IP Library Granted Patent US 12,385,666
Granted Patent B2
US 12,385,666 · App. 17/742,758 · Granted Aug 12, 2025

Air-processing apparatus

Inventors: Chinsoo Hyon (Seoul, KR); Sehwan Bae (Seoul, KR); Heejae Kwon (Seoul, KR); Jeeyoung Yeon (Seoul, KR)
Assignee: LG ELECTRONICS INC.
F24F13/1426F24F1/0011F24F2013/1433F24F2013/1446
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Quick Facts
Patent No.
US 12,385,666
App. No.
17/742,758
Granted
Aug 12, 2025
Kind
B2
Abstract

An air-processing apparatus is provided. The air-processing apparatus may include a case having an outlet formed therein, a louver rotatably disposed in the case and configured to adjust a direction of air flowing through the outlet, and a louver actuator configured to adjust an orientation of the louver. The louver may include a louver rotational shaft and a plurality of vanes spaced apart from each other in a radial direction based on the louver rotational shaft. The louver actuator may be disposed so as to be in contact with a vane located at an outermost position among the plurality of vanes to change an orientation of the louver.

Claims (37)

1. An air-processing apparatus, comprising:

a case having an outlet formed therein;

a louver assembly rotatably disposed in the case, the louver assembly being configured to adjust a direction of air flowing through the outlet; and

a louver actuator configured to adjust an orientation of the louver assembly, wherein the louver assembly comprises a louver rotational shaft and a plurality of vanes spaced apart from each other in a radial direction based on the louver rotational shaft, and wherein the louver rotational shaft extends along a rotational center of the louver assembly, wherein the plurality of vanes comprises:

an outer vane spaced outwards apart from the louver rotational shaft in the radial direction; and

a plurality of inner vanes disposed between the louver rotational shaft and the outer vane so as to be spaced apart from each other in the radial direction, wherein a vane gear is formed on the outer circumferential surface of the outer vane in a circumferential direction, and wherein the louver actuator is engaged with the vane gear to rotate the louver assembly.

2. The air-processing apparatus according to claim 1 ,

wherein the louver assembly is connected at an outer circumferential surface of the outer vane to the louver actuator.

3. The air-processing apparatus according to claim 2 , wherein the outer vane has an arc shape that extends in a circumferential direction based on the louver rotational shaft.

4. The air-processing apparatus according to claim 2 , wherein the plurality of inner vanes is shorter than the outer vane.

5. The air-processing apparatus according to claim 2 , wherein each of the plurality of inner vanes has a different length from remaining ones of the plurality of inner vanes.

6. The air-processing apparatus according to claim 2 , wherein lengths of the plurality of inner vanes gradually increase in a direction approaching the louver rotational shaft.

7. The air-processing apparatus according to claim 2 , wherein a distance between the outer vane and each of the plurality of inner vanes gradually increases in a downward direction.

8. The air-processing apparatus according to claim 2 , wherein each of the plurality of inner vanes comprises:

a lower inner vane portion inclined so as to be gradually closer to the louver rotational shaft in a downward direction; and

an upper inner vane portion bent and extending upwards from an upper end of the lower inner vane portion.

9. The air-processing apparatus according to claim 2 , wherein the louver assembly comprises an axial vane that extends from the louver rotational shaft, and wherein the axial vane extends in a direction parallel to the lower inner vane portion.

10. The air-processing apparatus according to claim 1 , wherein the louver assembly comprises:

a pair of end panels disposed at both ends of the plurality of vanes in a direction perpendicular to the plurality of vanes; and

a support panel disposed between the pair of end panels, the support panel being provided at one side thereof with a vane gear, and wherein the vane gear is engaged with the louver actuator.

11. The air-processing apparatus according to claim 1 , wherein the louver actuator is spaced apart from the louver rotational shaft in a centrifugal direction, and is disposed so as to be in contact with an outer circumferential surface of the louver assembly.

12. The air-processing apparatus according to claim 1 , wherein the louver actuator comprises:

a louver gear configured to be engaged with one side of the louver assembly to rotate the louver assembly; and

a louver motor configured to rotate the louver gear.

