IP Library Granted Patent US 12,485,503
Granted Patent B2
US 12,485,503 · App. 17/730,071 · Granted Dec 2, 2025

Mass transferring system and method thereof

Inventors: Tsung-Lin Tsai (Taipei, TW); Lu-Min Chen (Taipei, TW)
Assignee: Kulicke and Soffa Hi-Tech Co., Ltd.
B23K26/0884B23K26/0823B23K26/57B23K2101/40
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Quick Facts
Patent No.
US 12,485,503
App. No.
17/730,071
Granted
Dec 2, 2025
Kind
B2
Abstract

A mass transferring system and the method thereof are provided. The system includes two platforms and a plurality of picking and placing units. When the mass transferring process is performed for one of the substrates, the replacing process and the aligning process are simultaneously executed for another one of the substrates, such that the mass transferring process and the replacing process can be performed at the same time. Compared with the conventional mass transferring processes, the efficiency of the mass transferring system and the method thereof according to the present invention can be increased by 90%.

Claims (10)

1 . A mass transferring method, comprising:

providing a plurality of first substrates having a plurality of chips;

providing a plurality of second substrates;

disposing one of the plurality of first substrates on a source platform structure, wherein the source platform structure comprises a plurality of replacing areas, a hollow area and a plurality of picking and placing units;

disposing one of the plurality of second substrates on a target platform structure, wherein the target platform structure comprises a plurality of replacing areas, a working area and a plurality of picking and placing units;

moving the one of the plurality of first substrates from one of the plurality of replacing areas of the source platform structure to the hollow area thereof via one of the plurality of picking and placing units of the source platform structure, moving the one of the plurality of second substrates from one of the plurality of replacing areas of the target platform structure to the working area via one of the plurality of picking and placing units of the target platform structure, and emitting a laser to the one of the plurality of first substrates so as to mass-transfer the plurality of chips of the one of the plurality of first substrates to the one of the plurality of second substrates in the working area; and

moving the one of the plurality of first substrates processed by the laser from the hollow area to the one of the plurality of replacing areas of the source platform structure via the one of the plurality of picking and placing units of the source platform structure, and simultaneously moving another one of the plurality of first substrates from another one of the plurality of replacing areas of the source platform structure to the hollow area via another one of the plurality of picking and placing units of the source platform structure, and emitting the laser to the another one of the plurality of first substrates in the hollow area in order to mass-transfer the plurality of chips of the another one of the plurality of first substrates to another one of the plurality of second substrates in the working area.

2 . The mass transferring method of claim 1 , further comprising: moving the one of the plurality of second substrates, after the mass-transfer the plurality of chips of the one of the plurality of first substrates to the one of the plurality of second substrates, to the one of the plurality of replacing areas of the target platform structure via the one of the plurality of picking and placing units of the target platform structure, and simultaneously moving the another one of the plurality of second substrates from another one of the plurality of replacing areas of the target platform structure to the working area via another one of the plurality of picking and placing units of the target platform structure.

3 . The mass transferring method of claim 1 , wherein the laser is an excimer laser and the excimer laser is able to penetrate through each of the plurality of first substrates.

4 . The mass transferring method of claim 1 , wherein when the plurality of chips of the one of the plurality of first substrates are mass-transferred from the one of the plurality of first substrates disposed in the hollow area to the one of the plurality of second substrates disposed in the working area, simultaneously, a replacing process and an aligning process are performed for the another one of the plurality of first substrates and the another one of the plurality of second substrates.

Assignments (3)
CHANGE OF NAME Recorded Oct 2, 2023
From: ADVANCED JET AUTOMATION CO., LTD
To: KULICKE AND SOFFA HI-TECH CO., LTD.
Reel/Frame 065882/0487 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 6, 2022
From: SAMURAI SPIRIT INC.
To: ADVANCED JET AUTOMATION CO., LTD
Reel/Frame 061996/0523 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 15, 2022
From: TSAI, TSUNG-LIN; CHEN, LU-MIN
To: SAMURAI SPIRIT INC.
Reel/Frame 060206/0245 →
Priority Claims (1)
TW 111110648 · Mar 22, 2022 · national
Continuity (1)
Related Publication 20230302575A1 · Sep 28, 2023
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