Optoelectronic device manufacturing method
View Patent ↗A method of manufacturing an optoelectronic device, including the steps of: a) forming a photonic device including a plurality of photonic components on a first substrate; b) forming an electronic device including a semiconductor layer coating a second substrate; c) after steps a) and b), bonding the electronic device to the photonic device by direct bonding, and then removing the second substrate; d) after step c), forming, on the upper surface side of the electronic device, electric connection metallizations, the method further including: —after step a) and before step c), a step of deposition of a metal layer continuously extending over the entire upper surface of the device.
1 . Optoelectronic device manufacturing method, comprising the steps of:
a) forming a photonic device comprising a plurality of photonic components formed inside and on top of a stack of one or a plurality of semiconductor layers coating a first substrate;
b) forming an electronic device comprising a semiconductor layer coating a second substrate;
c) after steps a) and b), bonding the electronic device to the upper surface of the photonic device by direct bonding, and then removing the second substrate;
d) after step c), forming, on the surface side of the electronic device opposite to the photonic device, electric connection metallizations contacting electronic components of the electronic device and the photonic components,
the method further comprising:
after step a) and before step c), a step of deposition of a metal layer continuously extending over the entire upper surface of the photonic device; and
after step c), a step of forming, from the surface of the electronic device opposite to the photonic device, of a plurality of insulating trenches vertically extending through the electronic device and the metal layer, said insulating trenches delimiting in the metal layer a plurality of electrodes electrically insulated from one another,
wherein step a) comprises a step of transfer and bonding of a first active photonic stack onto a second active photonic stack, the method further comprising, after the bonding of the first active photonic stack to the second active photonic stack and before step c), a step of forming of an insulated conductive via crossing the first active photonic stack and contacting the second active photonic stack.
2 . Method according to claim 1 , comprising, before step c), the forming of a plurality of electronic components inside and on top of the semiconductor layer coating the second substrate.
3 . Method according to claim 1 , further comprising, after step c), the forming of a plurality of electronic components inside and on top of the semiconductor layer.
4 . Method according to claim 1 , wherein, at step c), the electronic device is bonded to the upper surface of the photonic device by direct full plate metal-to-metal, dielectric-to-dielectric, or semiconductor-to-semiconductor bonding.
5 . Method according to claim 1 , further comprising, after step d), a step of forming of an interconnection stack on the upper surface side of the electronic device.
6 . Method according to claim 1 , further comprising, after step d), a step of bonding, on the upper surface side of the first electronic device, of a second electronic device comprising a plurality of electronic components formed inside and on top of a semiconductor layer coating a third substrate.
7 . Method according to claim 1 , wherein the photonic components comprise photosensitive diodes and/or LEDs.
8 . Method according to claim 1 , wherein the photonic components comprise microbolometers.
9 . Method according to claim 1 , wherein the first active photonic stack is bonded to the second active photonic stack, by direct metal-to-metal bonding or by direct dielectric-to-dielectric bonding, or by direct semiconductor-to-semiconductor bonding.
10 . Method according to claim 1 , wherein the photonic device comprises a visible sensor and an infrared sensor stacked to each other, the visible sensor being formed inside and on top of a semiconductor layer and the infrared sensor being formed inside and on top of an active infrared detector stack.
11 . Optoelectronic device manufacturing method, comprising the steps of:
a) forming a photonic device comprising a plurality of photonic components formed inside and on top of a stack of one or a plurality of semiconductor layers coating a first substrate;
b) forming an electronic device comprising a semiconductor layer coating a second substrate;
c) after steps a) and b), bonding the electronic device to the upper surface of the photonic device by direct bonding, and then removing the second substrate;
d) after step c), forming, on the surface side of the electronic device opposite to the photonic device, electric connection metallizations contacting electronic components of the electronic device and the photonic components,
the method further comprising:
after step a) and before step c), a step of deposition of a metal layer continuously extending over the entire upper surface of the photonic device; and
after step c), a step of forming, from the surface of the electronic device opposite to the photonic device, of a plurality of insulating trenches vertically extending through the electronic device and the metal layer, said insulating trenches delimiting in the metal layer a plurality of electrodes electrically insulated from one another,
wherein step a) comprises a step of transfer and bonding of a first active photonic stack onto a second active photonic stack, wherein the first active photonic stack is an active photosensitive diode stack and the second active photonic stack is an active LED stack, the method comprising the forming of a cathode contact metallization common to the first active photonic stack and to the second active photonic stack.
12 . Optoelectronic device manufacturing method, comprising the steps of:
a) forming a photonic device comprising a plurality of photonic components formed inside and on top of a stack of one or a plurality of semiconductor layers coating a first substrate;
b) forming an electronic device comprising a semiconductor layer coating a second substrate;
c) after steps a) and b), bonding the electronic device to the upper surface of the photonic device by direct bonding, and then removing the second substrate;
d) after step c), forming, on the surface side of the electronic device opposite to the photonic device, electric connection metallizations contacting electronic components of the electronic device and the photonic components,
the method further comprising:
after step a) and before step c), a step of deposition of a metal layer continuously extending over the entire upper surface of the photonic device; and
after step c), a step of forming, from the surface of the electronic device opposite to the photonic device, of a plurality of insulating trenches vertically extending through the electronic device and the metal layer, said insulating trenches delimiting in the metal layer a plurality of electrodes electrically insulated from one another,
wherein step a) comprises a step of transfer and bonding of a first active photonic stack onto a second active photonic stack, the method comprising, before the bonding of the first active photonic stack to the second active photonic stack, a step of deposition of a metal layer on top of and in contact with the upper surface of the second active photonic stack.
13 . Method according to claim 12 , wherein, on bonding of the first active photonic stack to the second active photonic stack, said metal layer extends continuously over the entire surface of the second active photonic stack.
14 . Method according to claim 12 , wherein, before the bonding of the first active photonic stack to the second active photonic stack, said metal layer is locally removed by etching to define a plurality of separate electrodes.