13. The air-processing apparatus according to claim 1 , wherein the louver actuator comprises:

a pair of louver gears spaced apart from each other, the pair of louver gears being engaged with one side of the louver assembly to rotate the louver assembly;

a gear rotational shaft that interconnects the pair of louver gears; and

a louver motor connected to the gear rotational shaft to rotate the gear rotational shaft.

14. The air-processing apparatus according to claim 1 , wherein the case comprises:

an upper cover;

a lower cover disposed below the upper cover;

a rear cover that forms an inlet, the rear cover supporting a filter device mounted thereto; and

a front cover spaced forwards apart from the rear cover, and wherein the louver assembly is rotatably disposed at a lower end of the front cover.

15. The air-processing apparatus according to claim 14 , wherein the front cover includes a louver protrusion having formed therein a louver groove in which the louver rotational shaft is disposed in order to limit a range within which the louver assembly rotates.

16. The air-processing apparatus according to claim 15 , wherein the louver protrusion comprises:

an upper protruding portion forming a surface that is inclined from an upper end of the louver groove in a rearward-upward direction; and

a lower protruding portion forming a surface that is inclined from a lower end of the louver groove in a forward-downward direction.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 14, 2025
From: HYON, CHINSOO; BAE, SEHWAN; KWON, HEEJAE; YEON, JEEYOUNG
To: LG ELECTRONICS INC.
Reel/Frame 071690/0827 →
Priority Claims (3)
KR 10-2021-0065987 · May 24, 2021 · national
KR 10-2021-0065990 · May 24, 2021 · national
KR 10-2021-0174217 · Dec 7, 2021 · national
Continuity (1)
Related Publication 20220373223A1 · Nov 24, 2022
References Cited (162)
US 3618659A · Rawal · 1971 [cited by applicant]
US 4203566A · Lord · 1980 [cited by examiner]
US 4610196A · Kern · 1986 [cited by applicant]
US 5564626A · Kettler et al. · 1996 [cited by applicant]
US 5595068A · Amr · 1997 [cited by applicant]
US 5674124A · Davis · 1997 [cited by examiner]
US 5697841A · Di Giovine · 1997 [cited by examiner]
US 6974377B2 · Gehring · 2005 [cited by examiner]
US 8343244B2 · Sakashita · 2013 [cited by applicant]
US 10989429B2 · Okamoto et al. · 2021 [cited by applicant]
US 12134058B2 · Hyon et al. · 2024 [cited by applicant]
US 20020189274A1 · Lee et al. · 2002 [cited by applicant]
US 20060032260A1 · Kang · 2006 [cited by applicant]
US 20100040457A1 · Tsen · 2010 [cited by applicant]
US 20110143899A1 · Wirth et al. · 2011 [cited by applicant]
US 20120137876A1 · Miller · 2012 [cited by applicant]
US 20120151885A1 · Nishihata et al. · 2012 [cited by applicant]
US 20140026525A1 · Miller · 2014 [cited by applicant]
US 20140131026A1 · Hurd · 2014 [cited by examiner]
US 20170191677A1 · Jeong et al. · 2017 [cited by applicant]
US 20180017282A1 · Liu et al. · 2018 [cited by applicant]
US 20180017284A1 · Oishi et al. · 2018 [cited by applicant]
US 20190041083A1 · Kojima et al. · 2019 [cited by applicant]
US 20190049137A1 · Kojima et al. · 2019 [cited by applicant]
US 20190056120A1 · Cho · 2019 [cited by examiner]
US 20190199960A1 · Miyazaki · 2019 [cited by applicant]
US 20190219277A1 · Kim · 2019 [cited by examiner]
US 20190275455A1 · Choi et al. · 2019 [cited by applicant]
CN 2442167 · 2001 [cited by applicant]
CN 1707169 · 2005 [cited by applicant]
CN 101048621 · 2007 [cited by applicant]
CN 101178199 · 2008 [cited by applicant]
CN 101370676 · 2009 [cited by applicant]
CN 102460031 · 2012 [cited by applicant]
CN 102563758 · 2012 [cited by applicant]
