of the pulsing signal;

a filter coupled to the clock source and the pulsing circuit to filter the clock signal based on the pulsing signal, wherein the clock signal is filtered to output a filtered signal;

a driver and amplification circuit coupled to the filter, wherein the driver and amplification circuit is configured to receive the filtered signal to output an amplified waveform; and

a reactive circuit coupled to the driver and amplification circuit to remove harmonics from the amplified waveform to provide a sinusoidal waveform to an electrode.

2. The matchless plasma source of claim 1 , wherein the clock source is an electronic oscillator, wherein the frequency of the clock signal is a radio frequency, wherein the clock signal is a digital signal.

3. The matchless plasma source of claim 1 , wherein the pulsing circuit is an electronic oscillator, wherein the pulsing signal is a digital signal.

4. The matchless plasma source of claim 1 , wherein the filter is an AND gate that is configured to perform an AND operation between the clock signal and the pulsing signal to filter the clock signal, wherein the filtered signal includes a plurality of instances of a first state and a plurality of instances of a second state, wherein each of the plurality of instances of the first state includes a train of pulses of the clock signal.

5. The matchless plasma source of claim 1 , wherein the driver and amplification circuit includes:

a gate driver coupled to the filter, wherein the gate driver includes a first gate and a second gate, wherein the first gate is coupled to the filter and the second gate is coupled to the filter; and

an amplification circuit coupled to the gate driver, wherein the amplification circuit includes a direct current (DC) rail having a DC voltage source, an AND gate, a first transistor, and a second transistor, wherein the DC voltage source is coupled via the first transistor to the second transistor.

6. The matchless plasma source of claim 5 , wherein the first gate is configured to allow passage of the filtered signal, wherein the second gate is configured to invert the filtered signal to output an inverted signal.

7. The matchless plasma source of claim 6 , further comprising:

a controller;

a signal generator coupled to the controller and the AND gate, wherein the controller is configured to indicate a shape to the signal generator to facilitate outputting a shaping waveform having the shape, wherein the DC voltage source is configured to output a DC voltage signal,

wherein the AND gate is configured to modify the DC voltage signal according to the shaping waveform, the first transistor is configured to turn on and turn off according to the filtered signal, and the second gate is configured to turn on and off according to the inverted signal to output the amplified waveform.

8. The matchless plasma source of claim 5 , wherein the first transistor is coupled to the second transistor via an output, wherein the reactive circuit includes a capacitor coupled to the output between the first and second transistors.

9. A plasma tool comprising:

a plasma chamber having an electrode; and

a matchless plasma source coupled to the electrode, wherein the matchless plasma source includes:

a clock source configured to generate a clock signal;

a pulsing circuit configured to generate a pulsing signal, wherein the clock signal has a frequency greater than a frequency of the pulsing signal;

a filter coupled to the clock source and the pulsing circuit to filter the clock signal based on the pulsing signal, wherein the clock signal is filtered to output a filtered signal;

a driver and amplification circuit coupled to the filter, wherein the driver and amplification circuit is configured to receive the filtered signal to output an amplified waveform; and

a reactive circuit coupled to the driver and amplification circuit to remove harmonics from the amplified waveform to provide a sinusoidal waveform to the electrode.

10. The plasma tool of claim 9 , wherein the clock source is an electronic oscillator, wherein the frequency of the clock signal is a radio frequency, wherein the clock signal is a digital signal.

11. The plasma tool of claim 9 , wherein the pulsing circuit is an electronic oscillator, wherein the pulsing signal is a digital signal.

12. The plasma tool of claim 9 , wherein the filter is an AND gate that is configured to perform an AND operation between the clock signal and the pulsing signal to filter the clock signal, wherein the filtered signal includes a plurality of instances of a first state and a plurality of instances of a second state, wherein each of the plurality of instances of the first state includes a train of pulses of the clock signal.

13. The plasma tool of claim 9 , wherein the driver and amplification circuit includes:

a gate driver coupled to the filter, wherein the gate driver includes a first gate and a second gate, wherein the first gate is coupled to the filter and the second gate is coupled to the filter; and

an amplification circuit coupled to the gate driver, wherein the amplification circuit includes a direct current (DC) rail having a DC voltage source, an AND gate, a first transistor, and a second transistor, wherein the DC voltage source is coupled via the first transistor to the second transistor.

14. The plasma tool of claim 13 , wherein the first gate is configured to allow passage of the filtered signal, wherein the second gate is configured to invert the filtered signal to output an inverted signal.

15. The plasma tool of claim 14 , further comprising:

a controller;

a signal generator coupled to the controller and the AND gate, wherein the controller is configured to indicate a shape to the signal generator to facilitate outputting a shaping waveform having the shape, wherein the DC voltage source is configured to output a DC voltage signal,

wherein the AND gate is configured to modify the DC voltage signal according to the shaping waveform, the first transistor is configured to turn on and turn off according to the filtered signal, and the second gate is configured to turn on and off according to the inverted signal to output the amplified waveform.

16. The plasma tool of claim 13 , wherein the first transistor is coupled to the second transistor via an output, wherein the reactive circuit includes a capacitor coupled to the output between the first and second transistors.

17. The plasma tool of claim 9 , wherein the electrode is an RF coil, wherein there is no match between the matchless plasma source and the plasma chamber.

18. A method comprising:

generating a clock signal;

generating a pulsing signal, wherein the clock signal has a frequency greater than a frequency of the pulsing signal;

filtering the clock signal based on the pulsing signal to output a filtered signal;

receiving the filtered signal to output an amplified waveform; and

removing harmonics from the amplified waveform to provide a sinusoidal waveform to an electrode.

19. The method of claim 18 , wherein said filtering includes applying an AND operation between the clock signal and the pulsing signal, wherein the filtered signal includes a plurality of instances of a first state and a plurality of instances of a second state, wherein each of the plurality of instances of the first state includes a train of pulses of the clock signal.

20. The matchless plasma source of claim 18 , wherein the frequency of the clock signal is a radio frequency, wherein the clock signal is a digital signal, wherein the pulsing signal is a digital signal.