CN 102607111 · 2012 [cited by applicant]
CN 202747532 · 2013 [cited by applicant]
CN 206682042 · 2017 [cited by applicant]
CN 108180547 · 2018 [cited by applicant]
CN 108387133 · 2018 [cited by applicant]
CN 109790998 · 2019 [cited by applicant]
CN 110332611 · 2019 [cited by applicant]
CN 209763287 · 2019 [cited by applicant]
CN 210050921 · 2020 [cited by applicant]
CN 107250683 · 2020 [cited by applicant]
CN 210463497 · 2020 [cited by applicant]
CN 111637508 · 2020 [cited by applicant]
CN 211977205 · 2020 [cited by applicant]
DE 202007001644 · 2007 [cited by applicant]
DE 102018219702 · 2020 [cited by applicant]
EP 1271065 · 2003 [cited by applicant]
EP 2058602 · 2009 [cited by applicant]
EP 2381182 · 2011 [cited by applicant]
EP 2426429 · 2012 [cited by applicant]
EP 2725306 · 2014 [cited by applicant]
EP 2881273 · 2015 [cited by applicant]
EP 3406980 · 2018 [cited by applicant]
EP 3690328 · 2020 [cited by applicant]
JP H06106967 · 1994 [cited by applicant]
JP H06147531 · 1994 [cited by applicant]
JP H07225046 · 1995 [cited by applicant]
JP 0805091 · 1996 [cited by applicant]
JP H08226668 · 1996 [cited by applicant]
JP 08270978 · 1996 [cited by applicant]
JP 2001263788 · 2001 [cited by applicant]
JP 2003148763 · 2003 [cited by applicant]
JP 2004101094 · 2004 [cited by applicant]
JP 2005172261 · 2005 [cited by applicant]
JP 2005214429 · 2005 [cited by applicant]
JP 2006145192 · 2006 [cited by applicant]
JP 2006162217 · 2006 [cited by applicant]
JP 2007024345 · 2007 [cited by applicant]
JP 2008039293 · 2008 [cited by applicant]
JP 2008069985 · 2008 [cited by applicant]
JP 2008122055 · 2008 [cited by applicant]
JP 2008133973 · 2008 [cited by applicant]
JP 2008164190 · 2008 [cited by applicant]
JP 2008224133 · 2008 [cited by applicant]
JP 2008241054 · 2008 [cited by applicant]
JP 2008267795 · 2008 [cited by applicant]
JP 2009002602 · 2009 [cited by applicant]
JP 2009186077 · 2009 [cited by applicant]
JP 2012013392 · 2012 [cited by applicant]
JP 2014077599 · 2014 [cited by applicant]
JP 2014129954 · 2014 [cited by applicant]
JP 2017524119 · 2017 [cited by applicant]
JP 2019170863 · 2019 [cited by applicant]
KR 1019990068938 · 1999 [cited by applicant]
KR 200164654 · 2000 [cited by applicant]
KR 200184583 · 2000 [cited by applicant]
KR 1020030053864 · 2003 [cited by applicant]
KR 1020040056151 · 2004 [cited by applicant]
KR 200380530 · 2005 [cited by applicant]
KR 100487474 · 2005 [cited by applicant]
KR 1020050122523 · 2005 [cited by applicant]
KR 1020060119068 · 2006 [cited by applicant]
KR 100787501 · 2007 [cited by applicant]
KR 1020080026287 · 2008 [cited by applicant]
KR 1020080058732 · 2008 [cited by applicant]
KR 1020080078199 · 2008 [cited by applicant]
KR 1020090017290 · 2009 [cited by applicant]
KR 1020090052609 · 2009 [cited by applicant]
KR 1020090081607 · 2009 [cited by applicant]
KR 100921921 · 2009 [cited by applicant]
KR 1020100036919 · 2010 [cited by applicant]
KR 1020120034446 · 2012 [cited by applicant]
KR 1020130108749 · 2013 [cited by applicant]
KR 1020140056465 · 2014 [cited by applicant]
KR 1020150018201 · 2015 [cited by applicant]
KR 1020150086092 · 2015 [cited by applicant]
KR 1020170080102 · 2017 [cited by applicant]
KR 1020180066546 · 2018 [cited by applicant]
KR 1020180126217 · 2018 [cited by applicant]
KR 1020190106608 · 2019 [cited by applicant]
KR 1020190106684 · 2019 [cited by applicant]
KR 1020190107784 · 2019 [cited by applicant]
KR 102111216 · 2020 [cited by applicant]
KR 1020200106401 · 2020 [cited by applicant]
KR 102020144534 · 2020 [cited by applicant]
KR 1020210005979 · 2021 [cited by applicant]
KR 1020210005980 · 2021 [cited by applicant]
KR 1020210007010 · 2021 [cited by applicant]
RU 2347149 · 2007 [cited by applicant]
WO WO2004070283 · 2004 [cited by applicant]
WO WO2004079271 · 2004 [cited by applicant]
WO WO2006043430 · 2006 [cited by applicant]
WO WO2010047443 · 2010 [cited by applicant]
WO WO2011043123 · 2011 [cited by applicant]
WO WO2016121071 · 2016 [cited by applicant]
WO WO2019167313 · 2019 [cited by applicant]
WO WO2021053985 · 2021 [cited by applicant]
European Search Report dated Oct. 14, 2022 issued in EP Application No. 22173504.6. [cited by applicant]
Korean Office Action dated Oct. 18, 2022 issued in KR Application No. 10-2021-0065984. [cited by applicant]
Korean Office Action dated Oct. 18, 2022 issued in KR Application No. 10-2021-0065986. [cited by applicant]
European Search Report dated Oct. 21, 2022 issued in EP Application No. 22173436.1. [cited by applicant]
Korean Office Action dated Apr. 14, 2023 issued in Application No. 10-2021-0065985. [cited by applicant]
U.S. Office Action issued in U.S. Appl. No. 17/742,706 dated Jan. 9, 2024. [cited by applicant]
India Office Action dated Dec. 9, 2022 issued in IN Application No. 202214012610. [cited by applicant]
European Search Report dated Oct. 13, 2022 issued in EP Application No. 22173411.4. [cited by applicant]
Korean Office Action issued in Application No. 10-2021-0174217 dated Mar. 10, 2023. [cited by applicant]
Korean Office Action issued in Application No. 10-2021-0174215 dated Mar. 10, 2023. [cited by applicant]
Korean Office Action issued in Application No. 10-2021-0174218 dated Mar. 20, 2023. [cited by applicant]
Chinese Office Action dated Jun. 3, 2024 issued in Application No. 202210557584.7. [cited by applicant]
India Office Action dated Nov. 29, 2022 issued in IN Application No. 202214012882. [cited by applicant]
Japanese Office Action issued in Application No. 2022-083486 dated Jun. 20, 2023. [cited by applicant]
Japanese Office Action issued in Application No. 2022-082791 dated Jun. 6, 2023. [cited by applicant]
Korean Notice of Allowance issued in Application No. 10-2021-0174218 dated Jul. 27, 2023. [cited by applicant]
Japanese Office Action issued in Application No. 2022-082832 dated May 30, 2023. [cited by applicant]
Korean Notice of Allowance issued in Application No. 10-2021-0174215 dated Jul. 27, 2023. [cited by applicant]
Korean Office Action dated Jul. 6, 2022 issued in Application No. 10-2021-0065983. [cited by applicant]
Japanese Office Action dated Jul. 4, 2023, issued in Application No. 2022-081386. [cited by applicant]
India Office Action dated Jan. 3, 2023 issued in IN Application No. 202214012884. [cited by applicant]
Korean Office Action dated Jan. 9, 2023 issued in KR Application No. 10-2021-0065989. [cited by applicant]
European Search Report dated Oct. 19, 2022 issued in EP Application No. 22173409.8. [cited by applicant]
European Search Report dated Oct. 28, 2022 issued in EP Application No. 22173423.9. [cited by applicant]
European Search Report dated Nov. 7, 2022 issued in EP Application No. 22173506.1. [cited by applicant]
India Office Action dated Nov. 29, 2022 issued in IN Application No. 202214012895. [cited by applicant]
India Office Action dated Dec. 1, 2022 issued in IN Application No. 202214012883. [cited by applicant]
India Office Action dated Dec. 6, 2022 issued in IN Application No. 202214012894. [cited by applicant]
Korean Office Action dated Jan. 9, 2023 issued in KR Application No. 10-2021-0065987. [cited by applicant]
U.S. Office Action dated Jan. 10, 2025, issued in U.S. Appl. No. 17/742,564. [cited by applicant]
Chinese Office Action dated Mar. 29, 2025, issued in Chinese Patent Application No. 202210557597.4. [cited by applicant]